JPH01120881A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH01120881A
JPH01120881A JP27850487A JP27850487A JPH01120881A JP H01120881 A JPH01120881 A JP H01120881A JP 27850487 A JP27850487 A JP 27850487A JP 27850487 A JP27850487 A JP 27850487A JP H01120881 A JPH01120881 A JP H01120881A
Authority
JP
Japan
Prior art keywords
refractive index
region
active layer
layer
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27850487A
Other languages
Japanese (ja)
Inventor
Kimio Shigihara
君男 鴫原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP27850487A priority Critical patent/JPH01120881A/en
Publication of JPH01120881A publication Critical patent/JPH01120881A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To irradiate a light perpendicularly to an active layer by providing a high refractive index region having a refractive index equal to or larger than that of the active layer on a low refractive index region. CONSTITUTION:A low refractive index region 9 having a refractive index smaller than that of an active layer 5 is provided on the layer 5, and a high refractive index region 10 having a refractive index larger than or equal to that of the layer 5 is provided on the region 9, and externally exposed. After a laser beam which propagates through the layer 5 and its vicinity is tunneled through the region 9 to the region 10, it is irradiated externally. That is, a light to be propagated through a core region 12 is radiated through a prism 14 to an external field. Accordingly, even in a semiconductor laser device in which the region 9 and the region 10 are sequentially laminated, the laser beam can be radiated perpendicularly to the layer 5 by means of an optical tunneling effect.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、例えば面発光型の半導体レーザ装置に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to, for example, a surface-emitting type semiconductor laser device.

〔従来の技術) 第5図は、従来の半導体レーザ装置の構造を示す斜視図
である。
[Prior Art] FIG. 5 is a perspective view showing the structure of a conventional semiconductor laser device.

この図において、1はp側電極、2は基板、3は電流ブ
ロック層、4は下クラッド層、5は活性層、6は上クラ
ッド層、7はコンタクト層、8はn側電極である。
In this figure, 1 is a p-side electrode, 2 is a substrate, 3 is a current blocking layer, 4 is a lower cladding layer, 5 is an active layer, 6 is an upper cladding layer, 7 is a contact layer, and 8 is an n-side electrode.

次に動作について説明する。Next, the operation will be explained.

いま、p側電極1とn側電極8間を順方向にバイアスす
ると、正孔と電子が活性層5内に注入され、結合して光
となる。この活性層5で発生した光は、活性層5に対し
て水平方向へ増幅されながら伝搬して端面からレーザ光
として放射される。
Now, when forward bias is applied between the p-side electrode 1 and the n-side electrode 8, holes and electrons are injected into the active layer 5 and combine to become light. The light generated in the active layer 5 propagates while being amplified in the horizontal direction with respect to the active layer 5, and is emitted from the end face as a laser beam.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記のような半導体レーザ装置は、活性層5に対して水
平方向にしか光が取り出せないという問題点があった。
The semiconductor laser device as described above has a problem in that light can only be extracted in the horizontal direction with respect to the active layer 5.

この発明は、かかる問題点を解決するためになされたも
ので、活性層に対して垂直方向にも光を取り出せる面発
光型の半導体レーザ装置を得ることを目的とする。
The present invention was made to solve these problems, and an object of the present invention is to provide a surface-emitting type semiconductor laser device that can also extract light in a direction perpendicular to the active layer.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係る半導体レーザ装置は、活性層上に活性層
の屈折率よりも小さい屈折率を有する低屈折率領域を設
けるとともに、この低屈折率領域上に活性層の屈折率よ
りも大きいか等しい屈折率を有する高屈折率領域を設け
て外部に露出させたものである。
In the semiconductor laser device according to the present invention, a low refractive index region having a refractive index smaller than the refractive index of the active layer is provided on the active layer, and a refractive index larger than or equal to the refractive index of the active layer is provided on the low refractive index region. A high refractive index region having a refractive index is provided and exposed to the outside.

〔作用〕[Effect]

この発明においては、活性層およびその近傍を伝搬する
レーザ光が、低屈折率領域をトンネリングして高屈折率
領域に入った後外部に出射される。
In this invention, laser light propagating through the active layer and its vicinity tunnels through the low refractive index region, enters the high refractive index region, and is then emitted to the outside.

〔実施例) 第1図(a)、(b)はこの発明の半導体レーザ装置の
一実施例の構造を示す斜視図および第1図(a)のX−
X線における断面図である。
[Embodiment] FIGS. 1(a) and 1(b) are perspective views showing the structure of an embodiment of the semiconductor laser device of the present invention, and
It is a cross-sectional view in an X-ray.

