JP7642804B2 - 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 - Google Patents

画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 Download PDF

Info

Publication number
JP7642804B2
JP7642804B2 JP2023520310A JP2023520310A JP7642804B2 JP 7642804 B2 JP7642804 B2 JP 7642804B2 JP 2023520310 A JP2023520310 A JP 2023520310A JP 2023520310 A JP2023520310 A JP 2023520310A JP 7642804 B2 JP7642804 B2 JP 7642804B2
Authority
JP
Japan
Prior art keywords
target
focus
sample
overlay
training
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023520310A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023544388A5 (https=
JP2023544388A (ja
Inventor
エタイ ラバート
アムノン マナッセン
ヨッシ シモン
ディミトリー サンコ
アブナー サフラニ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2023544388A publication Critical patent/JP2023544388A/ja
Publication of JP2023544388A5 publication Critical patent/JP2023544388A5/ja
Priority to JP2025028579A priority Critical patent/JP7855749B2/ja
Application granted granted Critical
Publication of JP7642804B2 publication Critical patent/JP7642804B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/94—Hardware or software architectures specially adapted for image or video understanding
    • G06V10/945—User interactive design; Environments; Toolboxes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/40—Software arrangements specially adapted for pattern recognition, e.g. user interfaces or toolboxes therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G06F18/21—Design or setup of recognition systems or techniques; Extraction of features in feature space; Blind source separation
    • G06F18/214—Generating training patterns; Bootstrap methods, e.g. bagging or boosting
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G06F18/24—Classification techniques
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
    • G06F3/0481—Interaction techniques based on graphical user interfaces [GUI] based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N20/00—Machine learning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/04—Architecture, e.g. interconnection topology
    • G06N3/0464—Convolutional networks [CNN, ConvNet]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N5/00—Computing arrangements using knowledge-based models
    • G06N5/04—Inference or reasoning models
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T11/00—Two-dimensional [2D] image generation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/12—Details of acquisition arrangements; Constructional details thereof
    • G06V10/14—Optical characteristics of the device performing the acquisition or on the illumination arrangements
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/10—Image acquisition
    • G06V10/16—Image acquisition using multiple overlapping images; Image stitching
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/764—Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/764—Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects
    • G06V10/765—Arrangements for image or video recognition or understanding using pattern recognition or machine learning using classification, e.g. of video objects using rules for classification or partitioning the feature space
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2200/00—Indexing scheme for image data processing or generation, in general
    • G06T2200/24—Indexing scheme for image data processing or generation, in general involving graphical user interfaces [GUIs]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20084—Artificial neural networks [ANN]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00—Indexing scheme relating to image or video recognition or understanding
    • G06V2201/06—Recognition of objects for industrial automation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V2201/00—Indexing scheme relating to image or video recognition or understanding
    • G06V2201/07—Target detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Software Systems (AREA)
  • Data Mining & Analysis (AREA)
  • Artificial Intelligence (AREA)
  • Evolutionary Computation (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Computing Systems (AREA)
  • Mathematical Physics (AREA)
  • Medical Informatics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Evolutionary Biology (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Computational Linguistics (AREA)
  • Databases & Information Systems (AREA)
  • Immunology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Molecular Biology (AREA)
  • Biophysics (AREA)
  • Quality & Reliability (AREA)
  • Signal Processing (AREA)
  • Biomedical Technology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2023520310A 2020-10-01 2021-09-21 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 Active JP7642804B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025028579A JP7855749B2 (ja) 2020-10-01 2025-02-26 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/060,372 US11556738B2 (en) 2020-10-01 2020-10-01 System and method for determining target feature focus in image-based overlay metrology
US17/060,372 2020-10-01
PCT/US2021/051163 WO2022072162A1 (en) 2020-10-01 2021-09-21 System and method for determining target feature focus in image-based overlay metrology

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025028579A Division JP7855749B2 (ja) 2020-10-01 2025-02-26 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法

Publications (3)

Publication Number Publication Date
JP2023544388A JP2023544388A (ja) 2023-10-23
JP2023544388A5 JP2023544388A5 (https=) 2024-06-21
JP7642804B2 true JP7642804B2 (ja) 2025-03-10

Family

ID=80931435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023520310A Active JP7642804B2 (ja) 2020-10-01 2021-09-21 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法

Country Status (7)

Country Link
US (2) US11556738B2 (https=)
EP (1) EP4200599A4 (https=)
JP (1) JP7642804B2 (https=)
KR (1) KR102718045B1 (https=)
CN (2) CN118225804B (https=)
TW (1) TWI872283B (https=)
WO (1) WO2022072162A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102680508B1 (ko) 2020-08-24 2024-07-01 그린 라이온 피티이. 리미티드 리튬이온 배터리의 재활용에서의 불순물 제거 공정
US11556738B2 (en) * 2020-10-01 2023-01-17 Kla Corporation System and method for determining target feature focus in image-based overlay metrology
WO2022098354A1 (en) 2020-11-05 2022-05-12 Kla Corporation Systems and methods for measurement of misregistration and amelioration thereof
CN116802886A (zh) 2022-01-17 2023-09-22 绿狮私人有限公司 用于回收利用磷酸铁锂电池的方法
AU2023223959B2 (en) 2022-02-23 2025-04-03 Green Li-Ion Pte. Ltd Processes and systems for purifying and recycling lithium-ion battery waste streams
TWI890995B (zh) 2022-04-18 2025-07-21 新加坡商綠色鋰離子私人有限公司 用於自鋰離子電池組回收鋰之方法及系統
EP4367610A1 (en) * 2022-09-13 2024-05-15 Google LLC Method for retraining with auto-validation of machine learning models
US12535744B2 (en) * 2022-10-31 2026-01-27 Kla Corporation Overlay estimation based on optical inspection and machine learning
US12322771B2 (en) 2023-08-23 2025-06-03 Green Li-Ion Pte. Ltd. Adaptable processes and systems for purifying co-precipitated or independent streams of manganese, nickel, and cobalt from lithium-ion battery waste streams
US20260064014A1 (en) * 2024-09-04 2026-03-05 Kla Corporation System and method for target centering detection in overlay metrology

