JP7732128B2 - レーザ照射装置、レーザ加工装置、レーザ加工方法、マスクの設置方法、レーザ加工装置の設置方法及びマスク - Google Patents
レーザ照射装置、レーザ加工装置、レーザ加工方法、マスクの設置方法、レーザ加工装置の設置方法及びマスクInfo
- Publication number
- JP7732128B2 JP7732128B2 JP2025505524A JP2025505524A JP7732128B2 JP 7732128 B2 JP7732128 B2 JP 7732128B2 JP 2025505524 A JP2025505524 A JP 2025505524A JP 2025505524 A JP2025505524 A JP 2025505524A JP 7732128 B2 JP7732128 B2 JP 7732128B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- laser
- irradiation
- optical function
- function unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/10—Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025136648A JP2025172782A (ja) | 2023-04-19 | 2025-08-20 | レーザ照射装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/015669 WO2024218918A1 (ja) | 2023-04-19 | 2023-04-19 | レーザ照射装置、レーザ加工装置、レーザ加工方法、レーザ露光装置、レーザ露光方法、マスクの設置方法、レーザ加工装置の設置方法、レーザ露光装置の設置方法、マスク及びレーザ照射システム |
| JPPCT/JP2023/015669 | 2023-04-19 | ||
| PCT/JP2024/015412 WO2024219462A1 (ja) | 2023-04-19 | 2024-04-18 | レーザ照射装置、レーザ加工装置、レーザ加工方法、マスクの設置方法、レーザ加工装置の設置方法及びマスク |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025136648A Division JP2025172782A (ja) | 2023-04-19 | 2025-08-20 | レーザ照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024219462A1 JPWO2024219462A1 (https=) | 2024-10-24 |
| JP7732128B2 true JP7732128B2 (ja) | 2025-09-01 |
Family
ID=93152126
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025505524A Active JP7732128B2 (ja) | 2023-04-19 | 2024-04-18 | レーザ照射装置、レーザ加工装置、レーザ加工方法、マスクの設置方法、レーザ加工装置の設置方法及びマスク |
| JP2025136648A Pending JP2025172782A (ja) | 2023-04-19 | 2025-08-20 | レーザ照射装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025136648A Pending JP2025172782A (ja) | 2023-04-19 | 2025-08-20 | レーザ照射装置 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4699733A1 (https=) |
| JP (2) | JP7732128B2 (https=) |
| KR (1) | KR20250166219A (https=) |
| CN (2) | CN121001847A (https=) |
| TW (3) | TWM671671U (https=) |
| WO (2) | WO2024218918A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007122027A (ja) | 2005-09-28 | 2007-05-17 | Semiconductor Energy Lab Co Ltd | レーザー処理装置、露光装置及び露光方法 |
| US20090303454A1 (en) | 2008-06-10 | 2009-12-10 | Nikon Corporation | Exposure apparatus with a scanning illumination beam |
| WO2023002555A1 (ja) | 2021-07-20 | 2023-01-26 | 信越化学工業株式会社 | 走査型縮小投影光学系及びこれを用いたレーザ加工装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09152567A (ja) * | 1995-11-30 | 1997-06-10 | Hitachi Ltd | レジストパターン形成方法およびその装置 |
| JP2001079678A (ja) | 1999-09-13 | 2001-03-27 | Sumitomo Heavy Ind Ltd | レーザ穴あけ加工方法及び加工装置 |
| JP7393087B2 (ja) | 2019-09-26 | 2023-12-06 | 株式会社オーク製作所 | アブレーション加工用の加工装置および加工方法 |
-
2023
- 2023-04-19 WO PCT/JP2023/015669 patent/WO2024218918A1/ja not_active Ceased
-
2024
- 2024-04-18 TW TW113213355U patent/TWM671671U/zh unknown
- 2024-04-18 JP JP2025505524A patent/JP7732128B2/ja active Active
- 2024-04-18 KR KR1020257034357A patent/KR20250166219A/ko active Pending
- 2024-04-18 CN CN202480025567.6A patent/CN121001847A/zh active Pending
- 2024-04-18 CN CN202420802967.0U patent/CN222429562U/zh active Active
- 2024-04-18 WO PCT/JP2024/015412 patent/WO2024219462A1/ja not_active Ceased
- 2024-04-18 TW TW113114410A patent/TW202442360A/zh unknown
- 2024-04-18 EP EP24792734.6A patent/EP4699733A1/en active Pending
- 2024-04-18 TW TW113203851U patent/TWM664974U/zh unknown
-
2025
- 2025-08-20 JP JP2025136648A patent/JP2025172782A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007122027A (ja) | 2005-09-28 | 2007-05-17 | Semiconductor Energy Lab Co Ltd | レーザー処理装置、露光装置及び露光方法 |
| US20090303454A1 (en) | 2008-06-10 | 2009-12-10 | Nikon Corporation | Exposure apparatus with a scanning illumination beam |
| WO2023002555A1 (ja) | 2021-07-20 | 2023-01-26 | 信越化学工業株式会社 | 走査型縮小投影光学系及びこれを用いたレーザ加工装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024219462A1 (ja) | 2024-10-24 |
| JPWO2024219462A1 (https=) | 2024-10-24 |
| JP2025172782A (ja) | 2025-11-26 |
| CN222429562U (zh) | 2025-02-07 |
| EP4699733A1 (en) | 2026-02-25 |
| WO2024218918A1 (ja) | 2024-10-24 |
| TWM664974U (zh) | 2025-01-01 |
| CN121001847A (zh) | 2025-11-21 |
| TWM671671U (zh) | 2025-06-21 |
| TW202442360A (zh) | 2024-11-01 |
| KR20250166219A (ko) | 2025-11-27 |
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