JPH01140143A - パターン形成材料 - Google Patents
パターン形成材料Info
- Publication number
- JPH01140143A JPH01140143A JP62299313A JP29931387A JPH01140143A JP H01140143 A JPH01140143 A JP H01140143A JP 62299313 A JP62299313 A JP 62299313A JP 29931387 A JP29931387 A JP 29931387A JP H01140143 A JPH01140143 A JP H01140143A
- Authority
- JP
- Japan
- Prior art keywords
- group
- forming material
- pattern forming
- light
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62299313A JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62299313A JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01140143A true JPH01140143A (ja) | 1989-06-01 |
| JPH057706B2 JPH057706B2 (cs) | 1993-01-29 |
Family
ID=17870920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62299313A Granted JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01140143A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223857A (ja) * | 1990-01-30 | 1991-10-02 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| KR100558190B1 (ko) * | 1998-03-20 | 2006-03-10 | 후지 샤신 필름 가부시기가이샤 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
-
1987
- 1987-11-27 JP JP62299313A patent/JPH01140143A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223857A (ja) * | 1990-01-30 | 1991-10-02 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| KR100558190B1 (ko) * | 1998-03-20 | 2006-03-10 | 후지 샤신 필름 가부시기가이샤 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH057706B2 (cs) | 1993-01-29 |
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