JP7610202B2 - 超音波トランスデューサーアレイ及びその製造方法 - Google Patents

超音波トランスデューサーアレイ及びその製造方法 Download PDF

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JP7610202B2
JP7610202B2 JP2020187348A JP2020187348A JP7610202B2 JP 7610202 B2 JP7610202 B2 JP 7610202B2 JP 2020187348 A JP2020187348 A JP 2020187348A JP 2020187348 A JP2020187348 A JP 2020187348A JP 7610202 B2 JP7610202 B2 JP 7610202B2
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ultrasonic transducer
transducer array
ultrasonic
piezoelectric
metal substrate
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JP2022076783A5 (enExample
JP2022076783A (ja
Inventor
牧子 小林
啓 中妻
裕之 小田川
勇 松本
由成 西浦
庸典 清島
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Kumamoto University NUC
Institute of National Colleges of Technologies Japan
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Kumamoto University NUC
Institute of National Colleges of Technologies Japan
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  • Application Of Or Painting With Fluid Materials (AREA)
  • Transducers For Ultrasonic Waves (AREA)
JP2020187348A 2020-11-10 2020-11-10 超音波トランスデューサーアレイ及びその製造方法 Active JP7610202B2 (ja)

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JP2022076783A5 JP2022076783A5 (enExample) 2023-12-07
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EP4468743A1 (en) * 2022-01-19 2024-11-27 Cast Inc. Ultrasonic probe and ultrasonic probe manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008131055A (ja) 2006-11-16 2008-06-05 Anodeikku Supply:Kk スピーカ、オーディオ装置
WO2012001954A1 (ja) 2010-06-30 2012-01-05 Ｎｅｃカシオモバイルコミュニケーションズ株式会社 発振装置および電子機器
WO2012132261A1 (ja) 2011-03-31 2012-10-04 Ｎｅｃカシオモバイルコミュニケーションズ株式会社 発振装置、および電子機器
JP2018089621A (ja) 2016-12-06 2018-06-14 国立大学法人 熊本大学 噴射システム
WO2018225415A1 (ja) 2017-06-09 2018-12-13 国立大学法人熊本大学 基板及び膜基板生産方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008131055A (ja) 2006-11-16 2008-06-05 Anodeikku Supply:Kk スピーカ、オーディオ装置
WO2012001954A1 (ja) 2010-06-30 2012-01-05 Ｎｅｃカシオモバイルコミュニケーションズ株式会社 発振装置および電子機器
WO2012132261A1 (ja) 2011-03-31 2012-10-04 Ｎｅｃカシオモバイルコミュニケーションズ株式会社 発振装置、および電子機器
JP2018089621A (ja) 2016-12-06 2018-06-14 国立大学法人 熊本大学 噴射システム
WO2018225415A1 (ja) 2017-06-09 2018-12-13 国立大学法人熊本大学 基板及び膜基板生産方法

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