JPH076967A - Epitaxial growth observing apparatus - Google Patents

Abstract

PURPOSE:To enable a diffraction pattern to be observed even while a specimen is heated by a method wherein an optical filter which transmits only the luminescent color of a fluorescent screen is provided between the fluorescent screen and an observer. CONSTITUTION:An electron gun 2 is mounted on the wall of a vacuum chamber 1, an electron beam emitted from the electron gun 2 is made to impinge at an acute angle on the surface of a specimen placed on a specimen holder in the vacuum chamber 1. The specimen 4 kept at a prescribed temperature is irradiated with substance evaporated from an evaporation source 5 in the vacuum chamber 1, whereby a thin film is formed on the specimen 4. An electron beam is reflected and diffracted at the surface of the specimen 4 to generate a diffraction pattern, and the diffraction pattern is projected on a fluorescent screen 6 mounted on the vacuum chamber 1. At this point, an optical filter which transmits only the luminescent color light of a fluorescent screen is provided between the fluorescent screen and an observer. By this setup, a diffraction pattern projected on a fluorescent screen can be observed.

Description

Detailed Description of the Invention

[0001]

This invention relates to RHEED (Refl)
election High Energy Electr
The present invention relates to an epitaxial growth observation apparatus using an on Diffraction) apparatus.

[0002]

2. Description of the Related Art A conventional epitaxial growth observation apparatus is shown in FIG. 2, in which an electron gun 2 is attached to the wall of a vacuum chamber 1 and an electron beam from this electron gun 2 is in the vacuum chamber 1. The surface of the sample 4 on the sample holder 3 is irradiated with an acute angle. The sample 4 held at a predetermined temperature is irradiated with the evaporation material from the evaporation source 5 in the vacuum chamber 1 to form a thin film on the sample 4. The electron beam is reflected and diffracted on the surface of the sample 4, and the diffraction pattern generated at this time is projected on the fluorescent screen 6 attached to the vacuum chamber 1. Fluorescent screen 6
Is only applied on the glass on which the transparent conductive film is vapor-deposited. By observing the diffraction pattern projected on the fluorescent screen 6, it becomes possible to examine the epitaxial growth on the surface of the sample 4. Reference numeral 7 is an eye of an observer outside the vacuum chamber 1.

[0003]

In the conventional epitaxial growth observation apparatus, since the fluorescent screen 6 is only applied on the glass on which the transparent conductive film is vapor-deposited as described above, when the sample 4 is heated, Light from the holder 3 passes through the fluorescent screen 6. Therefore, there is a problem that it becomes difficult to observe the diffraction pattern formed on the fluorescent screen 6.

An object of the present invention is to solve the above-mentioned problems of the prior art and to provide an epitaxial growth observation apparatus capable of observing a diffraction pattern even while heating a sample.

[0005]

In order to achieve the above object, the present invention is directed to irradiating a sample held at a predetermined temperature with an evaporation material to form a thin film on the electron beam. Irradiates the surface of the sample at an acute angle and reflects on the surface of the sample,
In an epitaxial growth observation apparatus in which a diffraction pattern generated when diffracting is projected on a fluorescent screen and an observer outside the vacuum chamber observes the projected diffraction pattern, the fluorescent screen emits light between the fluorescent screen and the observer. It is characterized in that an optical filter that transmits only colors is provided.

[0006]

According to the present invention, when the sample is heated, even if the light from the sample holder passes through the fluorescent screen, the optical filter disposed between the fluorescent screen and the observer is only the emission color of the fluorescent screen. Since it is transmitted through, it becomes possible to observe the diffraction pattern formed on the fluorescent screen.

[0007]

Embodiments of the present invention will be described below with reference to the drawings. An epitaxial growth observation apparatus according to an embodiment of the present invention is shown in FIG. 1. In the figure, the same reference numerals as those in FIG. 2 showing the conventional epitaxial growth observation apparatus are the same, and the description thereof will be omitted.

In the embodiment, the conventional epitaxial growth observation apparatus is improved, and an optical filter 8 which transmits only the emission color of the fluorescent screen 6 is arranged between the fluorescent screen 6 and the observer 7.

Therefore, when the sample 4 is heated, even if the light from the sample holder 3 passes through the fluorescent screen 6,
Since the optical filter 8 arranged between the fluorescent screen 6 and the observer 7 transmits only the emission color of the fluorescent screen 6, it is possible to observe the diffraction pattern formed on the fluorescent screen 6.

The electron gun 2 used in the above embodiment may be an electron gun having a beam diameter of about 100 μmφ, and a focusing type RHE having a beam diameter of 1 mmφ or less.
It may be an ED electron gun. However, focused RHEE
In the case of the D electron gun, an optical filter may be installed between the fluorescent screen and the optical fiber for measuring the diffraction spot intensity or the television camera. The present invention can also be applied to the RHEED-TRAXS method using a microbeam.

[0011]

According to the present invention, when the sample is heated, even if the light from the sample holder passes through the fluorescent screen, the optical filter arranged between the fluorescent screen and the observer emits light of the fluorescent screen. Since only the light is transmitted, it becomes possible to observe the diffraction pattern formed on the fluorescent screen.

[Brief description of drawings]

FIG. 1 is an explanatory view showing an embodiment of the present invention.

FIG. 2 is an explanatory view showing a conventional epitaxial growth observation apparatus.

[Explanation of symbols]

 1 ... Vacuum tank 2 ... Electron gun 3 ... Sample holder 4 ... Sample 5 ... Evaporation source 6 ... Fluorescent screen 7 ... ... Eyes of observer 8 ... Optical filter

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kazuhiro Yamamuro, Inventor Kazuhiro Yamaga, 2500 Hagien, Chigasaki City, Kanagawa Prefecture, Japan Vacuum Technology Co., Ltd.

Claims (1)

[Claims] 1. A sample held at a predetermined temperature is irradiated with an evaporation material, and when a thin film is formed on the sample, an electron beam is irradiated on the surface of the sample at an acute angle and reflected by the surface of the sample. , In an epitaxial growth observation apparatus in which a diffraction pattern generated when diffracting is projected onto a fluorescent screen and the observer outside the vacuum chamber observes the projected diffraction pattern, a fluorescent screen is placed between the fluorescent screen and the observer. An epitaxial growth observation apparatus having an optical filter for transmitting only emission color.