JPH01144438A - Sealing resin composition - Google Patents
Sealing resin compositionInfo
- Publication number
- JPH01144438A JPH01144438A JP30243587A JP30243587A JPH01144438A JP H01144438 A JPH01144438 A JP H01144438A JP 30243587 A JP30243587 A JP 30243587A JP 30243587 A JP30243587 A JP 30243587A JP H01144438 A JPH01144438 A JP H01144438A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- fluorine
- resin
- epoxy
- inorganic filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 17
- 238000007789 sealing Methods 0.000 title claims description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 229920003986 novolac Polymers 0.000 claims abstract description 14
- 239000003822 epoxy resin Substances 0.000 claims abstract description 12
- 239000005011 phenolic resin Substances 0.000 claims abstract description 12
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 12
- 239000011256 inorganic filler Substances 0.000 claims abstract description 11
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 3
- 229910000679 solder Inorganic materials 0.000 abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 11
- 239000000203 mixture Substances 0.000 abstract description 8
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 229920001568 phenolic resin Polymers 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 description 10
- 239000012778 molding material Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000001993 wax Substances 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- JNCMHMUGTWEVOZ-UHFFFAOYSA-N F[CH]F Chemical compound F[CH]F JNCMHMUGTWEVOZ-UHFFFAOYSA-N 0.000 description 2
- 108010081348 HRT1 protein Hairy Proteins 0.000 description 2
- 102100021881 Hairy/enhancer-of-split related with YRPW motif protein 1 Human genes 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 239000010680 novolac-type phenolic resin Substances 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 1
- 235000011293 Brassica napus Nutrition 0.000 description 1
- 240000008100 Brassica rapa Species 0.000 description 1
- 235000000540 Brassica rapa subsp rapa Nutrition 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- QEZIKGQWAWNWIR-UHFFFAOYSA-N antimony(3+) antimony(5+) oxygen(2-) Chemical compound [O--].[O--].[O--].[O--].[Sb+3].[Sb+5] QEZIKGQWAWNWIR-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical class [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 150000003613 toluenes Chemical class 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[発明の目的コ
(産業上の利用分野)
本発明は、耐湿性、半田耐熱性、成形性に優れた、電子
・電気部品等の封止用樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION [Purpose of the Invention (Industrial Application Field) The present invention relates to a resin composition for sealing electronic/electrical parts, etc., which has excellent moisture resistance, soldering heat resistance, and moldability.
(従来の技術)
近年、半導体、集積回路の分野における高集積化、高信
頼性化の技術開発と同時に、半導体装置の実装工程の自
動化が推進されている。 例えば、フラットパッケージ
型の半導体装置を回路基板に取り付ける場合、従来はリ
ードビン毎に半田付けを行っていたが、最近は半導体装
置全体を250℃に加熱した半田浴に浸漬して、−度に
半田付けを行う方法が採用されている。(Prior Art) In recent years, along with technological developments for higher integration and higher reliability in the field of semiconductors and integrated circuits, automation of semiconductor device mounting processes has been promoted. For example, when attaching a flat package type semiconductor device to a circuit board, conventionally soldering was done for each lead bin, but recently the entire semiconductor device is immersed in a solder bath heated to 250 degrees Celsius and soldered at - A method of attaching is used.
従来のエポキシ樹脂、ノボラック型フェノール樹脂およ
び無機質充填剤からなる樹脂組成物で封止した半導体装
置では、装置全体の半田浴浸漬を行うと耐湿性が低下す
るという欠点がある。 特に吸湿した半導体装置を半田
浴に浸漬すると、封止樹脂と半導体チップおよびフレー
ムとの間に剥がれが生じ、著しい耐湿劣化をおこし、電
極の腐蝕による断線や水分によるリーク電流を生じ、長
期間の信頼性を保証することかできないという欠点があ
る。 このため、耐湿性の影響が少なく、半導体装置全
体の半田浴浸漬をしても耐湿劣化の少ない成形性のよい
封止用樹脂の開発が強く要望されていた。A semiconductor device sealed with a conventional resin composition comprising an epoxy resin, a novolac type phenol resin, and an inorganic filler has a drawback that moisture resistance is reduced when the entire device is immersed in a solder bath. In particular, when a semiconductor device that has absorbed moisture is immersed in a solder bath, peeling occurs between the sealing resin and the semiconductor chip and frame, resulting in significant deterioration of moisture resistance, disconnection due to electrode corrosion, leakage current due to moisture, and long-term The drawback is that reliability cannot be guaranteed. For this reason, there has been a strong demand for the development of a sealing resin with good moldability that has less influence on moisture resistance and exhibits less deterioration in moisture resistance even when the entire semiconductor device is immersed in a solder bath.
