JP7664427B2 - 荷電粒子線装置及びそれを用いた検査方法 - Google Patents
荷電粒子線装置及びそれを用いた検査方法 Download PDFInfo
- Publication number
- JP7664427B2 JP7664427B2 JP2023574924A JP2023574924A JP7664427B2 JP 7664427 B2 JP7664427 B2 JP 7664427B2 JP 2023574924 A JP2023574924 A JP 2023574924A JP 2023574924 A JP2023574924 A JP 2023574924A JP 7664427 B2 JP7664427 B2 JP 7664427B2
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- JP
- Japan
- Prior art keywords
- sample
- electron
- charged particle
- signal
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/001684 WO2023139668A1 (ja) | 2022-01-19 | 2022-01-19 | 荷電粒子線装置及びそれを用いた検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023139668A1 JPWO2023139668A1 (https=) | 2023-07-27 |
| JP7664427B2 true JP7664427B2 (ja) | 2025-04-17 |
Family
ID=87348162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023574924A Active JP7664427B2 (ja) | 2022-01-19 | 2022-01-19 | 荷電粒子線装置及びそれを用いた検査方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7664427B2 (https=) |
| DE (1) | DE112022004986T5 (https=) |
| TW (1) | TWI843354B (https=) |
| WO (1) | WO2023139668A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240062986A1 (en) * | 2021-03-01 | 2024-02-22 | Hitachi High-Tech Corporation | Charged Particle Beam Device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006162609A (ja) | 2005-11-18 | 2006-06-22 | Hitachi Ltd | 電子線を用いたパターン検査方法及びその装置 |
| JP2010062106A (ja) | 2008-09-08 | 2010-03-18 | Hitachi High-Technologies Corp | 走査型荷電粒子顕微鏡装置及び走査型荷電粒子顕微鏡装置で取得した画像の処理方法 |
| JP2011192498A (ja) | 2010-03-15 | 2011-09-29 | Hitachi High-Technologies Corp | 検査装置および検査方法 |
| US20190037682A1 (en) | 2017-07-28 | 2019-01-31 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Cof flexible circuit board and touch display panel |
| WO2021053824A1 (ja) | 2019-09-20 | 2021-03-25 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0163063U (https=) * | 1987-10-16 | 1989-04-24 | ||
| JP3688160B2 (ja) * | 1999-09-17 | 2005-08-24 | 株式会社日立製作所 | 走査電子顕微鏡 |
| DE10236738B9 (de) * | 2002-08-09 | 2010-07-15 | Carl Zeiss Nts Gmbh | Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren |
| JP4969231B2 (ja) | 2006-12-19 | 2012-07-04 | 株式会社日立ハイテクノロジーズ | 試料電位情報検出方法及び荷電粒子線装置 |
| JP6121651B2 (ja) | 2012-04-04 | 2017-04-26 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡、電子顕微鏡の観察条件の設定方法、および電子顕微鏡による観察方法 |
| JP7201523B2 (ja) * | 2018-06-07 | 2023-01-10 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム偏向器及びマルチビーム画像取得装置 |
| US11791130B2 (en) * | 2019-01-23 | 2023-10-17 | Hitachi High-Tech Corporation | Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device |
| JP7148467B2 (ja) | 2019-08-30 | 2022-10-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
-
2022
- 2022-01-19 DE DE112022004986.3T patent/DE112022004986T5/de active Pending
- 2022-01-19 JP JP2023574924A patent/JP7664427B2/ja active Active
- 2022-01-19 WO PCT/JP2022/001684 patent/WO2023139668A1/ja not_active Ceased
- 2022-12-22 TW TW111149498A patent/TWI843354B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006162609A (ja) | 2005-11-18 | 2006-06-22 | Hitachi Ltd | 電子線を用いたパターン検査方法及びその装置 |
| JP2010062106A (ja) | 2008-09-08 | 2010-03-18 | Hitachi High-Technologies Corp | 走査型荷電粒子顕微鏡装置及び走査型荷電粒子顕微鏡装置で取得した画像の処理方法 |
| JP2011192498A (ja) | 2010-03-15 | 2011-09-29 | Hitachi High-Technologies Corp | 検査装置および検査方法 |
| US20190037682A1 (en) | 2017-07-28 | 2019-01-31 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Cof flexible circuit board and touch display panel |
| WO2021053824A1 (ja) | 2019-09-20 | 2021-03-25 | 株式会社日立ハイテク | 荷電粒子線装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240062986A1 (en) * | 2021-03-01 | 2024-02-22 | Hitachi High-Tech Corporation | Charged Particle Beam Device |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202331243A (zh) | 2023-08-01 |
| JPWO2023139668A1 (https=) | 2023-07-27 |
| TWI843354B (zh) | 2024-05-21 |
| DE112022004986T5 (de) | 2024-08-01 |
| WO2023139668A1 (ja) | 2023-07-27 |
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