JP7658368B2 - ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法 - Google Patents

ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法 Download PDF

Info

Publication number
JP7658368B2
JP7658368B2 JP2022522563A JP2022522563A JP7658368B2 JP 7658368 B2 JP7658368 B2 JP 7658368B2 JP 2022522563 A JP2022522563 A JP 2022522563A JP 2022522563 A JP2022522563 A JP 2022522563A JP 7658368 B2 JP7658368 B2 JP 7658368B2
Authority
JP
Japan
Prior art keywords
glass plate
protective layer
main surface
clamp
processing method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022522563A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2021229967A1 (https=
Inventor
拓真 奈良
昌彦 田村
哲史 山名
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2021229967A1 publication Critical patent/JPWO2021229967A1/ja
Application granted granted Critical
Publication of JP7658368B2 publication Critical patent/JP7658368B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2022522563A 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法 Active JP7658368B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020084730 2020-05-13
JP2020084730 2020-05-13
PCT/JP2021/015047 WO2021229967A1 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021229967A1 JPWO2021229967A1 (https=) 2021-11-18
JP7658368B2 true JP7658368B2 (ja) 2025-04-08

Family

ID=78525765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022522563A Active JP7658368B2 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法

Country Status (2)

Country Link
JP (1) JP7658368B2 (https=)
WO (1) WO2021229967A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005333124A (ja) 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
WO2008065973A1 (fr) 2006-12-01 2008-06-05 Asahi Glass Co., Ltd. Procédé de finition de surface d'un substrat de verre préalablemeent poli
JP2009155170A (ja) 2007-12-27 2009-07-16 Asahi Glass Co Ltd Ｅｕｖｌ用光学部材およびその表面処理方法
JP2010189228A (ja) 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
WO2011115131A1 (ja) 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016509263A (ja) 2013-02-25 2016-03-24 エクソジェネシス コーポレーション 基板処理方法における欠陥削減

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JPH02204345A (ja) * 1989-01-31 1990-08-14 Hoya Corp ガラス基板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005333124A (ja) 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
WO2008065973A1 (fr) 2006-12-01 2008-06-05 Asahi Glass Co., Ltd. Procédé de finition de surface d'un substrat de verre préalablemeent poli
JP2009155170A (ja) 2007-12-27 2009-07-16 Asahi Glass Co Ltd Ｅｕｖｌ用光学部材およびその表面処理方法
JP2010189228A (ja) 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
WO2011115131A1 (ja) 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016509263A (ja) 2013-02-25 2016-03-24 エクソジェネシス コーポレーション 基板処理方法における欠陥削減

Also Published As

Publication number Publication date
WO2021229967A1 (ja) 2021-11-18
JPWO2021229967A1 (https=) 2021-11-18

Similar Documents

Publication Publication Date Title
US10025176B2 (en) Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device
US8748062B2 (en) Method of cleaning substrate
US20130217228A1 (en) Method for fabricating semiconductor device
KR20100028549A (ko) 유리 기판 표면의 가공 방법
JP6279476B2 (ja) 多層反射膜付き基板の製造方法
US7771603B2 (en) Process for polishing glass substrate
JP4786899B2 (ja) マスクブランクス用ガラス基板の製造方法，マスクブランクスの製造方法、反射型マスクブランクスの製造方法、露光用マスクの製造方法、反射型マスクの製造方法、及び半導体装置の製造方法
TW201331721A (zh) 清潔用於固持微影裝置中圖案化器件之支撐件
JP2016113356A (ja) 予備研磨されたガラス基板表面を仕上げ加工する方法
JP2017195260A (ja) ガラス加工基板の製造方法、ガラス加工基板、マスクブランクスおよびインプリントモールド
JP2011207757A (ja) マスクブランクス用ガラス基板の製造方法、マスクブランクスの製造方法、反射型マスクブランクスの製造方法、露光用マスクの製造方法、反射型マスクの製造方法、及び、半導体装置の製造方法
JP7658368B2 (ja) ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法
US7319507B2 (en) Apparatus and method for removing contaminant on original, method of manufacturing device, and original
JP5039939B2 (ja) 表面加工方法及び装置
TWI646576B (zh) 具有夾盤組件之極紫外線微影系統及其製造方法
US20120321999A1 (en) Glass substrate-holding tool and method for producing an euv mask blank by employing the same
JP7722363B2 (ja) ガラス板の加工方法、及び加工装置、並びにｅｕｖｌ用マスクブランクの製造方法
WO2015153774A1 (en) Photo-masks for lithography
JP7491235B2 (ja) Ｅｕｖｌ用ガラス基板、及びその製造方法、並びにｅｕｖｌ用マスクブランク、及びその製造方法
JP4548319B2 (ja) ガラス基板の研磨方法
US20210355024A1 (en) Glass substrate for euvl, manufacturing method thereof, mask blank for euvl, and manufacturing method thereof
WO2023166961A1 (ja) 超音波洗浄ヘッド、基板洗浄方法、基板洗浄装置、基板の製造方法、およびｅｕｖｌ用マスクブランクの製造方法
TWI883016B (zh) 微影設備
JP2023125886A (ja) 洗浄槽、洗浄機、洗浄方法、ガラス基板の製造方法、およびｅｕｖｌ用マスクブランクの製造方法
WO2025239266A1 (ja) 基板洗浄方法、およびマスクブランクの製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240209

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20241216

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250225

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250310

R150 Certificate of patent or registration of utility model

Ref document number: 7658368

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150