JPH01136180U - - Google Patents

Info

Publication number
JPH01136180U
JPH01136180U JP1988026716U JP2671688U JPH01136180U JP H01136180 U JPH01136180 U JP H01136180U JP 1988026716 U JP1988026716 U JP 1988026716U JP 2671688 U JP2671688 U JP 2671688U JP H01136180 U JPH01136180 U JP H01136180U
Authority
JP
Japan
Prior art keywords
vacuum chamber
fine adjustment
thin film
susceptor
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1988026716U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988026716U priority Critical patent/JPH01136180U/ja
Publication of JPH01136180U publication Critical patent/JPH01136180U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP1988026716U 1988-02-29 1988-02-29 Pending JPH01136180U (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988026716U JPH01136180U (enExample) 1988-02-29 1988-02-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988026716U JPH01136180U (enExample) 1988-02-29 1988-02-29

Publications (1)

Publication Number Publication Date
JPH01136180U true JPH01136180U (enExample) 1989-09-18

Family

ID=31248594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988026716U Pending JPH01136180U (enExample) 1988-02-29 1988-02-29

Country Status (1)

Country Link
JP (1) JPH01136180U (enExample)

Similar Documents

Publication Publication Date Title
CA2465078C (en) Method of releasing gas or vapor from a solid material
US20080251020A1 (en) Cvd-Reactor with Slidingly Mounted Susceptor Holder
GB1015143A (en) Improvements in or relating to film resistors
JPS63150912A (ja) 薄膜生成装置
JPH0184428U (enExample)
JPH05129208A (ja) 薄膜気相成長装置のサセプタ回転支持構造
JP4804654B2 (ja) 容器内面成膜用cvd装置及び容器内面成膜方法
JPH01136181U (enExample)
JPH0238923Y2 (enExample)
JPS63133519A (ja) インナ−ベルジヤ取付治具
JPH0238922Y2 (enExample)
JPS63112331U (enExample)
CN219886175U (zh) 一种镀膜设备用加热盘
JPS62180933U (enExample)
JPH01153633U (enExample)
JPH0787185B2 (ja) 半導体の熱処理方法
JPS6115968A (ja) 真空蒸着装置
JPH0350325U (enExample)
JPH0726839Y2 (ja) 気相成長装置
JPH017726Y2 (enExample)
JPH0513354A (ja) 半導体ウエハの熱処理方法
JPH07519B2 (ja) 分子線エピタキシ−装置
JPH02132935U (enExample)
JPS6346836U (enExample)
JPH07121381B2 (ja) 回転塗布装置