JPWO2021229967A1 - - Google Patents

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Publication number
JPWO2021229967A1
JPWO2021229967A1 JP2022522563A JP2022522563A JPWO2021229967A1 JP WO2021229967 A1 JPWO2021229967 A1 JP WO2021229967A1 JP 2022522563 A JP2022522563 A JP 2022522563A JP 2022522563 A JP2022522563 A JP 2022522563A JP WO2021229967 A1 JPWO2021229967 A1 JP WO2021229967A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022522563A
Other languages
Japanese (ja)
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JP7658368B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021229967A1 publication Critical patent/JPWO2021229967A1/ja
Application granted granted Critical
Publication of JP7658368B2 publication Critical patent/JP7658368B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2022522563A 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法 Active JP7658368B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020084730 2020-05-13
JP2020084730 2020-05-13
PCT/JP2021/015047 WO2021229967A1 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021229967A1 true JPWO2021229967A1 (https=) 2021-11-18
JP7658368B2 JP7658368B2 (ja) 2025-04-08

Family

ID=78525765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022522563A Active JP7658368B2 (ja) 2020-05-13 2021-04-09 ガラス板の加工方法、及びｅｕｖｌ用マスクブランクの製造方法

Country Status (2)

Country Link
JP (1) JP7658368B2 (https=)
WO (1) WO2021229967A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JPH02204345A (ja) * 1989-01-31 1990-08-14 Hoya Corp ガラス基板
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
WO2008065973A1 (fr) * 2006-12-01 2008-06-05 Asahi Glass Co., Ltd. Procédé de finition de surface d'un substrat de verre préalablemeent poli
JP2009155170A (ja) * 2007-12-27 2009-07-16 Asahi Glass Co Ltd Ｅｕｖｌ用光学部材およびその表面処理方法
JP2010189228A (ja) * 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
WO2011115131A1 (ja) * 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016509263A (ja) * 2013-02-25 2016-03-24 エクソジェネシス コーポレーション 基板処理方法における欠陥削減

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147629A (en) * 1979-05-09 1980-11-17 Ulvac Corp Photomask substrate working method
JPH02204345A (ja) * 1989-01-31 1990-08-14 Hoya Corp ガラス基板
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
WO2008065973A1 (fr) * 2006-12-01 2008-06-05 Asahi Glass Co., Ltd. Procédé de finition de surface d'un substrat de verre préalablemeent poli
JP2009155170A (ja) * 2007-12-27 2009-07-16 Asahi Glass Co Ltd Ｅｕｖｌ用光学部材およびその表面処理方法
JP2010189228A (ja) * 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
WO2011115131A1 (ja) * 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
JP2016509263A (ja) * 2013-02-25 2016-03-24 エクソジェネシス コーポレーション 基板処理方法における欠陥削減

Also Published As

Publication number Publication date
JP7658368B2 (ja) 2025-04-08
WO2021229967A1 (ja) 2021-11-18

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