JP7411681B2 - スルホニルジアゾール、n-(フルオロスルホニル)アゾール、及びそれらを製造する方法 - Google Patents
スルホニルジアゾール、n-(フルオロスルホニル)アゾール、及びそれらを製造する方法 Download PDFInfo
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- JP7411681B2 JP7411681B2 JP2021559568A JP2021559568A JP7411681B2 JP 7411681 B2 JP7411681 B2 JP 7411681B2 JP 2021559568 A JP2021559568 A JP 2021559568A JP 2021559568 A JP2021559568 A JP 2021559568A JP 7411681 B2 JP7411681 B2 JP 7411681B2
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- azole
- pot
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- base structure
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 46
- FVJDYTQBFVLSAF-UHFFFAOYSA-N pyrrole-1-sulfonyl fluoride Chemical class FS(=O)(=O)n1cccc1 FVJDYTQBFVLSAF-UHFFFAOYSA-N 0.000 title claims description 40
- PSQNEJAAXJMWRQ-UHFFFAOYSA-N 3-sulfonylpyrazole Chemical class O=S(=O)=C1C=CN=N1 PSQNEJAAXJMWRQ-UHFFFAOYSA-N 0.000 title claims description 20
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 456
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 154
- 238000006243 chemical reaction Methods 0.000 claims description 79
- -1 azole anion compound Chemical class 0.000 claims description 52
- 229910052751 metal Inorganic materials 0.000 claims description 50
- 239000002184 metal Substances 0.000 claims description 50
- 239000003054 catalyst Substances 0.000 claims description 46
- QPJLLGRXZNNXIN-UHFFFAOYSA-N C1=CC=CN1S(=O)(=O)N1C=CC=C1 Chemical compound C1=CC=CN1S(=O)(=O)N1C=CC=C1 QPJLLGRXZNNXIN-UHFFFAOYSA-N 0.000 claims description 30
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 claims description 23
- 239000000010 aprotic solvent Substances 0.000 claims description 20
- 239000011734 sodium Substances 0.000 claims description 19
- 150000007530 organic bases Chemical class 0.000 claims description 18
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 17
- 229910052700 potassium Inorganic materials 0.000 claims description 17
- 229910052708 sodium Inorganic materials 0.000 claims description 17
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 16
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 16
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 16
- 229910052792 caesium Inorganic materials 0.000 claims description 16
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 16
- 229910052744 lithium Inorganic materials 0.000 claims description 16
- 229910052749 magnesium Inorganic materials 0.000 claims description 16
- 239000011777 magnesium Substances 0.000 claims description 16
- 239000011591 potassium Substances 0.000 claims description 16
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 claims description 14
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 claims description 14
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 13
- 239000005935 Sulfuryl fluoride Substances 0.000 claims description 13
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims description 12
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 12
- 239000012964 benzotriazole Substances 0.000 claims description 12