(発明が解決しようとする問題点)
本発明は、上記の欠点を解消し、要望に応えるためにな
されたもので、吸湿の影響が少なく、特に半田浴浸漬後
の耐湿性および半田耐熱性に潰れた成形性のよい封止用
樹脂組成物を提供しようとするものである。(Problems to be Solved by the Invention) The present invention has been made to eliminate the above-mentioned drawbacks and meet the demands. The object is to provide a encapsulating resin composition that is crushed and has good moldability.
[発明の構成]
(問題点を解決するための手段)
本発明者は、上記の目的を達成しようと鋭意研究を重ね
た結果、フッ素置換アルキルアルコキシシラン化合物を
配合した樹脂組成物によって、半田浴浸漬後の耐湿性お
よび半田耐熱性が向上し、かつ成形性がよくなることを
見いだし、本発明を完成したものである。 すなわち、
本発明は、<A)エポキシ樹脂、
(B)ノボラック型フェノール樹脂、
(C)フッ素置換アルキルアルコキシシラン化合物およ
び
(D)無機質充填剤
を必須成分とし、全体の樹脂組成物に対して、前記(C
)のフッ素置換アルキルアルコキシシラン化合物を0.
1〜5重量%、また前記<D)の無機質充填剤を25〜
90重量%の割合で含有することを特徴とする封止用樹
脂組成物である。 そして、エポキシ基(a>とフェノ
ール性水酸基(b)との当量比[(a)/(b)コが0
.1〜10ノ範囲内にある封止用樹脂組成物である。[Structure of the Invention] (Means for Solving the Problems) As a result of extensive research to achieve the above object, the present inventor has developed a resin composition containing a fluorine-substituted alkyl alkoxysilane compound that can be used in solder baths. The present invention was completed based on the discovery that the moisture resistance and soldering heat resistance after immersion are improved, and the moldability is improved. That is,
The present invention comprises <A) an epoxy resin, (B) a novolac type phenol resin, (C) a fluorine-substituted alkyl alkoxysilane compound, and (D) an inorganic filler as essential components, and the above-mentioned ( C
) of the fluorine-substituted alkyl alkoxysilane compound.
1 to 5% by weight, and 25 to 5% by weight of the inorganic filler <D) above.
This is a sealing resin composition characterized in that it contains 90% by weight. Then, the equivalent ratio of the epoxy group (a> and the phenolic hydroxyl group (b) [(a)/(b) is 0
.. It is a sealing resin composition within the range of 1 to 10.
本発明に用いる(A>エポキシ樹脂としては、その分子
中にエポキシ基を少なくとも2個有する化合物である限
り、分子構造、分子量など特に制限はなく、一般に封止
用材料として使用されているものを広く包含することが
できる。 例えば、ビスフェノール型の芳香族系、シク
ロヘキサン誘導体等の脂環族系、さらに次の一般式で示
されるエポキシノボラック系の樹脂が挙げられる。As long as the epoxy resin used in the present invention (A> is a compound having at least two epoxy groups in its molecule, there are no particular restrictions on its molecular structure or molecular weight, and epoxy resins that are generally used as sealing materials may be used. Examples include aromatic resins such as bisphenol, alicyclic resins such as cyclohexane derivatives, and epoxy novolac resins represented by the following general formula.
(tE! L、式中R1は水素原子、ハロゲン原子又は
アルキル基を、R2は水素原子又はアルキル基を、nは
1以上の整数をそれぞれ表す)
これらのエポキシ樹脂は畦独もしくは2種以上混合して
用いる。(tE! L, in the formula, R1 represents a hydrogen atom, a halogen atom, or an alkyl group, R2 represents a hydrogen atom or an alkyl group, and n represents an integer of 1 or more.) These epoxy resins can be used alone or as a mixture of two or more types. and use it.
