JP7432263B2 - 超音波加振式不良検出装置及びワイヤ不良検出システム - Google Patents
超音波加振式不良検出装置及びワイヤ不良検出システム Download PDFInfo
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Description
Claims (9)
- 検査対象物の不良を検出する超音波加振式不良検出装置であって、
前記検査対象物を超音波加振する超音波加振器と、
前記超音波加振器に高周波電力を供給する電源と、
超音波加振された前記検査対象物を撮像する撮像装置と、
前記電源から前記超音波加振器に供給される前記高周波電力の周波数を調整すると共に、前記検査対象物の不良の検出を行う制御部と、を備え、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させながら前記撮像装置で前記検査対象物の画像を撮像し、撮像した画像に基づいて前記検査対象物の不良の検出を行い、
前記検査対象物は、不良の検出の対象となる対象部と、不良の検出の対象とならない非対象部とを含み、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させる際に、前記撮像装置で撮像した画像から検出される前記非対象部の振幅に対する前記撮像装置で撮像した画像から検出される前記対象部の振幅の比率が所定値以上となるように前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とする超音波加振式不良検出装置。 - 請求項1に記載の超音波加振式不良検出装置であって、
前記電源から前記超音波加振器に供給される前記高周波電力の電流を検出する電流センサを備え、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させる際に、前記電流センサで検出した電流が所定の範囲内となるように前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とする超音波加振式不良検出装置。 - 請求項1に記載の超音波加振式不良検出装置であって、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の電流が所定の範囲内となるように、前記電源から前記超音波加振器に供給される前記高周波電力の周波数に対する前記電源から前記超音波加振器に供給される前記高周波電力の電圧の変化を予め規定したマップを含み、
前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させる際に、前記マップに基づいて前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とする超音波加振式不良検出装置。 - 請求項1又は2又は3に記載の超音波加振式不良検出装置であって、
前記検査対象物は、基板と、前記基板に取付けられた半導体素子と、前記半導体素子の電極と前記基板の電極、又は、前記半導体素子の一の電極と前記半導体素子の他の電極とを接続するワイヤと、を備える半導体装置であって、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させる際に、前記撮像装置で撮像した画像から検出される前記基板と前記半導体素子の振幅に対する前記撮像装置で撮像した画像から検出される前記ワイヤの振幅の比率が所定値以上となるように前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とする超音波加振式不良検出装置。 - 請求項4に記載の超音波加振式不良検出装置であって、
前記制御部は、検出した前記ワイヤの振幅が所定の上限振幅を越えないように前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とする超音波加振式不良検出装置。 - 請求項4又は5に記載の超音波加振式不良検出装置であって、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させながら、前記撮像装置で前記半導体装置の動画を撮像し、
撮像した動画の1つのフレームとそれ以前の前フレームとのワイヤの画像の差分を算出し、
前記差分が所定の閾値を超えた場合に前記ワイヤの不良検出信号を出力すること、
を特徴とする超音波加振式不良検出装置。 - 請求項6に記載の超音波加振式不良検出装置であって、
前記制御部は、
前記差分を算出する1つのフレームと前フレームとの間のフレーム数、或いは、動画のフレームレートを変化させて前記差分を算出すること、
を特徴とする超音波加振式不良検出装置。 - 請求項1又は2又は3に記載の超音波加振式不良検出装置であって、
前記超音波加振器は、前記検査対象物に接続されて前記検査対象物を超音波振動させる超音波振動子、又は、前記検査対象物の周囲に配置された超音波スピーカーであること、
を特徴とする超音波加振式不良検出装置。 - 基板と、前記基板に取付けられた半導体素子と、前記半導体素子の電極と前記基板の電極、又は、前記半導体素子の一の電極と前記半導体素子の他の電極とを接続するワイヤと、を備える半導体装置の前記ワイヤの不良を検出するワイヤ不良検出システムであって、
前記半導体装置を超音波加振する超音波加振器と、
前記超音波加振器に高周波電力を供給する電源と、
超音波加振された前記半導体装置を撮像する撮像装置と、
前記撮像装置で撮像した画像を表示するディスプレイと、
前記電源から前記超音波加振器に供給される前記高周波電力の周波数を調整すると共に、前記ワイヤの不良の検出を行う制御部と、を備え、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させながら、前記撮像装置で前記半導体装置の動画を撮像し、
撮像した動画の1つのフレームとそれ以前の前フレームとの画像の差分を算出し、
前記差分が所定の閾値を超えた場合に前記ワイヤの表示画像を他の前記ワイヤの表示画像と異ならせて前記ディスプレイに表示し、
前記ワイヤは、不良の検出の対象となる対象部と、不良の検出の対象とならない非対象部とを含み、
前記制御部は、前記電源から前記超音波加振器に供給される前記高周波電力の周波数を変化させる際に、前記撮像装置で撮像した画像から検出される前記非対象部の振幅に対する前記撮像装置で撮像した画像から検出される前記対象部の振幅の比率が所定値以上となるように前記電源から前記超音波加振器に供給される前記高周波電力の電圧を調整すること、
を特徴とするワイヤ不良検出システム。
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007203199A (ja) | 2006-02-02 | 2007-08-16 | Kaijo Corp | 超音波振動子の駆動装置 |
JP2008084881A (ja) | 2006-09-25 | 2008-04-10 | Toshiba Corp | 電子装置の製造方法およびその検査方法 |
WO2011036751A1 (ja) | 2009-09-24 | 2011-03-31 | 株式会社 東芝 | 電子機器および損傷検出方法 |
JP2012083246A (ja) | 2010-10-13 | 2012-04-26 | Toyota Motor Corp | 接合検査方法 |
JP2014024065A (ja) | 2012-07-24 | 2014-02-06 | Adwelds:Kk | 異常検出装置および異常検出方法 |
JP2016024186A (ja) | 2014-07-17 | 2016-02-08 | ザ・ボーイング・カンパニーTheBoeing Company | ハイパーサウンドを使用した非破壊検査 |
JP2020134289A (ja) | 2019-02-19 | 2020-08-31 | キオクシア株式会社 | 半導体装置の検査方法及び検査装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09182467A (ja) * | 1995-12-27 | 1997-07-11 | Nikon Corp | 振動アクチュエータの駆動装置 |
JPH09213752A (ja) | 1996-01-31 | 1997-08-15 | Kaijo Corp | ワイヤボンディング装置における不着検出回路 |
JP2010056106A (ja) | 2008-08-26 | 2010-03-11 | Nec Electronics Corp | ワイヤボンディング装置、これを用いたワイヤボンディング方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007203199A (ja) | 2006-02-02 | 2007-08-16 | Kaijo Corp | 超音波振動子の駆動装置 |
JP2008084881A (ja) | 2006-09-25 | 2008-04-10 | Toshiba Corp | 電子装置の製造方法およびその検査方法 |
WO2011036751A1 (ja) | 2009-09-24 | 2011-03-31 | 株式会社 東芝 | 電子機器および損傷検出方法 |
JP2012083246A (ja) | 2010-10-13 | 2012-04-26 | Toyota Motor Corp | 接合検査方法 |
JP2014024065A (ja) | 2012-07-24 | 2014-02-06 | Adwelds:Kk | 異常検出装置および異常検出方法 |
JP2016024186A (ja) | 2014-07-17 | 2016-02-08 | ザ・ボーイング・カンパニーTheBoeing Company | ハイパーサウンドを使用した非破壊検査 |
JP2020134289A (ja) | 2019-02-19 | 2020-08-31 | キオクシア株式会社 | 半導体装置の検査方法及び検査装置 |
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