JPH0113094B2 - - Google Patents

Info

Publication number
JPH0113094B2
JPH0113094B2 JP14868680A JP14868680A JPH0113094B2 JP H0113094 B2 JPH0113094 B2 JP H0113094B2 JP 14868680 A JP14868680 A JP 14868680A JP 14868680 A JP14868680 A JP 14868680A JP H0113094 B2 JPH0113094 B2 JP H0113094B2
Authority
JP
Japan
Prior art keywords
developer
constant temperature
developing
development
temperature bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14868680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5772147A (en
Inventor
Kazuo Ito
Kyusaku Nishioka
Wataru Wakamya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14868680A priority Critical patent/JPS5772147A/ja
Publication of JPS5772147A publication Critical patent/JPS5772147A/ja
Publication of JPH0113094B2 publication Critical patent/JPH0113094B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing

Landscapes

  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14868680A 1980-10-22 1980-10-22 Method and device for development Granted JPS5772147A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14868680A JPS5772147A (en) 1980-10-22 1980-10-22 Method and device for development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14868680A JPS5772147A (en) 1980-10-22 1980-10-22 Method and device for development

Publications (2)

Publication Number Publication Date
JPS5772147A JPS5772147A (en) 1982-05-06
JPH0113094B2 true JPH0113094B2 (https=) 1989-03-03

Family

ID=15458326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14868680A Granted JPS5772147A (en) 1980-10-22 1980-10-22 Method and device for development

Country Status (1)

Country Link
JP (1) JPS5772147A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4482424A (en) * 1983-05-06 1984-11-13 At&T Bell Laboratories Method for monitoring etching of resists by monitoring the flouresence of the unetched material
JP2695215B2 (ja) * 1988-12-20 1997-12-24 松下電器産業株式会社 現像装置と現像方法

Also Published As

Publication number Publication date
JPS5772147A (en) 1982-05-06

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