JP7581033B2 - インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム - Google Patents

インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム Download PDF

Info

Publication number
JP7581033B2
JP7581033B2 JP2020205610A JP2020205610A JP7581033B2 JP 7581033 B2 JP7581033 B2 JP 7581033B2 JP 2020205610 A JP2020205610 A JP 2020205610A JP 2020205610 A JP2020205610 A JP 2020205610A JP 7581033 B2 JP7581033 B2 JP 7581033B2
Authority
JP
Japan
Prior art keywords
substrate
pattern
imprint
gas
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020205610A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022092734A (ja
JP2022092734A5 (enExample
Inventor
賢治 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020205610A priority Critical patent/JP7581033B2/ja
Priority to KR1020210167967A priority patent/KR102812044B1/ko
Priority to US17/542,834 priority patent/US12228855B2/en
Publication of JP2022092734A publication Critical patent/JP2022092734A/ja
Publication of JP2022092734A5 publication Critical patent/JP2022092734A5/ja
Application granted granted Critical
Publication of JP7581033B2 publication Critical patent/JP7581033B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2020205610A 2020-12-11 2020-12-11 インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム Active JP7581033B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020205610A JP7581033B2 (ja) 2020-12-11 2020-12-11 インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム
KR1020210167967A KR102812044B1 (ko) 2020-12-11 2021-11-30 임프린트 장치, 임프린트 방법, 물품 제조 방법 및 저장 매체
US17/542,834 US12228855B2 (en) 2020-12-11 2021-12-06 Imprint apparatus, imprint method, article manufacturing method, and storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020205610A JP7581033B2 (ja) 2020-12-11 2020-12-11 インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム

Publications (3)

Publication Number Publication Date
JP2022092734A JP2022092734A (ja) 2022-06-23
JP2022092734A5 JP2022092734A5 (enExample) 2023-11-20
JP7581033B2 true JP7581033B2 (ja) 2024-11-12

Family

ID=81942415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020205610A Active JP7581033B2 (ja) 2020-12-11 2020-12-11 インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム

Country Status (3)

Country Link
US (1) US12228855B2 (enExample)
JP (1) JP7581033B2 (enExample)
KR (1) KR102812044B1 (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013175631A (ja) 2012-02-27 2013-09-05 Canon Inc インプリント装置およびインプリント方法、それを用いた物品の製造方法
JP2017157635A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2018029101A (ja) 2016-08-16 2018-02-22 キヤノン株式会社 インプリント装置、および物品製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP6494185B2 (ja) 2013-06-26 2019-04-03 キヤノン株式会社 インプリント方法および装置
JP6294679B2 (ja) * 2014-01-21 2018-03-14 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6320183B2 (ja) * 2014-06-10 2018-05-09 キヤノン株式会社 インプリント装置、インプリント方法、および物品製造方法
JP6525567B2 (ja) * 2014-12-02 2019-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6628491B2 (ja) * 2015-04-13 2020-01-08 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
KR102369538B1 (ko) * 2017-09-28 2022-03-03 캐논 가부시끼가이샤 성형 장치 및 물품 제조 방법
JP7210155B2 (ja) 2018-04-16 2023-01-23 キヤノン株式会社 装置、方法、および物品製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013175631A (ja) 2012-02-27 2013-09-05 Canon Inc インプリント装置およびインプリント方法、それを用いた物品の製造方法
JP2017157635A (ja) 2016-02-29 2017-09-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2018029101A (ja) 2016-08-16 2018-02-22 キヤノン株式会社 インプリント装置、および物品製造方法

Also Published As

Publication number Publication date
KR102812044B1 (ko) 2025-05-23
US12228855B2 (en) 2025-02-18
KR20220083588A (ko) 2022-06-20
US20220187702A1 (en) 2022-06-16
JP2022092734A (ja) 2022-06-23

Similar Documents

Publication Publication Date Title
JP5868215B2 (ja) インプリント装置およびインプリント方法、それを用いた物品の製造方法
CN105137713B (zh) 压印设备和使用该压印设备的物品制造方法
US9770850B2 (en) Imprint apparatus and article manufacturing method
US10168615B2 (en) Imprint apparatus, imprint method, and article manufacturing method
TW201916102A (zh) 壓印裝置及物品之製造方法
KR102809595B1 (ko) 성형 장치, 결정 방법 및 물품 제조 방법
US11333969B2 (en) Imprint apparatus, imprint method, and article manufacturing method
US20240176231A1 (en) Imprint apparatus, article manufacturing method, determination method, and recording medium
JP7685941B2 (ja) インプリント装置、インプリント方法及び物品の製造方法
US20170140922A1 (en) Generating method, imprinting method, imprint apparatus, program, and method of manufacturing article
KR20250150499A (ko) 임프린트 장치, 임프린트 방법, 저장 매체 및 물품 제조 방법
KR20190124643A (ko) 몰드를 사용해서 기판 상의 조성물을 성형하는 성형 장치, 성형 방법 및 물품의 제조 방법
JP7358192B2 (ja) インプリント装置、インプリント方法及び物品の製造方法
JP7581033B2 (ja) インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム
JP6866106B2 (ja) インプリント装置、インプリント方法、および物品の製造方法
US12353127B2 (en) Imprint apparatus, imprint method and article manufacturing method
US20250172867A1 (en) Imprinting device, imprinting method, and method for manufacturing article
JP7555735B2 (ja) 成形装置、成形方法、および物品の製造方法
KR20190025507A (ko) 임프린트 장치, 임프린트 방법 및 물품 제조 방법
KR20250162383A (ko) 성형 장치, 성형 방법, 및 물품 제조 방법

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231109

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231109

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20240624

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240702

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240828

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241001

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20241030

R150 Certificate of patent or registration of utility model

Ref document number: 7581033

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150