本発明に用いる(B)ノボラック型フェノール樹脂とし
ては、フェノール、アルキフェノール等のフェノール類
とホルムアルデヒドあるいはバラホルムアルデヒドとを
反応させて得られるノボラック型フェノール樹脂、およ
びこれらの変性樹脂、例えばエポキシ化もしくはブチル
化ノボラック型フェノール樹脂等が挙げられ、これらの
樹脂は単独もしくは2種以上混合して用いる。 ノボラ
ック型フェノール樹脂の配合割合は、前述したエポキシ
樹脂のエポキシ基<a >とノボラック型フェノール樹
脂のフェノール性水酸基(b )との当量比[<a)/
(b)コが0.1〜10ノ範囲内テアルことが望ましい
、 当量比が0.1未溝もしくは10を超えると、耐湿
性、成形作業性および硬化物の電気特性が悪くなり、い
ずれの場合も好ましくない、 従って、上記の範囲内に
限定するのがよい。The (B) novolak type phenolic resin used in the present invention includes novolak type phenol resins obtained by reacting phenols such as phenol and alkyphenol with formaldehyde or paraformaldehyde, and modified resins of these, such as epoxidized or butyl Examples include chemical novolac type phenol resins, and these resins may be used alone or in combination of two or more. The blending ratio of the novolac type phenolic resin is determined by the equivalent ratio [<a)/
(b) It is desirable that the ratio be within the range of 0.1 to 10. If the equivalence ratio is less than 0.1 or exceeds 10, the moisture resistance, molding workability, and electrical properties of the cured product will deteriorate, and any Therefore, it is better to limit it within the above range.
本発明に用いる(C)フッ素it換アルキルアルコキシ
シラン化合物としては、例えば
CF、CH2CH2Si (QC2Hう)3、CHF
2CH2CH25t (OCH,>3、CHF20F
2CH2CH2Si(QC2H5)3等が挙げられ、こ
れらは単独もしくは2種以上の混合系として用いる。
フッ素′lit換アルキルアルコキシシラン化合物の配
合割合は、全体の樹脂組成物に対して、0.1〜5重量
%である。 その割合が0,1重量%未満では半田耐熱
性に効果なく、まな5重量%を超えると樹脂粘度の低下
等、成形性に悪影響を与え、実用に適さず好ましくない
。Examples of the (C) fluorine-substituted alkyl alkoxysilane compound used in the present invention include CF, CH2CH2Si (QC2H)3, CHF
2CH2CH25t (OCH, >3, CHF20F
Examples include 2CH2CH2Si(QC2H5)3, which may be used alone or as a mixture of two or more.
The blending ratio of the fluorine-lit alkyl alkoxysilane compound is 0.1 to 5% by weight based on the entire resin composition. If the proportion is less than 0.1% by weight, it has no effect on soldering heat resistance, and if it exceeds 5% by weight, it has an adverse effect on moldability such as a decrease in resin viscosity, making it unsuitable for practical use.
本発明に用いる(D)無機質充填剤としては、シリカ粉
末、アルミナ、二酸化アンチモン、タルク、炭酸カルシ
ウム、チタンホワイト、クレー、マイカ、ベンガラ、ガ
ラス繊維等が挙げられ、これらは憤独もしくは2種以上
混合して使用する。Examples of the inorganic filler (D) used in the present invention include silica powder, alumina, antimony dioxide, talc, calcium carbonate, titanium white, clay, mica, red iron, glass fiber, etc. Mix and use.
これらの中でも特にシリカ粉末やアルミナ粉末が好まし
く、よく使用される。 無機質充填剤の配合割合は、全
体の樹脂組成物に対して25〜90重量%である。 そ
の割合が25重量%未満では、耐湿性、半田1熱性、機
械的特性および成形性が悪くなり、また90重量%を超
えるとカサバリが大きくなり成形性が悪く実用に適さな
い。Among these, silica powder and alumina powder are particularly preferred and often used. The blending ratio of the inorganic filler is 25 to 90% by weight based on the entire resin composition. If the proportion is less than 25% by weight, the moisture resistance, solder heat resistance, mechanical properties and moldability will be poor, and if it exceeds 90% by weight, the coverage will be large and the moldability will be poor, making it unsuitable for practical use.