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 claims description 11
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 11
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 claims description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 9
- WNHFEQWRHXLCMK-UHFFFAOYSA-N trimethyl(pyrrol-1-yl)silane Chemical group C[Si](C)(C)N1C=CC=C1 WNHFEQWRHXLCMK-UHFFFAOYSA-N 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 7
- 238000005580 one pot reaction Methods 0.000 claims description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 189
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 105
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 98
- 239000000047 product Substances 0.000 description 91
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 81
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 78
- 239000007787 solid Substances 0.000 description 67
- 239000002585 base Substances 0.000 description 62
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 60
- 229910052757 nitrogen Inorganic materials 0.000 description 55
- UYURMLWWLDQDCD-UHFFFAOYSA-N 1h-pyrrol-2-ylsilicon Chemical compound [Si]C1=CC=CN1 UYURMLWWLDQDCD-UHFFFAOYSA-N 0.000 description 40
- 230000003068 static effect Effects 0.000 description 36
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 29
- 208000033962 Fontaine progeroid syndrome Diseases 0.000 description 28
- 239000002904 solvent Substances 0.000 description 26
- 239000007789 gas Substances 0.000 description 24
- SDGHXWKVBZYHRR-UHFFFAOYSA-N 2-(1h-imidazol-2-ylsulfonyl)-1h-imidazole Chemical class N=1C=CNC=1S(=O)(=O)C1=NC=CN1 SDGHXWKVBZYHRR-UHFFFAOYSA-N 0.000 description 23
- 230000002829 reductive effect Effects 0.000 description 23
- 150000003851 azoles Chemical class 0.000 description 20
- 239000007788 liquid Substances 0.000 description 20
- 239000000376 reactant Substances 0.000 description 19
- 238000003756 stirring Methods 0.000 description 19
- 239000000706 filtrate Substances 0.000 description 17
- 238000007792 addition Methods 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 239000013078 crystal Substances 0.000 description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000011085 pressure filtration Methods 0.000 description 12
- ZXTBFCUTNIFSAZ-UHFFFAOYSA-N 2-(1h-pyrrol-2-ylsulfonyl)-1h-pyrrole Chemical class C=1C=CNC=1S(=O)(=O)C1=CC=CN1 ZXTBFCUTNIFSAZ-UHFFFAOYSA-N 0.000 description 11
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical group NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 11
- MCCYVBQYXGJZGO-UHFFFAOYSA-N 1H-imidazole-2-sulfonyl fluoride Chemical compound FS(=O)(=O)C=1NC=CN=1 MCCYVBQYXGJZGO-UHFFFAOYSA-N 0.000 description 10
- HPJHRBLPTCWNSS-UHFFFAOYSA-N 1H-pyrrole-2-sulfonyl fluoride Chemical compound FS(=O)(=O)c1ccc[nH]1 HPJHRBLPTCWNSS-UHFFFAOYSA-N 0.000 description 10
- 239000003921 oil Substances 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 8
- 238000004821 distillation Methods 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- ZLKNPIVTWNMMMH-UHFFFAOYSA-N 1-imidazol-1-ylsulfonylimidazole Chemical compound C1=CN=CN1S(=O)(=O)N1C=CN=C1 ZLKNPIVTWNMMMH-UHFFFAOYSA-N 0.000 description 6
