JPH01155620A - 位置合わせ方法 - Google Patents

位置合わせ方法

Info

Publication number
JPH01155620A
JPH01155620A JP62313899A JP31389987A JPH01155620A JP H01155620 A JPH01155620 A JP H01155620A JP 62313899 A JP62313899 A JP 62313899A JP 31389987 A JP31389987 A JP 31389987A JP H01155620 A JPH01155620 A JP H01155620A
Authority
JP
Japan
Prior art keywords
alignment
wafer
reticle
output signals
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62313899A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0478166B2 (enExample
Inventor
Kouichi Shimeki
浩一 七五三木
Takehiko Suzuki
武彦 鈴木
Yasuaki Ito
靖明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62313899A priority Critical patent/JPH01155620A/ja
Publication of JPH01155620A publication Critical patent/JPH01155620A/ja
Publication of JPH0478166B2 publication Critical patent/JPH0478166B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62313899A 1987-12-11 1987-12-11 位置合わせ方法 Granted JPH01155620A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62313899A JPH01155620A (ja) 1987-12-11 1987-12-11 位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62313899A JPH01155620A (ja) 1987-12-11 1987-12-11 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPH01155620A true JPH01155620A (ja) 1989-06-19
JPH0478166B2 JPH0478166B2 (enExample) 1992-12-10

Family

ID=18046856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62313899A Granted JPH01155620A (ja) 1987-12-11 1987-12-11 位置合わせ方法

Country Status (1)

Country Link
JP (1) JPH01155620A (enExample)

Also Published As

Publication number Publication date
JPH0478166B2 (enExample) 1992-12-10

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