本発明の封止用樹脂組成物は、エポキシ樹脂、ノボラッ
ク型フェノール樹脂、フッ素置換アルキルアルコキシシ
ラン化合物および無機質充填剤を必須成分とするが、本
発明の目的を損なわないかぎり、必要に応じて天然ワッ
クス類1合成ワックス類、直鎖脂肪酸の金属塩、酸アミ
ド、エステル゛類、パラフィン類などの離型剤、塩素化
パラフィン、ブロム化トルエン、ヘキサブロムベンゼン
。The encapsulating resin composition of the present invention contains an epoxy resin, a novolac type phenolic resin, a fluorine-substituted alkyl alkoxysilane compound, and an inorganic filler as essential components, but may optionally contain natural Waxes 1 Synthetic waxes, metal salts of linear fatty acids, acid amides, esters, release agents such as paraffins, chlorinated paraffins, brominated toluene, hexabromobenzene.
三酸化アンチモンなどの難燃剤、カーボンブラック、ベ
ンガラなどの着色剤、シランカップリング剤、種々の硬
化促進剤等を適宜添加配合することができる。Flame retardants such as antimony trioxide, colorants such as carbon black and red iron oxide, silane coupling agents, various curing accelerators, etc. can be appropriately added and blended.
本発明の封止用樹脂組成物を成形材料として製造する場
合の一般的な方法は、エポキシ樹脂、ノボラック型フェ
ノール樹脂、フッ素置換アルキルアルコキシシラン化合
物、無機質充填剤、その他の原料成分を所定の組成比に
選んで、ミキサー等によって十分均一に混合した後、更
に熱ロールによる溶融混合処理、またはニーダ等による
混合処理を行い、次いで冷却固化させ、適当な大きさに
粉砕して成形材料とする。 こうして製造した成形材料
は、電子部品或いは電気部品の封止、被覆、絶縁等に適
用することができる。A general method for producing the encapsulating resin composition of the present invention as a molding material is to mix an epoxy resin, a novolac type phenol resin, a fluorine-substituted alkyl alkoxysilane compound, an inorganic filler, and other raw materials into a predetermined composition. After sufficiently uniformly mixing using a mixer or the like, the mixture is further melt-mixed using hot rolls or mixed using a kneader, etc., and then cooled and solidified, and pulverized to an appropriate size to form a molding material. The molding material thus produced can be applied to sealing, covering, insulating, etc. electronic or electrical components.
(作用)
本発明において、フッ素置換アルキルアルコキシシラン
化合物を用いたことによって目的とする特性が得られる
ものである。 フッ素置換アルキルアルコキシシラン化
合物は、封止用樹脂組成物と半導体チップとの密着性、
また封止用樹脂組成物とリードフレームとの密着性を向
上させ、半田浴に浸漬しても耐湿性の劣化を少なくする
ことができる。(Function) In the present invention, the desired characteristics can be obtained by using a fluorine-substituted alkyl alkoxysilane compound. The fluorine-substituted alkyl alkoxysilane compound improves the adhesion between the encapsulating resin composition and the semiconductor chip,
Furthermore, it is possible to improve the adhesion between the sealing resin composition and the lead frame, and to reduce deterioration of moisture resistance even when immersed in a solder bath.
(実施例)
次に本発明を実施例によって具体的に説明するが、本発
明はこれらの実施例によって限定されるものではない。(Examples) Next, the present invention will be specifically explained by examples, but the present invention is not limited by these examples.
以下の実施例および比較例において「%」とあるのは
「重量%」を意味する。In the following Examples and Comparative Examples, "%" means "% by weight".
実施例 1
クレゾールノボラックエポキシ樹脂(エポキシ当i 2
15) 19%に、ノボラック型フェノールIfA脂(
フェノール当量107) 9%、
CF 3 CH2CH2Si (QC2H5
) 、 0.3 % 、溶融シリカ粉末7
1%、エステル系ワックス0.3%およびシラン系カッ
プリング剤0.4%を配合し、常温で混合し更に90〜
95℃で混線冷却した後、粉砕して成形材料を製造した
。 この成形材料を170℃に加熱した金型内にトラン
スファー注入し硬化させて成形品(封止品)をつくった
、 この成形品について耐湿性等の特性を試験したので
、その結果を第1表に示した。 特に耐湿性において本
発明の顕著な効果が認められた。Example 1 Cresol novolak epoxy resin (i 2 per epoxy
15) 19% contains novolak-type phenol IfA fat (
Phenol equivalent 107) 9%, CF3CH2CH2Si (QC2H5
), 0.3%, fused silica powder 7
1%, ester wax 0.3% and silane coupling agent 0.4%, mixed at room temperature and further heated to 90~
After cross-cooling at 95° C., the mixture was pulverized to produce a molding material. This molding material was transfer-injected into a mold heated to 170°C and cured to produce a molded product (sealed product).The molded product was tested for characteristics such as moisture resistance, and the results are shown in Table 1. It was shown to. In particular, the remarkable effects of the present invention on moisture resistance were observed.