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 6
- LMGJOCRPGGKNHC-UHFFFAOYSA-N 5-(1H-pyrazol-5-ylsulfonyl)-1H-pyrazole Chemical compound C1=CNN=C1S(=O)(=O)C=1C=CNN=1 LMGJOCRPGGKNHC-UHFFFAOYSA-N 0.000 description 6
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 6
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 6
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 6
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- DBSXDBCTSLPBJJ-UHFFFAOYSA-N pyrazole-1-sulfonyl fluoride Chemical class FS(=O)(=O)N1C=CC=N1 DBSXDBCTSLPBJJ-UHFFFAOYSA-N 0.000 description 6
- 238000001953 recrystallisation Methods 0.000 description 6
- SVMXHTSTWBWAFJ-UHFFFAOYSA-N S(=O)(=O)(C=1C(=NNC=1C)C)C=1C(=NNC=1C)C Chemical compound S(=O)(=O)(C=1C(=NNC=1C)C)C=1C(=NNC=1C)C SVMXHTSTWBWAFJ-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 150000002460 imidazoles Chemical class 0.000 description 5
- 229910052987 metal hydride Inorganic materials 0.000 description 5
- 150000004681 metal hydrides Chemical class 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 150000003512 tertiary amines Chemical class 0.000 description 5
- USTUYCWNJZIRHP-UHFFFAOYSA-N 1H-pyrrol-2-ylsilane Chemical class [SiH3]C1=CC=CN1 USTUYCWNJZIRHP-UHFFFAOYSA-N 0.000 description 4
- UFFDBNIIOIXGQD-UHFFFAOYSA-N 2-methyl-1-(2-methylimidazol-1-yl)sulfonylimidazole Chemical compound CC1=NC=CN1S(=O)(=O)N1C(C)=NC=C1 UFFDBNIIOIXGQD-UHFFFAOYSA-N 0.000 description 4
- WCHDCNVVBAOTHP-UHFFFAOYSA-N S(=O)(=O)(C=1N=C(NC=1)C)C=1N=C(NC=1)C Chemical compound S(=O)(=O)(C=1N=C(NC=1)C)C=1N=C(NC=1)C WCHDCNVVBAOTHP-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- KRMJIITYZACTIJ-UHFFFAOYSA-N imidazole-1-sulfonyl fluoride Chemical compound N1(C=NC=C1)S(=O)(=O)F KRMJIITYZACTIJ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical group [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- WRHZVMBBRYBTKZ-UHFFFAOYSA-N pyrrole-2-carboxylic acid Chemical class OC(=O)C1=CC=CN1 WRHZVMBBRYBTKZ-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- NCSQQLIUPOKCKU-UHFFFAOYSA-N (3,5-dimethylpyrazol-1-yl)-trimethylsilane Chemical compound CC=1C=C(C)N([Si](C)(C)C)N=1 NCSQQLIUPOKCKU-UHFFFAOYSA-N 0.000 description 3
- NRSWNQGWQIEQCS-UHFFFAOYSA-N 2-(1H-benzimidazol-2-ylsulfonyl)-1H-benzimidazole Chemical compound C1=CC=C2NC(S(=O)(C=3NC4=CC=CC=C4N=3)=O)=NC2=C1 NRSWNQGWQIEQCS-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- YVCHUSHTXUZFGE-UHFFFAOYSA-N N1(C=NC=C1)S(=O)(=O)N1N=CC=C1 Chemical compound N1(C=NC=C1)S(=O)(=O)N1N=CC=C1 YVCHUSHTXUZFGE-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- JBFYUZGYRGXSFL-UHFFFAOYSA-N imidazolide Chemical compound C1=C[N-]C=N1 JBFYUZGYRGXSFL-UHFFFAOYSA-N 0.000 description 3
- 229910000000 metal hydroxide Inorganic materials 0.000 description 3
- 150000004692 metal hydroxides Chemical class 0.000 description 3