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160025650A1 (en) 2014-07-22 2016-01-28 Taiwan Semiconductor Manufacturing Co., Ltd. Overlay metrology method and overlay control method and system
JP2017529681A (ja) 2014-06-24 2017-10-05 ケーエルエー−テンカー コーポレイション 半導体プロセス制御のためのパターン付ウェハ形状測定
US20180191948A1 (en) 2017-01-03 2018-07-05 University Of Connecticut Single-Frame Autofocusing Using Multi-LED Illumination
US20190310080A1 (en) 2018-04-09 2019-10-10 Kla-Tencor Corporation Localized Telecentricity and Focus Optimization for Overlay Metrology

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60045076D1 (de) * 1999-08-10 2010-11-18 Cellavision Ab Verfahren und Vorrichtungen in einem optischen System
US10576603B2 (en) 2014-04-22 2020-03-03 Kla-Tencor Corporation Patterned wafer geometry measurements for semiconductor process controls
US9903711B2 (en) * 2015-04-06 2018-02-27 KLA—Tencor Corporation Feed forward of metrology data in a metrology system
US9830694B2 (en) * 2015-08-31 2017-11-28 Mitutoyo Corporation Multi-level image focus using a tunable lens in a machine vision inspection system
US10395356B2 (en) * 2016-05-25 2019-08-27 Kla-Tencor Corp. Generating simulated images from input images for semiconductor applications
US10964013B2 (en) * 2017-01-10 2021-03-30 Kla-Tencor Corporation System, method for training and applying defect classifiers in wafers having deeply stacked layers
US10817999B2 (en) * 2017-07-18 2020-10-27 Kla Corporation Image-based overlay metrology and monitoring using through-focus imaging
US10474040B2 (en) * 2017-12-07 2019-11-12 Kla-Tencor Corporation Systems and methods for device-correlated overlay metrology
US10684563B2 (en) 2018-01-22 2020-06-16 Kla-Tencor Corporation On the fly target acquisition
US10622238B2 (en) * 2018-06-07 2020-04-14 Kla-Tencor Corporation Overlay measurement using phase and amplitude modeling
CN116758012A (zh) * 2018-06-08 2023-09-15 Asml荷兰有限公司 确定与在衬底上的结构相关的感兴趣的特性的方法、掩模版、衬底
US11676264B2 (en) * 2019-07-26 2023-06-13 Kla Corporation System and method for determining defects using physics-based image perturbations
US11556738B2 (en) * 2020-10-01 2023-01-17 Kla Corporation System and method for determining target feature focus in image-based overlay metrology

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017529681A (ja) 2014-06-24 2017-10-05 ケーエルエー−テンカー コーポレイション 半導体プロセス制御のためのパターン付ウェハ形状測定
US20160025650A1 (en) 2014-07-22 2016-01-28 Taiwan Semiconductor Manufacturing Co., Ltd. Overlay metrology method and overlay control method and system
US20180191948A1 (en) 2017-01-03 2018-07-05 University Of Connecticut Single-Frame Autofocusing Using Multi-LED Illumination
US20190310080A1 (en) 2018-04-09 2019-10-10 Kla-Tencor Corporation Localized Telecentricity and Focus Optimization for Overlay Metrology

Also Published As

Publication number Publication date
TW202219459A (zh) 2022-05-16
EP4200599A4 (en) 2024-10-09
US11921825B2 (en) 2024-03-05
US20240020353A1 (en) 2024-01-18
US11556738B2 (en) 2023-01-17
JP2025074126A (ja) 2025-05-13
WO2022072162A1 (en) 2022-04-07
KR20230078666A (ko) 2023-06-02
CN118225804B (zh) 2025-09-19
EP4200599A1 (en) 2023-06-28
CN116235042A (zh) 2023-06-06
US20220108128A1 (en) 2022-04-07
KR102718045B1 (ko) 2024-10-15
CN116235042B (zh) 2024-04-12
JP2023544388A (ja) 2023-10-23
TWI872283B (zh) 2025-02-11
CN118225804A (zh) 2024-06-21

Similar Documents

Publication Publication Date Title
JP7642804B2 (ja) 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法
TWI765072B (zh) 用於量測疊對之量測系統及方法
TWI611488B (zh) 使用精確缺陷位置調整晶圓檢查配方
JP6758309B2 (ja) フォーカスエラー感応性が減少した光学的計測
KR102190837B1 (ko) 자동화된 멀티-존 검출 및 모델링을 위한 시스템들 및 방법들
JP7569938B2 (ja) オンザフライ散乱計測オーバーレイ計測ターゲット
JP7445749B2 (ja) イメージングベースのオーバレイ測定の品質指標として高調波検出率を適用するためのシステムと方法
US12153352B2 (en) System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target
JP7411799B2 (ja) オーバレイ計量計測に基づく傾斜計算システム及び方法
JP7464794B2 (ja) サンプル位置決めシステム及び方法
US20260056460A1 (en) Apodization measurement optics and measurement method for euv reticle inspection tool
KR102536608B1 (ko) 후면 표면 거칠기를 전면 오버레이로 변환하기 위한 시스템 및 방법

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240613

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240613

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20240613

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240820

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241031

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250128

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250226

R150 Certificate of patent or registration of utility model

Ref document number: 7642804

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150