JP2023544388A5 - - Google Patents
Info
- Publication number
- JP2023544388A5 JP2023544388A5 JP2023520310A JP2023520310A JP2023544388A5 JP 2023544388 A5 JP2023544388 A5 JP 2023544388A5 JP 2023520310 A JP2023520310 A JP 2023520310A JP 2023520310 A JP2023520310 A JP 2023520310A JP 2023544388 A5 JP2023544388 A5 JP 2023544388A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- focal positions
- features
- training
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025028579A JP7855749B2 (ja) | 2020-10-01 | 2025-02-26 | 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/060,372 US11556738B2 (en) | 2020-10-01 | 2020-10-01 | System and method for determining target feature focus in image-based overlay metrology |
| US17/060,372 | 2020-10-01 | ||
| PCT/US2021/051163 WO2022072162A1 (en) | 2020-10-01 | 2021-09-21 | System and method for determining target feature focus in image-based overlay metrology |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025028579A Division JP7855749B2 (ja) | 2020-10-01 | 2025-02-26 | 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023544388A JP2023544388A (ja) | 2023-10-23 |
| JP2023544388A5 true JP2023544388A5 (https=) | 2024-06-21 |
| JP7642804B2 JP7642804B2 (ja) | 2025-03-10 |
Family
ID=80931435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023520310A Active JP7642804B2 (ja) | 2020-10-01 | 2021-09-21 | 画像ベースのオーバレイ計測においてターゲット特徴焦点を決定するためのシステムおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11556738B2 (https=) |
| EP (1) | EP4200599A4 (https=) |
| JP (1) | JP7642804B2 (https=) |
| KR (1) | KR102718045B1 (https=) |
| CN (2) | CN118225804B (https=) |
| TW (1) | TWI872283B (https=) |
| WO (1) | WO2022072162A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102680508B1 (ko) | 2020-08-24 | 2024-07-01 | 그린 라이온 피티이. 리미티드 | 리튬이온 배터리의 재활용에서의 불순물 제거 공정 |
| US11556738B2 (en) * | 2020-10-01 | 2023-01-17 | Kla Corporation | System and method for determining target feature focus in image-based overlay metrology |
| WO2022098354A1 (en) | 2020-11-05 | 2022-05-12 | Kla Corporation | Systems and methods for measurement of misregistration and amelioration thereof |
| CN116802886A (zh) | 2022-01-17 | 2023-09-22 | 绿狮私人有限公司 | 用于回收利用磷酸铁锂电池的方法 |
| AU2023223959B2 (en) | 2022-02-23 | 2025-04-03 | Green Li-Ion Pte. Ltd | Processes and systems for purifying and recycling lithium-ion battery waste streams |
| TWI890995B (zh) | 2022-04-18 | 2025-07-21 | 新加坡商綠色鋰離子私人有限公司 | 用於自鋰離子電池組回收鋰之方法及系統 |
| EP4367610A1 (en) * | 2022-09-13 | 2024-05-15 | Google LLC | Method for retraining with auto-validation of machine learning models |
| US12535744B2 (en) * | 2022-10-31 | 2026-01-27 | Kla Corporation | Overlay estimation based on optical inspection and machine learning |
| US12322771B2 (en) | 2023-08-23 | 2025-06-03 | Green Li-Ion Pte. Ltd. | Adaptable processes and systems for purifying co-precipitated or independent streams of manganese, nickel, and cobalt from lithium-ion battery waste streams |
| US20260064014A1 (en) * | 2024-09-04 | 2026-03-05 | Kla Corporation | System and method for target centering detection in overlay metrology |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60045076D1 (de) * | 1999-08-10 | 2010-11-18 | Cellavision Ab | Verfahren und Vorrichtungen in einem optischen System |
| US10576603B2 (en) | 2014-04-22 | 2020-03-03 | Kla-Tencor Corporation | Patterned wafer geometry measurements for semiconductor process controls |
| KR102184033B1 (ko) * | 2014-06-24 | 2020-11-27 | 케이엘에이 코포레이션 | 반도체 프로세스 제어를 위한 패터닝된 웨이퍼 지오메트리 측정 |
| US9563946B2 (en) * | 2014-07-22 | 2017-02-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Overlay metrology method and overlay control method and system |
| US9903711B2 (en) * | 2015-04-06 | 2018-02-27 | KLA—Tencor Corporation | Feed forward of metrology data in a metrology system |
| US9830694B2 (en) * | 2015-08-31 | 2017-11-28 | Mitutoyo Corporation | Multi-level image focus using a tunable lens in a machine vision inspection system |
| US10395356B2 (en) * | 2016-05-25 | 2019-08-27 | Kla-Tencor Corp. | Generating simulated images from input images for semiconductor applications |
| US10477097B2 (en) * | 2017-01-03 | 2019-11-12 | University Of Connecticut | Single-frame autofocusing using multi-LED illumination |
| US10964013B2 (en) * | 2017-01-10 | 2021-03-30 | Kla-Tencor Corporation | System, method for training and applying defect classifiers in wafers having deeply stacked layers |
| US10817999B2 (en) * | 2017-07-18 | 2020-10-27 | Kla Corporation | Image-based overlay metrology and monitoring using through-focus imaging |
| US10474040B2 (en) * | 2017-12-07 | 2019-11-12 | Kla-Tencor Corporation | Systems and methods for device-correlated overlay metrology |
| US10684563B2 (en) | 2018-01-22 | 2020-06-16 | Kla-Tencor Corporation | On the fly target acquisition |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| US10622238B2 (en) * | 2018-06-07 | 2020-04-14 | Kla-Tencor Corporation | Overlay measurement using phase and amplitude modeling |
| CN116758012A (zh) * | 2018-06-08 | 2023-09-15 | Asml荷兰有限公司 | 确定与在衬底上的结构相关的感兴趣的特性的方法、掩模版、衬底 |
| US11676264B2 (en) * | 2019-07-26 | 2023-06-13 | Kla Corporation | System and method for determining defects using physics-based image perturbations |
| US11556738B2 (en) * | 2020-10-01 | 2023-01-17 | Kla Corporation | System and method for determining target feature focus in image-based overlay metrology |
-
2020
- 2020-10-01 US US17/060,372 patent/US11556738B2/en active Active
-
2021
- 2021-09-21 CN CN202410326042.8A patent/CN118225804B/zh active Active
- 2021-09-21 WO PCT/US2021/051163 patent/WO2022072162A1/en not_active Ceased
- 2021-09-21 CN CN202180064419.1A patent/CN116235042B/zh active Active
- 2021-09-21 JP JP2023520310A patent/JP7642804B2/ja active Active
- 2021-09-21 KR KR1020237010248A patent/KR102718045B1/ko active Active
- 2021-09-21 EP EP21876216.9A patent/EP4200599A4/en active Pending
- 2021-10-01 TW TW110136643A patent/TWI872283B/zh active
-
2023
- 2023-01-16 US US18/097,438 patent/US11921825B2/en active Active
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