JPH01123419A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH01123419A
JPH01123419A JP62280964A JP28096487A JPH01123419A JP H01123419 A JPH01123419 A JP H01123419A JP 62280964 A JP62280964 A JP 62280964A JP 28096487 A JP28096487 A JP 28096487A JP H01123419 A JPH01123419 A JP H01123419A
Authority
JP
Japan
Prior art keywords
mask
pattern
mirrors
projection exposure
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62280964A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0520890B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Tsuneaki Isozaki
磯崎　常明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62280964A priority Critical patent/JPH01123419A/ja
Publication of JPH01123419A publication Critical patent/JPH01123419A/ja
Publication of JPH0520890B2 publication Critical patent/JPH0520890B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62280964A 1987-11-09 1987-11-09 投影露光装置 Granted JPH01123419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62280964A JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62280964A JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Publications (2)

Publication Number Publication Date
JPH01123419A true JPH01123419A (ja) 1989-05-16
JPH0520890B2 JPH0520890B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-22

Family

ID=17632341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62280964A Granted JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Country Status (1)

Country Link
JP (1) JPH01123419A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7314350B2 (en) 2002-07-22 2008-01-01 Comair Rotron, Inc. Energy store circuit for controlling rotor rotation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7314350B2 (en) 2002-07-22 2008-01-01 Comair Rotron, Inc. Energy store circuit for controlling rotor rotation

Also Published As

Publication number Publication date
JPH0520890B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-22

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