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- DTXTZABTGUMIRL-UHFFFAOYSA-N 4-(2H-benzotriazol-4-ylsulfonyl)-2H-benzotriazole Chemical compound O=S(=O)(c1cccc2n[nH]nc12)c1cccc2n[nH]nc12 DTXTZABTGUMIRL-UHFFFAOYSA-N 0.000 description 2
- QHTHRNRJCFZCCA-UHFFFAOYSA-N 6816-12-2 Chemical compound FN(F)OS(F)(=O)=O QHTHRNRJCFZCCA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- FRNMTDULWLRGCV-UHFFFAOYSA-N N1(N=CN=C1)S(=O)(=O)F Chemical compound N1(N=CN=C1)S(=O)(=O)F FRNMTDULWLRGCV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- FCEHRHQASKIZPF-UHFFFAOYSA-N benzotriazole-1-sulfonyl fluoride Chemical class C1=CC=C2N(S(=O)(=O)F)N=NC2=C1 FCEHRHQASKIZPF-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007806 chemical reaction intermediate Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000007323 disproportionation reaction Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 230000002045 lasting effect Effects 0.000 description 2
- 239000012263 liquid product Substances 0.000 description 2
- 229910001512 metal fluoride Inorganic materials 0.000 description 2
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- CKKWAPCYTOBOOM-UHFFFAOYSA-N pyrrol-1-ylsilane Chemical compound [SiH3]N1C=CC=C1 CKKWAPCYTOBOOM-UHFFFAOYSA-N 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 2
- FFVIFQRDWANWEN-UHFFFAOYSA-N trimethyl-(2-methylimidazol-1-yl)silane Chemical compound CC1=NC=CN1[Si](C)(C)C FFVIFQRDWANWEN-UHFFFAOYSA-N 0.000 description 2
- 150000000178 1,2,4-triazoles Chemical class 0.000 description 1
- BWHRIYCPTCQUTM-UHFFFAOYSA-N 1h-benzimidazol-2-yl(trimethyl)silane Chemical compound C1=CC=C2NC([Si](C)(C)C)=NC2=C1 BWHRIYCPTCQUTM-UHFFFAOYSA-N 0.000 description 1
- VTHCSXMNKNHJHY-UHFFFAOYSA-N 1h-imidazol-2-yl(trimethyl)silane Chemical compound C[Si](C)(C)C1=NC=CN1 VTHCSXMNKNHJHY-UHFFFAOYSA-N 0.000 description 1
- YNCPXBIZAPNQIJ-UHFFFAOYSA-N 1h-imidazole;sodium Chemical compound [Na].C1=CNC=N1 YNCPXBIZAPNQIJ-UHFFFAOYSA-N 0.000 description 1
- WXYOTXRQFRAERC-UHFFFAOYSA-N 2h-benzotriazol-4-yl(trimethyl)silane Chemical compound C[Si](C)(C)C1=CC=CC2=C1N=NN2 WXYOTXRQFRAERC-UHFFFAOYSA-N 0.000 description 1
- XXTMMNCSHZXINI-UHFFFAOYSA-N 3,5-dimethylpyrazole-1-sulfonyl fluoride Chemical compound CC=1C=C(C)N(S(F)(=O)=O)N=1 XXTMMNCSHZXINI-UHFFFAOYSA-N 0.000 description 1
- WPNXUDJGUODKSI-UHFFFAOYSA-N 4-(2h-triazol-4-ylsulfonyl)-2h-triazole Chemical compound C=1NN=NC=1S(=O)(=O)C1=CNN=N1 WPNXUDJGUODKSI-UHFFFAOYSA-N 0.000 description 1
- RFJCPBKZTRRYEE-UHFFFAOYSA-N 4-chloro-5-[(4-chloro-1H-pyrazol-5-yl)sulfonyl]-1H-pyrazole Chemical compound S(=O)(=O)(C1=NNC=C1Cl)C1=NNC=C1Cl RFJCPBKZTRRYEE-UHFFFAOYSA-N 0.000 description 1
- ICQHDPWILNDRRC-UHFFFAOYSA-N 4-nitro-5-[(4-nitro-1H-pyrazol-5-yl)sulfonyl]-1H-pyrazole Chemical compound S(=O)(=O)(C1=NNC=C1[N+](=O)[O-])C1=NNC=C1[N+](=O)[O-] ICQHDPWILNDRRC-UHFFFAOYSA-N 0.000 description 1
- HGVGCNFCGWTDPU-UHFFFAOYSA-N 5-(1H-1,2,4-triazol-5-ylsulfonyl)-1H-1,2,4-triazole Chemical compound N1=CNN=C1S(=O)(=O)C=1N=CNN=1 HGVGCNFCGWTDPU-UHFFFAOYSA-N 0.000 description 1
- SQNZXGGUGWGYQJ-UHFFFAOYSA-N CC=1N(C=CN=1)S(=O)(=O)F Chemical compound CC=1N(C=CN=1)S(=O)(=O)F SQNZXGGUGWGYQJ-UHFFFAOYSA-N 0.000 description 1
