JP7641972B2 - プラズマ処理システムのためのｒｆ信号フィルタ構成 - Google Patents

プラズマ処理システムのためのｒｆ信号フィルタ構成 Download PDF

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Publication number
JP7641972B2
JP7641972B2 JP2022547223A JP2022547223A JP7641972B2 JP 7641972 B2 JP7641972 B2 JP 7641972B2 JP 2022547223 A JP2022547223 A JP 2022547223A JP 2022547223 A JP2022547223 A JP 2022547223A JP 7641972 B2 JP7641972 B2 JP 7641972B2
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signal
plasma processing
tes
signal supply
ring
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Japanese (ja)
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JP2023514548A5 (https=
JP2023514548A (ja
Inventor
マラクタノフ・アレクセイ
コザケヴィッチ・フェリックス
ジ・ビング
ボウミック・ラナディープ
ホランド・ジョン
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Lam Research Corp
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Lam Research Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3341—Reactive etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2022547223A 2020-02-04 2021-01-30 プラズマ処理システムのためのｒｆ信号フィルタ構成 Active JP7641972B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025027473A JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのｒｆ信号フィルタ構成

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202062970168P 2020-02-04 2020-02-04
US62/970,168 2020-02-04
PCT/US2021/015956 WO2021158451A1 (en) 2020-02-04 2021-01-30 Radiofrequency signal filter arrangement for plasma processing system

Related Child Applications (1)

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JP2025027473A Division JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのｒｆ信号フィルタ構成

Publications (3)

Publication Number Publication Date
JP2023514548A JP2023514548A (ja) 2023-04-06
JP2023514548A5 JP2023514548A5 (https=) 2024-01-31
JP7641972B2 true JP7641972B2 (ja) 2025-03-07

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JP2022547223A Active JP7641972B2 (ja) 2020-02-04 2021-01-30 プラズマ処理システムのためのｒｆ信号フィルタ構成
JP2025027473A Pending JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのｒｆ信号フィルタ構成

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Country Link
US (2) US12476082B2 (https=)
JP (2) JP7641972B2 (https=)
KR (2) KR20250161032A (https=)
CN (1) CN115136278A (https=)
WO (1) WO2021158451A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021158451A1 (en) * 2020-02-04 2021-08-12 Lam Research Corporation Radiofrequency signal filter arrangement for plasma processing system
KR102824580B1 (ko) * 2020-12-01 2025-06-23 삼성전자주식회사 플라즈마 공정 장치 및 이를 이용한 반도체 장치의 제조 방법
KR102770730B1 (ko) * 2021-12-30 2025-02-24 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

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Also Published As

Publication number Publication date
JP2025084822A (ja) 2025-06-03
KR102878174B1 (ko) 2025-10-28
WO2021158451A1 (en) 2021-08-12
US20260045452A1 (en) 2026-02-12
US20230054699A1 (en) 2023-02-23
KR20220134688A (ko) 2022-10-05
KR20250161032A (ko) 2025-11-14
US12476082B2 (en) 2025-11-18
CN115136278A (zh) 2022-09-30
JP2023514548A (ja) 2023-04-06

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