実施例 2
クレゾールノボラックエポキシ樹脂(エポキシ当量21
5) 19%に、ノボラック型フェノール樹脂(フェノ
ール当量107) 9%、次に示すフッ素置換アルキ
ルアルコキシシラン化合物0.3%、実施例2は、
CHF2 CH2CH281(OCHx )
s 、実施例3は、
CHF2 CH2CH2Sf (QC2H5
) ! 、シリカ粉末71%、エステル系ワッ
クス0.3%およびシラン系カブ、プリング剤0.4%
を実施例1と同様に混合、混線、粉砕して成形材料を製
造した。Example 2 Cresol novolac epoxy resin (epoxy equivalent weight 21
5) 19%, 9% of novolak type phenol resin (phenol equivalent: 107), 0.3% of the following fluorine-substituted alkyl alkoxysilane compound, Example 2, CHF2 CH2CH281 (OCHx )
s, Example 3 is CHF2 CH2CH2Sf (QC2H5
)! , 71% silica powder, 0.3% ester wax and silane turnip, 0.4% pulling agent.
were mixed, mixed, and crushed in the same manner as in Example 1 to produce a molding material.
また実施例1と同様にして成形品をつくり耐湿性等の特
性試験を行ったので、その結果を第1表に示した。 耐
湿性において本発明の顕著な効果が認められた。In addition, molded products were made in the same manner as in Example 1, and property tests such as moisture resistance were conducted, and the results are shown in Table 1. The remarkable effect of the present invention on moisture resistance was observed.
比較例
クレゾールノボラックエポキシ樹脂(エポキシ当i 2
15) 19%にノボラック型フェノール樹脂(フェノ
ール当J1107) 9%、シリカ粉末71%、硬化
促進剤0.3%、エステル系ワックス0.3%およびシ
ラン系カップリング剤0.4%を実施例1と同様にして
成形材料を製造した。 この成形材料を用いて成形品と
し、成形品の緒特性について実施例1と同様にして試験
を行い、その結果を第1表に示した。Comparative Example Cresol novolac epoxy resin (i 2 per epoxy
15) Example: 19%, 9% novolac type phenol resin (phenol J1107), 71% silica powder, 0.3% curing accelerator, 0.3% ester wax and 0.4% silane coupling agent. A molding material was produced in the same manner as in Example 1. This molding material was used to make a molded article, and the properties of the molded article were tested in the same manner as in Example 1. The results are shown in Table 1.
第1表
(単位)
*1 ニドランスファー成形によって直径50m1、厚
さ31111の成形品をつくり、これを127℃。Table 1 (Units) *1 A molded product with a diameter of 50 m1 and a thickness of 31111 cm was made by Nidor Transfer molding and heated to 127°C.
2気圧の飽和水蒸気中に24時間放置し、増加した重量
によって求めた。It was determined by the increase in weight after being left in saturated steam at 2 atm for 24 hours.
ネ2:吸水率の試験と同じ成形品をつくり、これを17
5℃で8時間の後硬化を行い、適当な大きさのテストピ
ースとし、熱機器分析装置を用いて測定した。Ne2: Make the same molded product as in the water absorption test, and test this with 17
Post-curing was performed at 5° C. for 8 hours, a test piece of an appropriate size was prepared, and the test piece was measured using a thermal instrument analyzer.
*3:成形材料を用いて2本以上のアルミニウム配線を
有するシリコン製チップ(テスト用素子)を通常の42
70イフレームに接着し、175℃で2分間トランスフ
ァー成形して5x 10x 1.5 nIlのフラット
パッケージ型成形品をつくり、その後175℃で8時間
の後硬化を行った。 この成形品を予め40℃、90%
RH,100時間の吸湿処理をした後、250℃の半田
浴に10秒間浸漬した。 その後127℃、2.5気圧
の飽和水蒸気中でPCTを行い、アルミニウムの腐食に
よる断線を不良として評価した。*3: Using a molding material, a silicon chip (test element) with two or more aluminum wirings is
70 frame and transfer molded at 175° C. for 2 minutes to produce a flat package molded product of 5 x 10 x 1.5 nIl, followed by post-curing at 175° C. for 8 hours. This molded product is heated to 40℃ and 90%
After RH and moisture absorption treatment for 100 hours, it was immersed in a 250° C. solder bath for 10 seconds. Thereafter, PCT was performed in saturated steam at 127° C. and 2.5 atm, and disconnections due to aluminum corrosion were evaluated as defects.
