JP7708340B2 - 蒸着マスク及び、電子デバイスの製造方法 - Google Patents

蒸着マスク及び、電子デバイスの製造方法

Info

Publication number
JP7708340B2
JP7708340B2 JP2024573596A JP2024573596A JP7708340B2 JP 7708340 B2 JP7708340 B2 JP 7708340B2 JP 2024573596 A JP2024573596 A JP 2024573596A JP 2024573596 A JP2024573596 A JP 2024573596A JP 7708340 B2 JP7708340 B2 JP 7708340B2
Authority
JP
Japan
Prior art keywords
deposition
opening
substrate
deposition mask
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024573596A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025033509A1 (https=
JPWO2025033509A5 (https=
Inventor
葵 佐野
数馬 碓氷
浩之 道
涼真 茂木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Holdings Inc
Original Assignee
Toppan Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Holdings Inc filed Critical Toppan Holdings Inc
Publication of JPWO2025033509A1 publication Critical patent/JPWO2025033509A1/ja
Priority to JP2025112685A priority Critical patent/JP2025129319A/ja
Application granted granted Critical
Publication of JP7708340B2 publication Critical patent/JP7708340B2/ja
Publication of JPWO2025033509A5 publication Critical patent/JPWO2025033509A5/ja
Priority to JP2025179712A priority patent/JP2026012861A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Semiconductors (AREA)
JP2024573596A 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法 Active JP7708340B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2025112685A JP2025129319A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179712A JP2026012861A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130555 2023-08-10
JP2023130555 2023-08-10
PCT/JP2024/028531 WO2025033509A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025112685A Division JP2025129319A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025033509A1 JPWO2025033509A1 (https=) 2025-02-13
JP7708340B2 true JP7708340B2 (ja) 2025-07-15
JPWO2025033509A5 JPWO2025033509A5 (https=) 2025-07-15

Family

ID=94534448

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024573596A Active JP7708340B2 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法
JP2025112685A Pending JP2025129319A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179712A Pending JP2026012861A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2025112685A Pending JP2025129319A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179712A Pending JP2026012861A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Country Status (4)

Country Link
JP (3) JP7708340B2 (https=)
KR (1) KR20250112824A (https=)
CN (1) CN121263548A (https=)
WO (1) WO2025033509A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Also Published As

Publication number Publication date
JP2026012861A (ja) 2026-01-27
JPWO2025033509A1 (https=) 2025-02-13
WO2025033509A1 (ja) 2025-02-13
CN121263548A (zh) 2026-01-02
KR20250112824A (ko) 2025-07-24
JP2025129319A (ja) 2025-09-04

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