JP7796125B2 - 視野ファセットシステム及びリソグラフィ装置 - Google Patents

視野ファセットシステム及びリソグラフィ装置

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Publication number
JP7796125B2
JP7796125B2 JP2023530825A JP2023530825A JP7796125B2 JP 7796125 B2 JP7796125 B2 JP 7796125B2 JP 2023530825 A JP2023530825 A JP 2023530825A JP 2023530825 A JP2023530825 A JP 2023530825A JP 7796125 B2 JP7796125 B2 JP 7796125B2
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JP
Japan
Prior art keywords
facet
actuating
actuating elements
actuating element
spatial direction
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JP2023530825A
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English (en)
Japanese (ja)
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JP2023549968A5 (enExample
JP2023549968A (ja
Inventor
シュミットナー アルノ
アンデレル ウィリー
アメリン ラルフ
リッポルト シュテファン
ロッセルズ ヨラム
ウィルヘルムス マリア ヤンセン ロブ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2023549968A5 publication Critical patent/JP2023549968A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2023530825A 2020-11-25 2021-11-17 視野ファセットシステム及びリソグラフィ装置 Active JP7796125B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102020214800.7A DE102020214800A1 (de) 2020-11-25 2020-11-25 Feldfacettensystem und lithographieanlage
DE102020214800.7 2020-11-25
PCT/EP2021/082009 WO2022112071A1 (de) 2020-11-25 2021-11-17 Feldfacettensystem und lithographieanlage

Publications (3)

Publication Number Publication Date
JP2023549968A JP2023549968A (ja) 2023-11-29
JP2023549968A5 JP2023549968A5 (enExample) 2024-11-25
JP7796125B2 true JP7796125B2 (ja) 2026-01-08

Family

ID=78820403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023530825A Active JP7796125B2 (ja) 2020-11-25 2021-11-17 視野ファセットシステム及びリソグラフィ装置

Country Status (5)

Country Link
US (1) US12547080B2 (enExample)
JP (1) JP7796125B2 (enExample)
CN (1) CN116472499A (enExample)
DE (1) DE102020214800A1 (enExample)
WO (1) WO2022112071A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022116695A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Grundkörper für ein optisches Element und Verfahren zur Herstellung eines Grundkörpers für ein optisches Element sowie Projektionsbelichtungsanlage
DE102023204749A1 (de) * 2023-05-22 2024-11-28 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines Festkörperaktuators in einer mikrolithographischen Projektionsbelichtungsanlage
DE102024204402A1 (de) * 2024-05-13 2025-11-13 Carl Zeiss Smt Gmbh Anordnung und Verfahren zur Kalibrierung eines MEMS mit Mikrospiegeln

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002083767A (ja) 2000-07-13 2002-03-22 Asm Lithography Bv リソグラフィ装置、デバイス製造方法およびそれにより製造されるデバイス
JP2005506574A (ja) 2001-10-20 2005-03-03 カール ツアイス エスエムティー アーゲー 光軸を有する光学部品
JP2010245541A (ja) 2009-04-09 2010-10-28 Carl Zeiss Smt Ag 光線束を案内するためのミラー
JP2012504329A (ja) 2008-09-30 2012-02-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体部品を製造するためのマイクロリソグラフィ用の投影露光装置
US20130100429A1 (en) 2010-07-01 2013-04-25 Carl Zeiss Smt Gmbh Optical system and multi facet mirror of a microlithographic projection exposure apparatus
JP2015222417A (ja) 2014-04-28 2015-12-10 株式会社ブイ・テクノロジー 露光装置及び露光方法
JP2017517032A (ja) 2014-06-03 2017-06-22 エーエスエムエル ネザーランズ ビー．ブイ． 露光プロセスにおける露光誤差を補償するための方法
JP2017134389A (ja) 2016-01-27 2017-08-03 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6880942B2 (en) * 2002-06-20 2005-04-19 Nikon Corporation Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
DE102005004460A1 (de) * 2005-02-01 2006-08-10 Carl Zeiss Smt Ag Verfahren und Messmittel zur indirekten Bestimmung der örtlichen Bestrahlungsstärke in einem optischen System
CN102063913B (zh) * 2009-11-12 2013-12-18 日立民用电子株式会社 变形镜致动器和光盘装置
WO2012039353A1 (ja) * 2010-09-22 2012-03-29 株式会社ニコン 空間光変調器、露光装置、及びデバイス製造方法
WO2012175116A1 (en) * 2011-06-21 2012-12-27 Carl Zeiss Smt Gmbh Facet mirror device
EP2906994B1 (en) * 2012-10-15 2020-03-25 ASML Netherlands B.V. Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
DE102013206981A1 (de) 2013-04-18 2013-12-24 Carl Zeiss Smt Gmbh Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu
WO2015144370A1 (en) * 2014-03-18 2015-10-01 Asml Netherlands B.V. Housing for an array of densely spaced components and associated manufacturing method
DE102015223518A1 (de) 2015-11-27 2017-05-18 Carl Zeiss Smt Gmbh Optische Vorrichtung sowie Lithographieanlage
DE102017221420A1 (de) 2017-11-29 2018-11-29 Carl Zeiss Smt Gmbh Euv-beleuchtungssystem und verfahren zum erzeugen einer beleuchtungsstrahlung
DE102019200358A1 (de) * 2019-01-14 2019-03-21 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit Mitteln zur Reduzierung des Wärmeübertrags

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002083767A (ja) 2000-07-13 2002-03-22 Asm Lithography Bv リソグラフィ装置、デバイス製造方法およびそれにより製造されるデバイス
JP2005506574A (ja) 2001-10-20 2005-03-03 カール ツアイス エスエムティー アーゲー 光軸を有する光学部品
JP2012504329A (ja) 2008-09-30 2012-02-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体部品を製造するためのマイクロリソグラフィ用の投影露光装置
JP2010245541A (ja) 2009-04-09 2010-10-28 Carl Zeiss Smt Ag 光線束を案内するためのミラー
US20130100429A1 (en) 2010-07-01 2013-04-25 Carl Zeiss Smt Gmbh Optical system and multi facet mirror of a microlithographic projection exposure apparatus
JP2015222417A (ja) 2014-04-28 2015-12-10 株式会社ブイ・テクノロジー 露光装置及び露光方法
JP2017517032A (ja) 2014-06-03 2017-06-22 エーエスエムエル ネザーランズ ビー．ブイ． 露光プロセスにおける露光誤差を補償するための方法
JP2017134389A (ja) 2016-01-27 2017-08-03 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法

Also Published As

Publication number Publication date
US12547080B2 (en) 2026-02-10
DE102020214800A1 (de) 2022-05-25
US20230384686A1 (en) 2023-11-30
CN116472499A (zh) 2023-07-21
JP2023549968A (ja) 2023-11-29
WO2022112071A1 (de) 2022-06-02

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