[発明の効果]
以上の説明および第1表から明らかなように、本発明の
対土用樹脂組成物は、半導体チップやリードフレームに
対する密着性が良いために、吸湿の影響が少なく、半田
浴に浸漬した後でも耐湿性に優れ、その結果電極の腐食
による断線や水分に゛よるリーク電流の発生などを著し
く低減することができ、しかも長時間にわたって1顆性
を保証することができる。 また、250℃の半田浴浸
漬にもかかわらず潰れた半田耐熱性を示した。[Effects of the Invention] As is clear from the above explanation and Table 1, the soil-retaining resin composition of the present invention has good adhesion to semiconductor chips and lead frames, is less affected by moisture absorption, and can be used in solder baths. It has excellent moisture resistance even after being immersed in water, and as a result, it is possible to significantly reduce the occurrence of disconnection due to electrode corrosion and leakage current due to moisture, and moreover, it is possible to guarantee unicondylarity for a long time. Furthermore, it exhibited poor solder heat resistance despite being immersed in a solder bath at 250°C.
Claims (1)
)のフッ素置換アルキルアルコキシシラン化合物を0.
1〜5重量%、また前記(D)の無機質充填剤を25〜
90重量%の割合で含有することを特徴とする封止用樹
脂組成物。 2 エポキシ樹脂のエポキシ基(a)と、ノボラック型
フェノール樹脂のフェノール性水酸基(b)との当量比
[(a)/(b)]が 0.1〜10の範囲内にある特許請求の範囲第1項記載
の封止用樹脂組成物。[Claims] 1. (A) an epoxy resin, (B) a novolac type phenol resin, (C) a fluorine-substituted alkyl alkoxysilane compound, and (D) an inorganic filler as essential components, with respect to the entire resin composition. , the above (C
) of the fluorine-substituted alkyl alkoxysilane compound.
1 to 5% by weight, and 25 to 5% of the inorganic filler (D) above.
A sealing resin composition characterized in that it contains 90% by weight. 2 Claims in which the equivalent ratio [(a)/(b)] between the epoxy group (a) of the epoxy resin and the phenolic hydroxyl group (b) of the novolac type phenol resin is within the range of 0.1 to 10. The sealing resin composition according to item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30243587A JPH01144438A (en) | 1987-11-30 | 1987-11-30 | Sealing resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30243587A JPH01144438A (en) | 1987-11-30 | 1987-11-30 | Sealing resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01144438A true JPH01144438A (en) | 1989-06-06 |
Family
ID=17908893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30243587A Pending JPH01144438A (en) | 1987-11-30 | 1987-11-30 | Sealing resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01144438A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017165876A (en) * | 2016-03-16 | 2017-09-21 | 味の素株式会社 | Resin composition |
JP2018150440A (en) * | 2017-03-10 | 2018-09-27 | 味の素株式会社 | Resin composition |
TWI737649B (en) * | 2015-12-25 | 2021-09-01 | 日商味之素股份有限公司 | Resin composition |
-
1987
- 1987-11-30 JP JP30243587A patent/JPH01144438A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI737649B (en) * | 2015-12-25 | 2021-09-01 | 日商味之素股份有限公司 | Resin composition |
JP2017165876A (en) * | 2016-03-16 | 2017-09-21 | 味の素株式会社 | Resin composition |
CN107200974A (en) * | 2016-03-16 | 2017-09-26 | 味之素株式会社 | Resin combination |
TWI776801B (en) * | 2016-03-16 | 2022-09-11 | 日商味之素股份有限公司 | resin composition |
KR20220138848A (en) * | 2016-03-16 | 2022-10-13 | 아지노모토 가부시키가이샤 | Resin composition |
JP2018150440A (en) * | 2017-03-10 | 2018-09-27 | 味の素株式会社 | Resin composition |
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