JP2023514548A5 - - Google Patents

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Publication number
JP2023514548A5
JP2023514548A5 JP2022547223A JP2022547223A JP2023514548A5 JP 2023514548 A5 JP2023514548 A5 JP 2023514548A5 JP 2022547223 A JP2022547223 A JP 2022547223A JP 2022547223 A JP2022547223 A JP 2022547223A JP 2023514548 A5 JP2023514548 A5 JP 2023514548A5
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JP
Japan
Prior art keywords
signal
plasma processing
signal supply
edge sheath
variable edge
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JP2022547223A
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English (en)
Japanese (ja)
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JP7641972B2 (ja
JP2023514548A (ja
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Priority claimed from PCT/US2021/015956 external-priority patent/WO2021158451A1/en
Publication of JP2023514548A publication Critical patent/JP2023514548A/ja
Publication of JP2023514548A5 publication Critical patent/JP2023514548A5/ja
Priority to JP2025027473A priority Critical patent/JP2025084822A/ja
Application granted granted Critical
Publication of JP7641972B2 publication Critical patent/JP7641972B2/ja
Active legal-status Critical Current
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JP2022547223A 2020-02-04 2021-01-30 プラズマ処理システムのためのrf信号フィルタ構成 Active JP7641972B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025027473A JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのrf信号フィルタ構成

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202062970168P 2020-02-04 2020-02-04
US62/970,168 2020-02-04
PCT/US2021/015956 WO2021158451A1 (en) 2020-02-04 2021-01-30 Radiofrequency signal filter arrangement for plasma processing system

Related Child Applications (1)

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JP2025027473A Division JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのrf信号フィルタ構成

Publications (3)

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JP2023514548A JP2023514548A (ja) 2023-04-06
JP2023514548A5 true JP2023514548A5 (https=) 2024-01-31
JP7641972B2 JP7641972B2 (ja) 2025-03-07

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ID=77200545

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JP2022547223A Active JP7641972B2 (ja) 2020-02-04 2021-01-30 プラズマ処理システムのためのrf信号フィルタ構成
JP2025027473A Pending JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのrf信号フィルタ構成

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JP2025027473A Pending JP2025084822A (ja) 2020-02-04 2025-02-25 プラズマ処理システムのためのrf信号フィルタ構成

Country Status (5)

Country Link
US (2) US12476082B2 (https=)
JP (2) JP7641972B2 (https=)
KR (2) KR20250161032A (https=)
CN (1) CN115136278A (https=)
WO (1) WO2021158451A1 (https=)

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KR102770730B1 (ko) * 2021-12-30 2025-02-24 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

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