KR20250112824A - 증착 마스크, 및 전자 디바이스의 제조 방법 - Google Patents

증착 마스크, 및 전자 디바이스의 제조 방법

Info

Publication number
KR20250112824A
KR20250112824A KR1020257020411A KR20257020411A KR20250112824A KR 20250112824 A KR20250112824 A KR 20250112824A KR 1020257020411 A KR1020257020411 A KR 1020257020411A KR 20257020411 A KR20257020411 A KR 20257020411A KR 20250112824 A KR20250112824 A KR 20250112824A
Authority
KR
South Korea
Prior art keywords
deposition
opening
deposition mask
substrate
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257020411A
Other languages
English (en)
Korean (ko)
Inventor
아오이 사노
가즈마 우스이
히로유키 미치
료마 모테기
Original Assignee
도판 홀딩스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도판 홀딩스 가부시키가이샤 filed Critical 도판 홀딩스 가부시키가이샤
Publication of KR20250112824A publication Critical patent/KR20250112824A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Semiconductors (AREA)
KR1020257020411A 2023-08-10 2024-08-08 증착 마스크, 및 전자 디바이스의 제조 방법 Pending KR20250112824A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2023-130555 2023-08-10
JP2023130555 2023-08-10
PCT/JP2024/028531 WO2025033509A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20250112824A true KR20250112824A (ko) 2025-07-24

Family

ID=94534448

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257020411A Pending KR20250112824A (ko) 2023-08-10 2024-08-08 증착 마스크, 및 전자 디바이스의 제조 방법

Country Status (4)

Country Link
JP (3) JP7708340B2 (https=)
KR (1) KR20250112824A (https=)
CN (1) CN121263548A (https=)
WO (1) WO2025033509A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
JP7432133B2 (ja) * 2019-03-25 2024-02-16 大日本印刷株式会社 マスク
US20250122606A1 (en) * 2022-01-31 2025-04-17 Dai Nippon Printing Co., Ltd. Vapor deposition mask, framed vapor deposition mask, method of manufacturing vapor deposition mask, method of manufacturing organic device, and method of manufacturing framed vapor deposition mask
CN121263548A (zh) * 2023-08-10 2026-01-02 凸版控股株式会社 蒸镀掩模以及电子器件的制造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法

Also Published As

Publication number Publication date
JP2026012861A (ja) 2026-01-27
JPWO2025033509A1 (https=) 2025-02-13
WO2025033509A1 (ja) 2025-02-13
JP7708340B2 (ja) 2025-07-15
CN121263548A (zh) 2026-01-02
JP2025129319A (ja) 2025-09-04

Similar Documents

Publication Publication Date Title
US11404278B2 (en) Optical component having variable depth gratings and method of formation
TWI719156B (zh) 對襯底進行加工的方法
JP3150053U (ja) シャワーヘッド電極
US20080289766A1 (en) Hot edge ring apparatus and method for increased etch rate uniformity and reduced polymer buildup
TWI890724B (zh) 電漿增強型化學氣相沈積裝置及方法
US8975191B2 (en) Plasma etching method
KR100782632B1 (ko) 절연막의 에칭 방법
JP2026012861A (ja) 蒸着マスク及び、電子デバイスの製造方法
JP2026012862A (ja) 蒸着マスク及び、電子デバイスの製造方法
TW201906081A (zh) 射流組裝基板及製造此基板之方法
JP7708338B2 (ja) 蒸着マスク及び、電子デバイスの製造方法
US12334353B2 (en) Method and apparatus for plasma etching
KR100248342B1 (ko) 반도체소자의 금속 배선 형성방법
JP7823804B1 (ja) 蒸着マスク及び、電子デバイスの製造方法
WO2025105425A1 (ja) 蒸着マスク、及び電子デバイスの製造方法
KR102509259B1 (ko) 하이브리드 방식에 의해 증착용 마스크를 제조하는 방법
KR102955251B1 (ko) 웨이퍼 프레임 연속 가공 마스크의 제조방법 및 이에 의해 제조된 웨이퍼 프레임 연속형 마스크
US12571084B2 (en) Corrugated high-resolution shadow masks
WO2023138081A1 (en) Corrugated high-resolution shadow masks
TW202538075A (zh) 遮罩及遮罩之製造方法
CN118103545A (zh) 波纹状高分辨率荫罩
US20200411327A1 (en) Plasma processing method
US8367965B2 (en) Electrode design for plasma processing chamber
CN120300064A (zh) 一种半导体器件的制备方法
JP2005089771A (ja) 撥水性構造およびその製造方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

Q12 Application published

Free format text: ST27 STATUS EVENT CODE: A-1-1-Q10-Q12-NAP-PG1501 (AS PROVIDED BY THE NATIONAL OFFICE)