KR20250161032A - 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열 - Google Patents

플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열

Info

Publication number
KR20250161032A
KR20250161032A KR1020257035673A KR20257035673A KR20250161032A KR 20250161032 A KR20250161032 A KR 20250161032A KR 1020257035673 A KR1020257035673 A KR 1020257035673A KR 20257035673 A KR20257035673 A KR 20257035673A KR 20250161032 A KR20250161032 A KR 20250161032A
Authority
KR
South Korea
Prior art keywords
signal supply
tube
tes
plasma processing
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257035673A
Other languages
English (en)
Korean (ko)
Inventor
알렉세이 마라크타노브
펠릭스 코자케비치
빙 지
라나딥 보우믹
존 홀랜드
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20250161032A publication Critical patent/KR20250161032A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3341—Reactive etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020257035673A 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열 Pending KR20250161032A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US202062970168P 2020-02-04 2020-02-04
US62/970,168 2020-02-04
KR1020227030614A KR102878174B1 (ko) 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열
PCT/US2021/015956 WO2021158451A1 (en) 2020-02-04 2021-01-30 Radiofrequency signal filter arrangement for plasma processing system

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020227030614A Division KR102878174B1 (ko) 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열

Publications (1)

Publication Number Publication Date
KR20250161032A true KR20250161032A (ko) 2025-11-14

Family

ID=77200545

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020257035673A Pending KR20250161032A (ko) 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열
KR1020227030614A Active KR102878174B1 (ko) 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020227030614A Active KR102878174B1 (ko) 2020-02-04 2021-01-30 플라즈마 프로세싱 시스템을 위한 rf 신호 필터 배열

Country Status (5)

Country Link
US (2) US12476082B2 (https=)
JP (2) JP7641972B2 (https=)
KR (2) KR20250161032A (https=)
CN (1) CN115136278A (https=)
WO (1) WO2021158451A1 (https=)

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* Cited by examiner, † Cited by third party
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WO2021158451A1 (en) * 2020-02-04 2021-08-12 Lam Research Corporation Radiofrequency signal filter arrangement for plasma processing system
KR102824580B1 (ko) * 2020-12-01 2025-06-23 삼성전자주식회사 플라즈마 공정 장치 및 이를 이용한 반도체 장치의 제조 방법
KR102770730B1 (ko) * 2021-12-30 2025-02-24 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

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Also Published As

Publication number Publication date
JP2025084822A (ja) 2025-06-03
JP7641972B2 (ja) 2025-03-07
KR102878174B1 (ko) 2025-10-28
WO2021158451A1 (en) 2021-08-12
US20260045452A1 (en) 2026-02-12
US20230054699A1 (en) 2023-02-23
KR20220134688A (ko) 2022-10-05
US12476082B2 (en) 2025-11-18
CN115136278A (zh) 2022-09-30
JP2023514548A (ja) 2023-04-06

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A16 Divisional, continuation or continuation in part application filed

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PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A16-div-PA0104

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

Q12 Application published

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PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701