- ZKZWUGYZHDERNA-UHFFFAOYSA-N FS(=O)(=O)N1CN(C=C1C)C Chemical compound FS(=O)(=O)N1CN(C=C1C)C ZKZWUGYZHDERNA-UHFFFAOYSA-N 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- FKAFBSYDUSFQHO-UHFFFAOYSA-N N1(C=NC=C1)S(=O)(=O)N1N=C(C=C1C)C Chemical compound N1(C=NC=C1)S(=O)(=O)N1N=C(C=C1C)C FKAFBSYDUSFQHO-UHFFFAOYSA-N 0.000 description 1
- 229910006024 SO2Cl2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 150000007980 azole derivatives Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000005595 deprotonation Effects 0.000 description 1
- 238000010537 deprotonation reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000105 evaporative light scattering detection Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- CTIKAHQFRQTTAY-UHFFFAOYSA-N fluoro(trimethyl)silane Chemical compound C[Si](C)(C)F CTIKAHQFRQTTAY-UHFFFAOYSA-N 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 150000007928 imidazolide derivatives Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- APFFQDSKJBGORS-UHFFFAOYSA-N lithium;1h-pyrazole Chemical compound [Li].C=1C=NNC=1 APFFQDSKJBGORS-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- XHDFJTTXGAOSLN-UHFFFAOYSA-M sodium 3,5-dimethylpyrazole-3-carboxylate Chemical compound CC1(N=NC(=C1)C)C(=O)[O-].[Na+] XHDFJTTXGAOSLN-UHFFFAOYSA-M 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- NTJBWZHVSJNKAD-UHFFFAOYSA-N triethylazanium;fluoride Chemical compound [F-].CC[NH+](CC)CC NTJBWZHVSJNKAD-UHFFFAOYSA-N 0.000 description 1
- WPSPBNRWECRRPK-UHFFFAOYSA-N trimethyl(1,2,4-triazol-1-yl)silane Chemical compound C[Si](C)(C)N1C=NC=N1 WPSPBNRWECRRPK-UHFFFAOYSA-N 0.000 description 1
- FTCHSXVKVGGWCW-UHFFFAOYSA-N trimethyl(1h-pyrrol-2-yl)silane Chemical compound C[Si](C)(C)C1=CC=CN1 FTCHSXVKVGGWCW-UHFFFAOYSA-N 0.000 description 1
- SJZNRVUBNAJWQA-UHFFFAOYSA-N trimethyl(2h-triazol-4-yl)silane Chemical compound C[Si](C)(C)C1=CNN=N1 SJZNRVUBNAJWQA-UHFFFAOYSA-N 0.000 description 1
- AQXARFPMROXNLL-UHFFFAOYSA-N trimethyl(pyrazol-1-yl)silane Chemical compound C[Si](C)(C)N1C=CC=N1 AQXARFPMROXNLL-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 239000007966 viscous suspension Substances 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Images
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
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- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/84—Sulfur atoms
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- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
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- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/12—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/18—One oxygen or sulfur atom
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/22—Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms directly attached to ring nitrogen atoms
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- C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
- C07D249/10—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D249/12—Oxygen or sulfur atoms
