JPH01101628A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPH01101628A
JPH01101628A JP62259366A JP25936687A JPH01101628A JP H01101628 A JPH01101628 A JP H01101628A JP 62259366 A JP62259366 A JP 62259366A JP 25936687 A JP25936687 A JP 25936687A JP H01101628 A JPH01101628 A JP H01101628A
Authority
JP
Japan
Prior art keywords
optical system
optical
exposure
focusing
reduction projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62259366A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548930B2 (ru
Inventor
Hidemi Amai
秀美 天井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62259366A priority Critical patent/JPH01101628A/ja
Publication of JPH01101628A publication Critical patent/JPH01101628A/ja
Publication of JPH0548930B2 publication Critical patent/JPH0548930B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0001—Post-treatment of organic pigments or dyes
    • C09B67/0014—Influencing the physical properties by treatment with a liquid, e.g. solvents
    • C09B67/0016—Influencing the physical properties by treatment with a liquid, e.g. solvents of phthalocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0025—Crystal modifications; Special X-ray patterns
    • C09B67/0026—Crystal modifications; Special X-ray patterns of phthalocyanine pigments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62259366A 1987-10-14 1987-10-14 縮小投影露光装置 Granted JPH01101628A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62259366A JPH01101628A (ja) 1987-10-14 1987-10-14 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62259366A JPH01101628A (ja) 1987-10-14 1987-10-14 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPH01101628A true JPH01101628A (ja) 1989-04-19
JPH0548930B2 JPH0548930B2 (ru) 1993-07-22

Family

ID=17333116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62259366A Granted JPH01101628A (ja) 1987-10-14 1987-10-14 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPH01101628A (ru)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135165A (ja) * 1993-11-11 1995-05-23 Nikon Corp 走査型露光装置
JPH07183188A (ja) * 1993-12-22 1995-07-21 Nikon Corp 走査型露光装置
JPH09306826A (ja) * 1996-05-10 1997-11-28 Semiconductor Energy Lab Co Ltd 露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5999437U (ja) * 1982-12-24 1984-07-05 株式会社日立製作所 複数個のランプを使用する露光光源装置
JPS601830A (ja) * 1983-06-20 1985-01-08 Nec Corp 目合せ露光機
JPS61226924A (ja) * 1985-04-01 1986-10-08 Canon Inc 露光装置
JPS622617A (ja) * 1985-06-28 1987-01-08 Matsushita Electric Ind Co Ltd 照明装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5999437U (ja) * 1982-12-24 1984-07-05 株式会社日立製作所 複数個のランプを使用する露光光源装置
JPS601830A (ja) * 1983-06-20 1985-01-08 Nec Corp 目合せ露光機
JPS61226924A (ja) * 1985-04-01 1986-10-08 Canon Inc 露光装置
JPS622617A (ja) * 1985-06-28 1987-01-08 Matsushita Electric Ind Co Ltd 照明装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135165A (ja) * 1993-11-11 1995-05-23 Nikon Corp 走査型露光装置
JPH07183188A (ja) * 1993-12-22 1995-07-21 Nikon Corp 走査型露光装置
JPH09306826A (ja) * 1996-05-10 1997-11-28 Semiconductor Energy Lab Co Ltd 露光装置

Also Published As

Publication number Publication date
JPH0548930B2 (ru) 1993-07-22

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