JPWO2021229968A1 - - Google Patents

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Publication number
JPWO2021229968A1
JPWO2021229968A1 JP2022522564A JP2022522564A JPWO2021229968A1 JP WO2021229968 A1 JPWO2021229968 A1 JP WO2021229968A1 JP 2022522564 A JP2022522564 A JP 2022522564A JP 2022522564 A JP2022522564 A JP 2022522564A JP WO2021229968 A1 JPWO2021229968 A1 JP WO2021229968A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022522564A
Other languages
Japanese (ja)
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JP7722363B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of JPWO2021229968A1 publication Critical patent/JPWO2021229968A1/ja
Application granted granted Critical
Publication of JP7722363B2 publication Critical patent/JP7722363B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2022522564A 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法 Active JP7722363B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020084728 2020-05-13
JP2020084728 2020-05-13
PCT/JP2021/015071 WO2021229968A1 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021229968A1 true JPWO2021229968A1 (https=) 2021-11-18
JP7722363B2 JP7722363B2 (ja) 2025-08-13

Family

ID=78525778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022522564A Active JP7722363B2 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法

Country Status (2)

Country Link
JP (1) JP7722363B2 (https=)
WO (1) WO2021229968A1 (https=)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JP2007330992A (ja) * 2006-06-14 2007-12-27 Olympus Corp 被加工物の加工方法及び装置
JP2008156215A (ja) * 2006-12-01 2008-07-10 Asahi Glass Co Ltd 予備研磨されたガラス基板表面を仕上げ加工する方法
WO2011115131A1 (ja) * 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016038573A (ja) * 2014-08-07 2016-03-22 旭硝子株式会社 マスクブランク用ガラス基板、および、その製造方法
JP2016191952A (ja) * 2012-12-27 2016-11-10 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
JP2018052804A (ja) * 2016-09-21 2018-04-05 旭硝子株式会社 ガラス板およびガラス基板の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6048817B2 (ja) * 2012-12-27 2016-12-21 日本電気硝子株式会社 板状ガラスの表面処理装置及び表面処理方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JP2007330992A (ja) * 2006-06-14 2007-12-27 Olympus Corp 被加工物の加工方法及び装置
JP2008156215A (ja) * 2006-12-01 2008-07-10 Asahi Glass Co Ltd 予備研磨されたガラス基板表面を仕上げ加工する方法
WO2011115131A1 (ja) * 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016191952A (ja) * 2012-12-27 2016-11-10 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
JP2016038573A (ja) * 2014-08-07 2016-03-22 旭硝子株式会社 マスクブランク用ガラス基板、および、その製造方法
JP2018052804A (ja) * 2016-09-21 2018-04-05 旭硝子株式会社 ガラス板およびガラス基板の製造方法

Also Published As

Publication number Publication date
WO2021229968A1 (ja) 2021-11-18
JP7722363B2 (ja) 2025-08-13

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