CN121263549A - 蒸镀掩模以及电子器件的制造方法 - Google Patents
蒸镀掩模以及电子器件的制造方法Info
- Publication number
- CN121263549A CN121263549A CN202480037903.9A CN202480037903A CN121263549A CN 121263549 A CN121263549 A CN 121263549A CN 202480037903 A CN202480037903 A CN 202480037903A CN 121263549 A CN121263549 A CN 121263549A
- Authority
- CN
- China
- Prior art keywords
- vapor deposition
- deposition mask
- opening
- opening width
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023-130554 | 2023-08-10 | ||
| JP2023130554 | 2023-08-10 | ||
| PCT/JP2024/028528 WO2025033507A1 (ja) | 2023-08-10 | 2024-08-08 | 蒸着マスク及び、電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN121263549A true CN121263549A (zh) | 2026-01-02 |
Family
ID=94534440
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202480037903.9A Pending CN121263549A (zh) | 2023-08-10 | 2024-08-08 | 蒸镀掩模以及电子器件的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (3) | JP7708338B2 (https=) |
| KR (1) | KR20250111176A (https=) |
| CN (1) | CN121263549A (https=) |
| WO (1) | WO2025033507A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008189990A (ja) | 2007-02-05 | 2008-08-21 | Seiko Epson Corp | 蒸着用マスクおよび蒸着用マスクの製造方法 |
| CN108735915B (zh) * | 2017-04-14 | 2021-02-09 | 上海视涯技术有限公司 | 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 |
| JP7432133B2 (ja) | 2019-03-25 | 2024-02-16 | 大日本印刷株式会社 | マスク |
| JP2022184708A (ja) | 2021-05-31 | 2022-12-13 | キヤノン株式会社 | 蒸着マスク、及び有機電子デバイスの製造方法 |
| US20250122606A1 (en) * | 2022-01-31 | 2025-04-17 | Dai Nippon Printing Co., Ltd. | Vapor deposition mask, framed vapor deposition mask, method of manufacturing vapor deposition mask, method of manufacturing organic device, and method of manufacturing framed vapor deposition mask |
-
2024
- 2024-08-08 KR KR1020257020407A patent/KR20250111176A/ko active Pending
- 2024-08-08 WO PCT/JP2024/028528 patent/WO2025033507A1/ja active Pending
- 2024-08-08 JP JP2024573594A patent/JP7708338B2/ja active Active
- 2024-08-08 CN CN202480037903.9A patent/CN121263549A/zh active Pending
-
2025
- 2025-07-03 JP JP2025112684A patent/JP2025129318A/ja active Pending
- 2025-10-24 JP JP2025179711A patent/JP2026002996A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2026002996A (ja) | 2026-01-08 |
| WO2025033507A1 (ja) | 2025-02-13 |
| JP2025129318A (ja) | 2025-09-04 |
| JPWO2025033507A1 (https=) | 2025-02-13 |
| KR20250111176A (ko) | 2025-07-22 |
| JP7708338B2 (ja) | 2025-07-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |