JP7465376B2 - 固浸レンズユニット、半導体検査装置 - Google Patents
固浸レンズユニット、半導体検査装置 Download PDFInfo
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- JP7465376B2 JP7465376B2 JP2023003654A JP2023003654A JP7465376B2 JP 7465376 B2 JP7465376 B2 JP 7465376B2 JP 2023003654 A JP2023003654 A JP 2023003654A JP 2023003654 A JP2023003654 A JP 2023003654A JP 7465376 B2 JP7465376 B2 JP 7465376B2
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- 238000007654 immersion Methods 0.000 title claims description 116
- 239000007787 solid Substances 0.000 title claims description 116
- 239000004065 semiconductor Substances 0.000 title claims description 91
- 238000007689 inspection Methods 0.000 title claims description 26
- 230000003287 optical effect Effects 0.000 claims description 55
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 27
- 229910052710 silicon Inorganic materials 0.000 claims description 27
- 239000010703 silicon Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 22
- 230000004075 alteration Effects 0.000 claims description 18
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 6
- 229910003460 diamond Inorganic materials 0.000 claims description 6
- 239000010432 diamond Substances 0.000 claims description 6
- 229910005540 GaP Inorganic materials 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 230000005499 meniscus Effects 0.000 claims description 4
- 229910003465 moissanite Inorganic materials 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 description 14
- 238000004458 analytical method Methods 0.000 description 13
- 238000012937 correction Methods 0.000 description 11
- 230000007246 mechanism Effects 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000010191 image analysis Methods 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- -1 GaAs Chemical compound 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
- G01N21/9505—Wafer internal defects, e.g. microcracks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/361—Optical details, e.g. image relay to the camera or image sensor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B2003/0093—Simple or compound lenses characterised by the shape
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Microscoopes, Condenser (AREA)
- Lenses (AREA)
- Lens Barrels (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
[半導体検査装置の構成]
[固浸レンズユニットの構成]
[半導体検査装置における画像取得方法の一例]
[作用及び効果]
[変形例]
Claims (5)
- 半導体デバイスが載置されるステージと、
前記ステージ上の前記半導体デバイスと向かい合うように配置された対物レンズと、
前記対物レンズと前記半導体デバイスとの間に固浸レンズを保持する固浸レンズユニットと、
前記半導体デバイスからの光を前記固浸レンズ及び前記対物レンズを介して検出する光検出器と、を備え、
前記固浸レンズユニットは、
シリコン基板によって構成された前記半導体デバイスに当接するための当接面、及び、前記対物レンズと向かい合うように配置される球面を有し、200nm以上1100nm以下の範囲の少なくとも一部の波長を有する光を透過させる前記固浸レンズと、
前記固浸レンズを保持するホルダと、
前記対物レンズと前記固浸レンズとの間に位置するように前記ホルダによって保持され、前記シリコン基板と前記固浸レンズとの間の屈折率差に起因する収差を補正する光学素子と、を有し、
前記固浸レンズは、GaAs、GaP、SiC又はダイヤモンドによって構成されており、
前記ホルダには、前記固浸レンズが配置される開口と、前記開口を囲むように延在する段差部とが形成されており、
前記光学素子は、前記段差部に接着されており、
前記光学素子の第1表面は、所定の間隔を空けて前記固浸レンズの前記球面と向かい合い、前記球面に沿って延在している、半導体検査装置。 - 前記ホルダは、前記対物レンズに対して着脱自在な取付部を有する、請求項1に記載の半導体検査装置。
- 前記光学素子は、ガラスによって構成されている、請求項1又は2に記載の半導体検査装置。
- 前記光学素子は、メニスカスレンズである、請求項1~3のいずれか一項に記載の半導体検査装置。
- 前記固浸レンズユニットを複数備え、
前記複数の固浸レンズユニットは、それぞれ、異なる観察深さに対応するように構成されている、請求項1~4のいずれか一項に記載の半導体検査装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023003654A JP7465376B2 (ja) | 2018-08-02 | 2023-01-13 | 固浸レンズユニット、半導体検査装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018145977A JP2020020994A (ja) | 2018-08-02 | 2018-08-02 | 固浸レンズユニット、半導体検査装置 |
JP2023003654A JP7465376B2 (ja) | 2018-08-02 | 2023-01-13 | 固浸レンズユニット、半導体検査装置 |
Related Parent Applications (1)
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JP2018145977A Division JP2020020994A (ja) | 2018-08-02 | 2018-08-02 | 固浸レンズユニット、半導体検査装置 |
Publications (2)
Publication Number | Publication Date |
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JP2023038269A JP2023038269A (ja) | 2023-03-16 |
JP7465376B2 true JP7465376B2 (ja) | 2024-04-10 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018145977A Pending JP2020020994A (ja) | 2018-08-02 | 2018-08-02 | 固浸レンズユニット、半導体検査装置 |
