JP7708338B2 - 蒸着マスク及び、電子デバイスの製造方法 - Google Patents

蒸着マスク及び、電子デバイスの製造方法

Info

Publication number
JP7708338B2
JP7708338B2 JP2024573594A JP2024573594A JP7708338B2 JP 7708338 B2 JP7708338 B2 JP 7708338B2 JP 2024573594 A JP2024573594 A JP 2024573594A JP 2024573594 A JP2024573594 A JP 2024573594A JP 7708338 B2 JP7708338 B2 JP 7708338B2
Authority
JP
Japan
Prior art keywords
deposition
opening
unevenness
less
deposition mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024573594A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025033507A5 (https=
JPWO2025033507A1 (https=
Inventor
公栄 大塚
数馬 碓氷
浩之 道
涼真 茂木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Holdings Inc
Original Assignee
Toppan Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Holdings Inc filed Critical Toppan Holdings Inc
Publication of JPWO2025033507A1 publication Critical patent/JPWO2025033507A1/ja
Priority to JP2025112684A priority Critical patent/JP2025129318A/ja
Application granted granted Critical
Publication of JPWO2025033507A5 publication Critical patent/JPWO2025033507A5/ja
Publication of JP7708338B2 publication Critical patent/JP7708338B2/ja
Priority to JP2025179711A priority patent/JP2026002996A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2024573594A 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法 Active JP7708338B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2025112684A JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130554 2023-08-10
JP2023130554 2023-08-10
PCT/JP2024/028528 WO2025033507A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025112684A Division JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025033507A1 JPWO2025033507A1 (https=) 2025-02-13
JPWO2025033507A5 JPWO2025033507A5 (https=) 2025-07-15
JP7708338B2 true JP7708338B2 (ja) 2025-07-15

Family

ID=94534440

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024573594A Active JP7708338B2 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法
JP2025112684A Pending JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A Pending JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2025112684A Pending JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A Pending JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Country Status (4)

Country Link
JP (3) JP7708338B2 (https=)
KR (1) KR20250111176A (https=)
CN (1) CN121263549A (https=)
WO (1) WO2025033507A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Also Published As

Publication number Publication date
JP2026002996A (ja) 2026-01-08
WO2025033507A1 (ja) 2025-02-13
JP2025129318A (ja) 2025-09-04
JPWO2025033507A1 (https=) 2025-02-13
KR20250111176A (ko) 2025-07-22
CN121263549A (zh) 2026-01-02

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