JPH01140143A - パターン形成材料 - Google Patents
パターン形成材料Info
- Publication number
- JPH01140143A JPH01140143A JP62299313A JP29931387A JPH01140143A JP H01140143 A JPH01140143 A JP H01140143A JP 62299313 A JP62299313 A JP 62299313A JP 29931387 A JP29931387 A JP 29931387A JP H01140143 A JPH01140143 A JP H01140143A
- Authority
- JP
- Japan
- Prior art keywords
- group
- forming material
- pattern forming
- formula
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62299313A JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62299313A JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01140143A true JPH01140143A (ja) | 1989-06-01 |
| JPH057706B2 JPH057706B2 (cs) | 1993-01-29 |
Family
ID=17870920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62299313A Granted JPH01140143A (ja) | 1987-11-27 | 1987-11-27 | パターン形成材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01140143A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223857A (ja) * | 1990-01-30 | 1991-10-02 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| KR100558190B1 (ko) * | 1998-03-20 | 2006-03-10 | 후지 샤신 필름 가부시기가이샤 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
-
1987
- 1987-11-27 JP JP62299313A patent/JPH01140143A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223857A (ja) * | 1990-01-30 | 1991-10-02 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| KR100558190B1 (ko) * | 1998-03-20 | 2006-03-10 | 후지 샤신 필름 가부시기가이샤 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH057706B2 (cs) | 1993-01-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1240553B1 (en) | Photoresist composition for deep uv radiation | |
| KR20020002877A (ko) | 광산 발생제와 함께 광 라디칼 발생제(prg)를 포함하는포토레지스트 조성물 | |
| JPS61141441A (ja) | ポジ型ホトレジスト組成物 | |
| JPH01300250A (ja) | フォトレジスト組成物 | |
| CA1263822A (en) | Method for producing a positive photoresist | |
| JPH0749568A (ja) | 感光性組成物及びパターン形成方法 | |
| JPH0262544A (ja) | フォトレジスト組成物 | |
| JP4573717B2 (ja) | 上部反射防止膜の組成物、およびこれを用いた半導体素子のパターン形成方法 | |
| US5225312A (en) | Positive photoresist containing dyes | |
| JPS5968737A (ja) | ポジ型及びネガ型パタ−ンの同時形成方法 | |
| JPH07117750B2 (ja) | 感光性樹脂組成物 | |
| US6284430B1 (en) | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | |
| JP2005157352A (ja) | 有機反射防止膜組成物及びこれを利用したフォトレジストのパターン形成方法 | |
| JPH01140143A (ja) | パターン形成材料 | |
| KR100745064B1 (ko) | 상부 반사방지막 조성물 및 이를 이용한 반도체 소자의패턴 형성 방법 | |
| JPH04249509A (ja) | パターン形成材料 | |
| JPH0261640A (ja) | 感光性組成物 | |
| JPH01140144A (ja) | パターン形成材料 | |
| JP3362679B2 (ja) | 化学増幅型レジスト材料 | |
| JPH02118655A (ja) | パターン形成用コンストラストエンハンスト材料 | |
| JPH01155338A (ja) | 感光性樹脂組成物 | |
| JPH01293338A (ja) | ネガ型フォトレジスト組成物 | |
| JPH03229255A (ja) | 感光性組成物 | |
| JPH03233455A (ja) | ネガ型フォトレジスト組成物 | |
| JPH02118652A (ja) | パターン形成材料 |