これらの図において、第5図と同一符号は同一のものを
示し、9は前記活性層5よりも小さな屈折率を有する低
屈折率領域であり、1oは前記活性層5よりも大きいか
等しい屈折率を有する高屈折率領域である。すなわち、
活性層5の屈折率をnI、低屈折率領域9の屈折率をn
2、高屈折率領域10の屈折率をn3とした時、n、>
n、>n2の関係が成り立っている。
In these figures, the same reference numerals as in FIG. 5 indicate the same elements, 9 is a low refractive index region having a smaller refractive index than the active layer 5, and 1o is a region with a refractive index greater than or equal to that of the active layer 5. It is a high refractive index region with a high refractive index. That is,
The refractive index of the active layer 5 is nI, and the refractive index of the low refractive index region 9 is nI.
2. When the refractive index of the high refractive index region 10 is n3, n, >
The relationship n,>n2 holds true.

また、第2図はこの発明で用いたプリズム・フィルム結
合(P、に、Tien、Applied 0ptics
、Vol、10゜No、11.pp、2395−241
3.1971参照)として知られている光のトンネル効
果の原理を示す図である。
Figure 2 shows the prism-film combination (P, Tien, Applied Optics) used in this invention.
, Vol, 10°No., 11. pp, 2395-241
3.1971) is a diagram illustrating the principle of the light tunneling effect known as 3.1971).

この図において、11は基板、12はコア領域、13は
間隙、14はプリズムである。
In this figure, 11 is a substrate, 12 is a core region, 13 is a gap, and 14 is a prism.

次に動作について説明する。Next, the operation will be explained.

第2図に示すように、コア領域12の屈折率よりも小さ
い屈折率の間隙13を挟んで、コア領域12の屈折率よ
りも大きいか等しい屈折率をもつプリズム14を配置す
ると、コア領域12中を伝搬する光がプリズム14を通
して外界に取り出される。
As shown in FIG. 2, when prisms 14 having a refractive index greater than or equal to the refractive index of the core region 12 are placed across a gap 13 with a refractive index smaller than that of the core region 12, the core region 12 The light propagating inside is extracted to the outside world through the prism 14.

したがって、第1図(a)、(b)に示したように、一
部の活性層5の上に活性層5よりも小さな屈折率を有す
る低屈折率領域9と活性層5よりも大きいか等しい屈折
率を有する高屈折率領域10を順次重ねているこの発明
の半導体レーザ装置においても、前述の光トンネル効果
によりレーザ光を活性層5と垂直な方向に取り出すこと
が可能となる。
Therefore, as shown in FIGS. 1(a) and 1(b), a low refractive index region 9 having a refractive index smaller than that of the active layer 5 and a region having a refractive index larger than that of the active layer 5 are formed on a part of the active layer 5. Even in the semiconductor laser device of the present invention in which high refractive index regions 10 having the same refractive index are sequentially stacked, laser light can be extracted in a direction perpendicular to the active layer 5 due to the above-mentioned optical tunnel effect.

第3図および第4図はこの発明の他の実施例の構造を示
す断面図である。
FIGS. 3 and 4 are cross-sectional views showing the structure of other embodiments of the present invention.

第3図に示したものは低屈折率領域9を活性層5の上の
みならず、斜辺部分にも取りつけたものであるが、この
ように構成すると斜辺部分で光が反射され効率よく光を
取り出すことができる。
In the structure shown in FIG. 3, the low refractive index region 9 is attached not only on the active layer 5 but also on the oblique side. With this structure, the light is reflected on the oblique side and the light is emitted efficiently. It can be taken out.

また、第4図に示したものは、低屈折率領域9を上クラ
ッド層6の途中に設けたものであるが、このように構成
しても上記各実施例とほぼ同様の効果が得られる。
Furthermore, in the case shown in FIG. 4, the low refractive index region 9 is provided in the middle of the upper cladding layer 6, but even with this configuration, substantially the same effects as in each of the above embodiments can be obtained. .

