JP7459523B2 - 投写光学系およびプロジェクター - Google Patents

投写光学系およびプロジェクター Download PDF

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Publication number
JP7459523B2
JP7459523B2 JP2020008955A JP2020008955A JP7459523B2 JP 7459523 B2 JP7459523 B2 JP 7459523B2 JP 2020008955 A JP2020008955 A JP 2020008955A JP 2020008955 A JP2020008955 A JP 2020008955A JP 7459523 B2 JP7459523 B2 JP 7459523B2
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JP
Japan
Prior art keywords
optical system
axis
transmitting surface
optical axis
projection
Prior art date
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Active
Application number
JP2020008955A
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English (en)
Japanese (ja)
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JP2021117278A (ja
JP2021117278A5 (enExample
Inventor
栄時 守国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2020008955A priority Critical patent/JP7459523B2/ja
Priority to US17/155,232 priority patent/US11579424B2/en
Publication of JP2021117278A publication Critical patent/JP2021117278A/ja
Publication of JP2021117278A5 publication Critical patent/JP2021117278A5/ja
Application granted granted Critical
Publication of JP7459523B2 publication Critical patent/JP7459523B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/0095—Relay lenses or rod lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2066—Reflectors in illumination beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Projection Apparatus (AREA)
JP2020008955A 2020-01-23 2020-01-23 投写光学系およびプロジェクター Active JP7459523B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020008955A JP7459523B2 (ja) 2020-01-23 2020-01-23 投写光学系およびプロジェクター
US17/155,232 US11579424B2 (en) 2020-01-23 2021-01-22 Projection system and projector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020008955A JP7459523B2 (ja) 2020-01-23 2020-01-23 投写光学系およびプロジェクター

Publications (3)

Publication Number Publication Date
JP2021117278A JP2021117278A (ja) 2021-08-10
JP2021117278A5 JP2021117278A5 (enExample) 2022-08-30
JP7459523B2 true JP7459523B2 (ja) 2024-04-02

Family

ID=76969975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020008955A Active JP7459523B2 (ja) 2020-01-23 2020-01-23 投写光学系およびプロジェクター

Country Status (2)

Country Link
US (1) US11579424B2 (enExample)
JP (1) JP7459523B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022189083A (ja) * 2021-06-10 2022-12-22 株式会社エビデント 観察装置、リフレクター、及び、位相物体の観察方法
JP7750070B2 (ja) * 2021-12-08 2025-10-07 セイコーエプソン株式会社 光学系、およびプロジェクター

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005062803A (ja) 2003-07-31 2005-03-10 Olympus Corp 撮像光学系及びそれを用いた光学装置
JP2005292813A (ja) 2004-03-12 2005-10-20 Sony Corp 投影光学系及び画像投影装置
JP2010266577A (ja) 2009-05-13 2010-11-25 Canon Inc 光学系及びそれを有する光学機器
JP2011013469A (ja) 2009-07-02 2011-01-20 Canon Inc 光学系及びそれを有する光学機器
JP2011053663A (ja) 2009-08-04 2011-03-17 Konica Minolta Opto Inc 光学系及びそれを備えた画像投影装置及び撮像装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210314B2 (ja) 2003-02-06 2009-01-14 株式会社リコー 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
JP4223936B2 (ja) 2003-02-06 2009-02-12 株式会社リコー 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
JP4500497B2 (ja) 2003-02-13 2010-07-14 株式会社リコー 画像投射装置
JP4890771B2 (ja) 2005-02-28 2012-03-07 富士フイルム株式会社 投写光学系およびこれを用いた投写型表示装置
KR101176686B1 (ko) * 2005-03-08 2012-08-23 칼 짜이스 에스엠티 게엠베하 접근 용이한 조리개 또는 구경 조리개를 구비한마이크로리소그래피 투영 시스템
JP5374848B2 (ja) * 2006-09-15 2013-12-25 株式会社リコー 投射光学系
JP5422897B2 (ja) * 2008-02-27 2014-02-19 株式会社リコー 投射光学系及び画像表示装置
JP5359607B2 (ja) * 2008-09-02 2013-12-04 株式会社リコー 変倍光学系、プロジェクタ
JP6746328B2 (ja) 2016-03-04 2020-08-26 キヤノン株式会社 光学系、それを備える撮像装置及び投影装置
JP2017156712A (ja) 2016-03-04 2017-09-07 キヤノン株式会社 光学系、それを備える撮像装置及び投影装置
JP2017156713A (ja) 2016-03-04 2017-09-07 キヤノン株式会社 撮像装置及び投影装置
JP6993251B2 (ja) 2018-02-01 2022-01-13 リコーインダストリアルソリューションズ株式会社 投射光学系および画像表示装置
JP2020024377A (ja) 2018-07-27 2020-02-13 セイコーエプソン株式会社 投写光学系および投写型画像表示装置
EP3611548B1 (en) 2018-07-27 2023-01-18 Seiko Epson Corporation Projection system and projection-type image display apparatus
JP7148334B2 (ja) 2018-09-07 2022-10-05 リコーインダストリアルソリューションズ株式会社 投射光学系及び画像投射装置
JP7340789B2 (ja) 2019-05-29 2023-09-08 パナソニックＩｐマネジメント株式会社 光学系、画像投写装置および撮像装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005062803A (ja) 2003-07-31 2005-03-10 Olympus Corp 撮像光学系及びそれを用いた光学装置
JP2005292813A (ja) 2004-03-12 2005-10-20 Sony Corp 投影光学系及び画像投影装置
JP2010266577A (ja) 2009-05-13 2010-11-25 Canon Inc 光学系及びそれを有する光学機器
JP2011013469A (ja) 2009-07-02 2011-01-20 Canon Inc 光学系及びそれを有する光学機器
JP2011053663A (ja) 2009-08-04 2011-03-17 Konica Minolta Opto Inc 光学系及びそれを備えた画像投影装置及び撮像装置

Also Published As

Publication number Publication date
JP2021117278A (ja) 2021-08-10
US20210231932A1 (en) 2021-07-29
US11579424B2 (en) 2023-02-14

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