JP2023003654A Active JP7465376B2 (ja) | 2018-08-02 | 2023-01-13 | 固浸レンズユニット、半導体検査装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2018145977A Pending JP2020020994A (ja) | 2018-08-02 | 2018-08-02 | 固浸レンズユニット、半導体検査装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US11913888B2 (ja) |
EP (1) | EP3832371A4 (ja) |
JP (2) | JP2020020994A (ja) |
KR (1) | KR20210040056A (ja) |
CN (1) | CN112543884B (ja) |
SG (1) | SG11202012875XA (ja) |
TW (1) | TWI826440B (ja) |
WO (1) | WO2020026531A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005317170A (ja) | 2004-03-31 | 2005-11-10 | Konica Minolta Opto Inc | 屈折対物光学系 |
JP2006227565A (ja) | 2005-01-19 | 2006-08-31 | Hamamatsu Photonics Kk | 対物レンズソケット |
JP2009070467A (ja) | 2007-09-12 | 2009-04-02 | Sony Corp | 光学ピックアップ装置、光記録再生装置及びギャップの制御方法 |
JP2016537670A (ja) | 2013-11-15 | 2016-12-01 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 光シート顕微鏡検査のための装置 |
JP2017501429A (ja) | 2013-11-15 | 2017-01-12 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 光シート顕微鏡検査用の装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB691530A (en) | 1948-10-20 | 1953-05-13 | Polaroid Corp | Improvements in or relating to optical systems |
HUP0303190A2 (hu) * | 2000-10-16 | 2003-12-29 | Konica Corporation | Tárgylencse, kapcsoló lencse, fénykonvergáló optikai rendszer és optikai felvevő-lejátszó eszköz |
JP2003066300A (ja) * | 2001-08-29 | 2003-03-05 | Sony Corp | 対物レンズ製造装置及び対物レンズ製造方法 |
WO2004088386A1 (ja) | 2003-03-20 | 2004-10-14 | Hamamatsu Photonics K.K. | 固浸レンズ、及びそれを用いた試料観察方法 |
US7110172B2 (en) | 2004-02-27 | 2006-09-19 | Hamamatsu Photonics K.K. | Microscope and sample observation method |
US7312921B2 (en) * | 2004-02-27 | 2007-12-25 | Hamamatsu Photonics K.K. | Microscope and sample observation method |
EP2003680B1 (en) | 2006-02-21 | 2013-05-29 | Nikon Corporation | Exposure apparatus, exposure method and device manufacturing method |
JP5189321B2 (ja) | 2007-06-20 | 2013-04-24 | 浜松ホトニクス株式会社 | 固浸レンズホルダ |
US10048480B2 (en) | 2011-01-07 | 2018-08-14 | Zeta Instruments, Inc. | 3D microscope including insertable components to provide multiple imaging and measurement capabilities |
JP2017530394A (ja) * | 2014-09-29 | 2017-10-12 | エーエスエムエル ホールディング エヌ.ブイ. | 高開口数対物レンズシステム |
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2018
- 2018-08-02 JP JP2018145977A patent/JP2020020994A/ja active Pending
-
2019
- 2019-04-09 KR KR1020217002899A patent/KR20210040056A/ko not_active Application Discontinuation
- 2019-04-09 CN CN201980051171.8A patent/CN112543884B/zh active Active
- 2019-04-09 WO PCT/JP2019/015510 patent/WO2020026531A1/ja unknown
- 2019-04-09 SG SG11202012875XA patent/SG11202012875XA/en unknown
- 2019-04-09 EP EP19845351.6A patent/EP3832371A4/en active Pending
- 2019-04-09 US US17/264,588 patent/US11913888B2/en active Active
- 2019-04-24 TW TW108114250A patent/TWI826440B/zh active
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2023
- 2023-01-13 JP JP2023003654A patent/JP7465376B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005317170A (ja) | 2004-03-31 | 2005-11-10 | Konica Minolta Opto Inc | 屈折対物光学系 |
JP2006227565A (ja) | 2005-01-19 | 2006-08-31 | Hamamatsu Photonics Kk | 対物レンズソケット |
JP2009070467A (ja) | 2007-09-12 | 2009-04-02 | Sony Corp | 光学ピックアップ装置、光記録再生装置及びギャップの制御方法 |
JP2016537670A (ja) | 2013-11-15 | 2016-12-01 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 光シート顕微鏡検査のための装置 |
JP2017501429A (ja) | 2013-11-15 | 2017-01-12 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 光シート顕微鏡検査用の装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20210040056A (ko) | 2021-04-12 |
TW202008009A (zh) | 2020-02-16 |
JP2023038269A (ja) | 2023-03-16 |
SG11202012875XA (en) | 2021-01-28 |
TWI826440B (zh) | 2023-12-21 |
WO2020026531A1 (ja) | 2020-02-06 |
US20210333216A1 (en) | 2021-10-28 |
EP3832371A4 (en) | 2022-04-13 |
CN112543884A (zh) | 2021-03-23 |
US11913888B2 (en) | 2024-02-27 |
CN112543884B (zh) | 2024-02-09 |
JP2020020994A (ja) | 2020-02-06 |
EP3832371A1 (en) | 2021-06-09 |
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