〔発明の効果〕〔Effect of the invention〕

この発明は以上説明したとおり、活性層上に活性層の屈
折率よりも小さい屈折率を有する低屈折率領域を設ける
とともに、この低屈折率領域上に活性層の屈折率よりも
大きいか等しい屈折率を有する高屈折率領域を設けて外
部に露出させたので、活性層およびその近傍を伝搬する
レーザ光が低屈折率領域をトンネリングして高屈折率領
域に入った後外部に出射され、活性層に対して垂直方向
にレーザ光を取り出すことが可能になるという効果があ
る。
As explained above, this invention provides a low refractive index region having a refractive index smaller than the refractive index of the active layer on the active layer, and a refractive index larger than or equal to the refractive index of the active layer on the low refractive index region. Since a high refractive index region is provided and exposed to the outside, the laser light propagating in the active layer and its vicinity tunnels through the low refractive index region, enters the high refractive index region, and is emitted to the outside, causing the active layer to be exposed to the outside. This has the effect that laser light can be extracted in a direction perpendicular to the layer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の半導体レーザ装置の一実施例の構造
を説明するための図、第2図は光のトンネル効果の原理
を示す断面図、第3図および第4図はこの発明の他の実
施例の構造を示す断面図、第5図は従来の半導体レーザ
装置の構造を示す斜視図である。 図において、1はp側電極、2,11は基板、3は電流
ブロック層、4は下クラッド層、5は活性層、6は上ク
ラッド層、7はコンタクト層、8はn側電極、9は低屈
折率領域、10は高屈折率領域、12はコア領域、13
は間隙、14はプリズムである。 なお、各図中の同一符号は同一または相当部分を示す。 代理人 大 岩 増 雄    (外2名)第1図 ’s  岱4ul          It、l : 
J+屈*!!11*第2図 第3図 第4図 第5図 手続補正書(自発) 1、事件の表示   特願昭62−278504号2、
発明の名称  半導体レーザ装置 3、補正をする者 事件との関係 特許出願人 住 所    東京都千代田区丸の内二丁目2番3号。 名 称  (601)三菱電機株式会社代表者志岐守哉 4、代理人 住 所    東京都千代田区丸の内二丁目2番3号5
、補正の対象 明細書の発明の詳細な説明の欄 6、補正の内容 (1)明細書第2頁8行および12行の1−水平方向」
を、それぞれ[水平方向(共振器長方向)]と補正する
。 (2)同じく第3頁3〜4行の「設けて外部に露出させ
たものである。」を、(設けたものであろう」と補正す
る。 以  上
FIG. 1 is a diagram for explaining the structure of an embodiment of a semiconductor laser device of the present invention, FIG. 2 is a cross-sectional view showing the principle of the tunneling effect of light, and FIGS. FIG. 5 is a cross-sectional view showing the structure of an embodiment of the present invention, and FIG. 5 is a perspective view showing the structure of a conventional semiconductor laser device. In the figure, 1 is a p-side electrode, 2 and 11 are substrates, 3 is a current blocking layer, 4 is a lower cladding layer, 5 is an active layer, 6 is an upper cladding layer, 7 is a contact layer, 8 is an n-side electrode, 9 is a low refractive index region, 10 is a high refractive index region, 12 is a core region, 13
is a gap, and 14 is a prism. Note that the same reference numerals in each figure indicate the same or corresponding parts. Agent Masuo Oiwa (2 others) Figure 1's Dai 4ul It, l:
J + bend *! ! 11*Figure 2 Figure 3 Figure 4 Figure 5 Procedural amendment (voluntary) 1. Indication of the case Patent application No. 1982-278504 2.
Title of the invention: Semiconductor laser device 3, relationship to the amended case Patent applicant address: 2-2-3 Marunouchi, Chiyoda-ku, Tokyo. Name (601) Mitsubishi Electric Corporation Representative Moriya Shiki 4, Agent Address 2-2-3-5 Marunouchi, Chiyoda-ku, Tokyo
, Detailed Description of the Invention Column 6 of the Specification Subject to Amendment, Contents of the Amendment (1) Page 2 of the Specification, Lines 8 and 12, 1-Horizontal Direction.''
are respectively corrected in the [horizontal direction (resonator length direction)]. (2) Similarly, on page 3, lines 3 to 4, "It was installed and exposed to the outside." should be corrected to "It would have been installed."

Claims (1)

【特許請求の範囲】[Claims] 基板上に少なくとも下クラッド層、活性層、上クラッド
層およびコンタクト層が形成された半導体レーザ装置に
おいて、前記活性層上に前記活性層の屈折率よりも小さ
い屈折率を有する低屈折率領域を設けるとともに、この
低屈折率領域上に前記活性層の屈折率よりも大きいか等
しい屈折率を有する高屈折率領域を設けて外部に露出さ
せたことを特徴とする半導体レーザ装置。
In a semiconductor laser device in which at least a lower cladding layer, an active layer, an upper cladding layer, and a contact layer are formed on a substrate, a low refractive index region having a refractive index smaller than that of the active layer is provided on the active layer. Additionally, a high refractive index region having a refractive index greater than or equal to the refractive index of the active layer is provided on the low refractive index region and exposed to the outside.
JP27850487A 1987-11-04 1987-11-04 Semiconductor laser device Pending JPH01120881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27850487A JPH01120881A (en) 1987-11-04 1987-11-04 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27850487A JPH01120881A (en) 1987-11-04 1987-11-04 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPH01120881A true JPH01120881A (en) 1989-05-12

Family

ID=17598233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27850487A Pending JPH01120881A (en) 1987-11-04 1987-11-04 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH01120881A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016119397A (en) * 2014-12-22 2016-06-30 スタンレー電気株式会社 Semiconductor light emitting device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016119397A (en) * 2014-12-22 2016-06-30 スタンレー電気株式会社 Semiconductor light emitting device

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