CN121263548A - 蒸镀掩模以及电子器件的制造方法 - Google Patents

蒸镀掩模以及电子器件的制造方法

Info

Publication number
CN121263548A
CN121263548A CN202480037831.8A CN202480037831A CN121263548A CN 121263548 A CN121263548 A CN 121263548A CN 202480037831 A CN202480037831 A CN 202480037831A CN 121263548 A CN121263548 A CN 121263548A
Authority
CN
China
Prior art keywords
vapor deposition
opening
deposition mask
substrate
opening width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480037831.8A
Other languages
English (en)
Chinese (zh)
Inventor
佐野葵
碓冰数马
道浩之
茂木凉真
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takahashi Holdings Co ltd
Original Assignee
Takahashi Holdings Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takahashi Holdings Co ltd filed Critical Takahashi Holdings Co ltd
Publication of CN121263548A publication Critical patent/CN121263548A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228Gas flow assisted PVD deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Semiconductors (AREA)
CN202480037831.8A 2023-08-10 2024-08-08 蒸镀掩模以及电子器件的制造方法 Pending CN121263548A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130555 2023-08-10
JP2023-130555 2023-08-10
PCT/JP2024/028531 WO2025033509A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
CN121263548A true CN121263548A (zh) 2026-01-02

Family

ID=94534448

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480037831.8A Pending CN121263548A (zh) 2023-08-10 2024-08-08 蒸镀掩模以及电子器件的制造方法

Country Status (4)

Country Link
JP (3) JP7708340B2 (https=)
KR (1) KR20250112824A (https=)
CN (1) CN121263548A (https=)
WO (1) WO2025033509A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
CN108735915B (zh) * 2017-04-14 2021-02-09 上海视涯技术有限公司 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
JP7432133B2 (ja) * 2019-03-25 2024-02-16 大日本印刷株式会社 マスク
JP2022184708A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
US20250122606A1 (en) * 2022-01-31 2025-04-17 Dai Nippon Printing Co., Ltd. Vapor deposition mask, framed vapor deposition mask, method of manufacturing vapor deposition mask, method of manufacturing organic device, and method of manufacturing framed vapor deposition mask
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Also Published As

Publication number Publication date
JP2026012861A (ja) 2026-01-27
JPWO2025033509A1 (https=) 2025-02-13
WO2025033509A1 (ja) 2025-02-13
JP7708340B2 (ja) 2025-07-15
KR20250112824A (ko) 2025-07-24
JP2025129319A (ja) 2025-09-04

Similar Documents

Publication Publication Date Title
US10381232B2 (en) Techniques for manipulating patterned features using ions
JP3150053U (ja) シャワーヘッド電極
TWI890724B (zh) 電漿增強型化學氣相沈積裝置及方法
US20170081176A1 (en) Mems device, semiconductor device and method for manufacturing the same
CN119486395B (zh) 一种利用多层掩膜与分段刻蚀改善Micro LED台面形貌的方法
CN121263548A (zh) 蒸镀掩模以及电子器件的制造方法
JP2026012862A (ja) 蒸着マスク及び、電子デバイスの製造方法
US12334353B2 (en) Method and apparatus for plasma etching
JP7708338B2 (ja) 蒸着マスク及び、電子デバイスの製造方法
JP7823804B1 (ja) 蒸着マスク及び、電子デバイスの製造方法
WO2025105425A1 (ja) 蒸着マスク、及び電子デバイスの製造方法
CN1268922A (zh) 在表面上形成硅层的方法
KR102955237B1 (ko) 웨이퍼 프레임 연속 가공 마스크의 제조방법 및 이에 의해 제조된 웨이퍼 프레임 연속형 마스크
TW202538075A (zh) 遮罩及遮罩之製造方法
KR102955251B1 (ko) 웨이퍼 프레임 연속 가공 마스크의 제조방법 및 이에 의해 제조된 웨이퍼 프레임 연속형 마스크
US12571084B2 (en) Corrugated high-resolution shadow masks
WO2023138081A1 (en) Corrugated high-resolution shadow masks
US11658040B2 (en) Plasma processing method
KR20240167594A (ko) 웨이퍼 프레임 연속 가공 마스크의 제조방법 및 이에 의해 제조된 웨이퍼 프레임 연속형 마스크
CN118103545A (zh) 波纹状高分辨率荫罩
JP2013072134A (ja) 窒化アルミニウム膜の形成方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination