JP7722363B2 - ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法 - Google Patents

ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法

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Publication number
JP7722363B2
JP7722363B2 JP2022522564A JP2022522564A JP7722363B2 JP 7722363 B2 JP7722363 B2 JP 7722363B2 JP 2022522564 A JP2022522564 A JP 2022522564A JP 2022522564 A JP2022522564 A JP 2022522564A JP 7722363 B2 JP7722363 B2 JP 7722363B2
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JP
Japan
Prior art keywords
glass plate
main surface
stage
irradiation
gas
Prior art date
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Active
Application number
JP2022522564A
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English (en)
Japanese (ja)
Other versions
JPWO2021229968A1 (https=
Inventor
拓真 奈良
昌彦 田村
哲史 山名
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2021229968A1 publication Critical patent/JPWO2021229968A1/ja
Application granted granted Critical
Publication of JP7722363B2 publication Critical patent/JP7722363B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2022522564A 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法 Active JP7722363B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020084728 2020-05-13
JP2020084728 2020-05-13
PCT/JP2021/015071 WO2021229968A1 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021229968A1 JPWO2021229968A1 (https=) 2021-11-18
JP7722363B2 true JP7722363B2 (ja) 2025-08-13

Family

ID=78525778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022522564A Active JP7722363B2 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法

Country Status (2)

Country Link
JP (1) JP7722363B2 (https=)
WO (1) WO2021229968A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007330992A (ja) 2006-06-14 2007-12-27 Olympus Corp 被加工物の加工方法及び装置
JP2008156215A (ja) 2006-12-01 2008-07-10 Asahi Glass Co Ltd 予備研磨されたガラス基板表面を仕上げ加工する方法
WO2011115131A1 (ja) 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016038573A (ja) 2014-08-07 2016-03-22 旭硝子株式会社 マスクブランク用ガラス基板、および、その製造方法
JP2016191952A (ja) 2012-12-27 2016-11-10 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
JP2018052804A (ja) 2016-09-21 2018-04-05 旭硝子株式会社 ガラス板およびガラス基板の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JP6048817B2 (ja) * 2012-12-27 2016-12-21 日本電気硝子株式会社 板状ガラスの表面処理装置及び表面処理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007330992A (ja) 2006-06-14 2007-12-27 Olympus Corp 被加工物の加工方法及び装置
JP2008156215A (ja) 2006-12-01 2008-07-10 Asahi Glass Co Ltd 予備研磨されたガラス基板表面を仕上げ加工する方法
WO2011115131A1 (ja) 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016191952A (ja) 2012-12-27 2016-11-10 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
JP2016038573A (ja) 2014-08-07 2016-03-22 旭硝子株式会社 マスクブランク用ガラス基板、および、その製造方法
JP2018052804A (ja) 2016-09-21 2018-04-05 旭硝子株式会社 ガラス板およびガラス基板の製造方法

Also Published As

Publication number Publication date
JPWO2021229968A1 (https=) 2021-11-18
WO2021229968A1 (ja) 2021-11-18

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