JPWO2025033507A1 - - Google Patents

Info

Publication number
JPWO2025033507A1
JPWO2025033507A1 JP2024573594A JP2024573594A JPWO2025033507A1 JP WO2025033507 A1 JPWO2025033507 A1 JP WO2025033507A1 JP 2024573594 A JP2024573594 A JP 2024573594A JP 2024573594 A JP2024573594 A JP 2024573594A JP WO2025033507 A1 JPWO2025033507 A1 JP WO2025033507A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024573594A
Other languages
Japanese (ja)
Other versions
JPWO2025033507A5 (https=
JP7708338B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025033507A1 publication Critical patent/JPWO2025033507A1/ja
Priority to JP2025112684A priority Critical patent/JP2025129318A/ja
Application granted granted Critical
Publication of JPWO2025033507A5 publication Critical patent/JPWO2025033507A5/ja
Publication of JP7708338B2 publication Critical patent/JP7708338B2/ja
Priority to JP2025179711A priority patent/JP2026002996A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2024573594A 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法 Active JP7708338B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2025112684A JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130554 2023-08-10
JP2023130554 2023-08-10
PCT/JP2024/028528 WO2025033507A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025112684A Division JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025033507A1 true JPWO2025033507A1 (https=) 2025-02-13
JPWO2025033507A5 JPWO2025033507A5 (https=) 2025-07-15
JP7708338B2 JP7708338B2 (ja) 2025-07-15

Family

ID=94534440

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024573594A Active JP7708338B2 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法
JP2025112684A Pending JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A Pending JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2025112684A Pending JP2025129318A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179711A Pending JP2026002996A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Country Status (4)

Country Link
JP (3) JP7708338B2 (https=)
KR (1) KR20250111176A (https=)
CN (1) CN121263549A (https=)
WO (1) WO2025033507A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) * 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) * 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) * 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) * 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) * 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) * 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Also Published As

Publication number Publication date
JP2026002996A (ja) 2026-01-08
WO2025033507A1 (ja) 2025-02-13
JP2025129318A (ja) 2025-09-04
KR20250111176A (ko) 2025-07-22
CN121263549A (zh) 2026-01-02
JP7708338B2 (ja) 2025-07-15

Similar Documents

Publication Publication Date Title
JPWO2023145951A1 (https=)
JPWO2025033509A1 (https=)
JPWO2025033507A1 (https=)
BR102023007252A2 (https=)
BR102023005164A2 (https=)
BR102023001987A2 (https=)
BY13165U (https=)
BY13162U (https=)
CN307050377S (https=)
CN307049823S (https=)
CN307049596S (https=)
CN307048301S (https=)
CN307047478S (https=)
CN307047461S (https=)
CN307047453S (https=)
CN307046553S (https=)
CN307046550S (https=)
CN307046280S (https=)
CN307046127S (https=)
CN307046124S (https=)
CN307045506S (https=)
CN307044234S (https=)
BY13168U (https=)
BY13166U (https=)
BY13155U (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241216

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20241216

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20241216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250318

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250425

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250603

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250616

R150 Certificate of patent or registration of utility model

Ref document number: 7708338

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150