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- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
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- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
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- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/06—Benzimidazoles; Hydrogenated benzimidazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
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- C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
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- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Plural Heterocyclic Compounds (AREA)
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
Description
本願は、2019年4月6日に出願された米国仮出願第62/830,433号、及び2019年4月19日に出願された米国仮出願第62/836,090号の利益を主張するものであり、これらの出願の全体は、参照により本明細書に明示的に援用される。
本開示は、N-(フルオロスルホニル)アゾール、スルホニルジアゾール、又はそれらの関連誘導体、及び得られた生成物を製造するための方法を提供する。
できる。
Claims (21)
- 第1のアゾール塩基構造(アゾール1)を有するN-(フルオロスルホニル)アゾール(アゾール1-SO2F)を、第2のアゾール塩基構造(アゾール2)を有するアゾールアニオン化合物と反応させるステップと、
N,N’-スルホニルビサゾール(アゾール1-SO2-アゾール2)を単離するステップと
を含み、
ここで、前記アゾールアニオン化合物は、塩基性触媒の存在下で、前記第2のアゾール塩基構造(アゾール2)を有するN-(トリアルキルシリル)アゾールに由来するものである、
方法。 - 前記第1のアゾール塩基構造及び前記第2のアゾール塩基構造は、イミダゾール、ピラゾール、1,2,4-トリアゾール、ベンズイミダゾール、ベンゾトリアゾール、インダゾール、2-メチルイミダゾール、2-メチルベンズイミダゾール、及び3,5-ジメチルピラゾールからなる群から独立して選択されるものである、請求項1に記載の方法。
- 前記第1のアゾール塩基構造(アゾール1)と前記第2のアゾール塩基構造(アゾール2)は同じものである、請求項1に記載の方法。
- 前記N-(トリアルキルシリル)アゾールは、N-(トリメチルシリル)アゾールである、請求項1に記載の方法。
- 前記塩基性触媒が非プロトン性有機塩基である、請求項1に記載の方法。
- N-(フルオロスルホニル)アゾール(アゾール1-SO2F)を、非プロトン性溶媒の存在下で前記アゾールアニオン化合物と反応させる、請求項1に記載の方法。
- 前記第1のアゾール塩基構造(アゾール1)と前記第2のアゾール塩基構造(アゾール2)は、イミダゾール又はベンズイミダゾールである、請求項6に記載の方法。
- フッ化スルフリル(SO2F2)を、第1のアゾール塩基構造(アゾール1)を有するアゾールアニオン化合物と反応させるステップと、
N,N’-スルホニルビサゾール(アゾール1-SO2-アゾール1)を単離するステップと
を含む、方法。 - 前記第1のアゾール塩基構造は、イミダゾール、ピラゾール、1,2,4-トリアゾール、ベンズイミダゾール、ベンゾトリアゾール、インダゾール、2-メチルイミダゾール、2-メチルベンズイミダゾール、及び3,5-ジメチルピラゾールからなる群から選択されるものである、請求項8に記載の方法。
- 前記アゾールアニオン化合物は、リチウム、ナトリウム、カリウム、セシウム、及びマグネシウムからなる群から選択される金属のイオンを有するアゾールアニオン塩である、請求項8に記載の方法。
- 前記アゾールアニオン化合物は、プロトン性アゾール及び金属炭酸塩に由来し、前記金属は、リチウム、ナトリウム、カリウム、セシウム、及びマグネシウムからなる群から選択されるものである、請求項8に記載の方法。
- 前記アゾールアニオン化合物は、プロトン性アゾール及び非プロトン性塩基、又は前記塩基としてのプロトン性アゾールに由来するものである、請求項8に記載の方法。
- 前記アゾールアニオン化合物は、塩基性触媒の存在下で、前記第1のアゾール塩基構造を有するN-(トリアルキルシリル)アゾールに由来するものである、請求項8に記載の方法。
- フッ化スルフリル(SO2F2)を、第1のアゾール塩基構造(アゾール1)を有するN-(トリアルキルシリル)アゾールと反応させるステップと、
N-(フルオロスルホニル)アゾール(アゾール1-SO2F)を単離するステップと
を含む、方法。 - 前記第1のアゾール塩基構造は、イミダゾール、ピラゾール、1,2,4-トリアゾール、ベンズイミダゾール、ベンゾトリアゾール、インダゾール、2-メチルイミダゾール、2-メチルベンズイミダゾール、及び3,5-ジメチルピラゾールからなる群から選択されるものである、請求項14に記載の方法。
- 前記N-(トリアルキルシリル)アゾールは、N-(トリメチルシリル)アゾールである、請求項14に記載の方法。
- 前記反応は、非プロトン性溶媒又は塩基性触媒、或いはその両方の存在下で行われるものである、請求項14に記載の方法。
- 前記塩基性触媒は、非プロトン性有機塩基又は塩基としてのプロトン性アゾール(アゾール1)である、請求項17に記載の方法。
- 前記塩基性触媒は、プロトン性アゾール(アゾール1)のアニオン塩と、リチウム、ナトリウム、カリウム、セシウム、及びマグネシウムからなる群から選択される金属のイオンとからなる群から選択されるものである、請求項17に記載の方法。
- 請求項14における前記N-(トリアルキルシリル)アゾールは第1のN-(トリアルキルシリル)アゾールであり、
前記N-(フルオロスルホニル)アゾール(アゾール1-SO2F)を、第2のN-(トリアルキルシリル)アゾール又は第2のアゾール塩基構造(アゾール2)を有するアゾールアニオン塩と反応させて、N,N’-スルホニルジアゾール(アゾール1-SO2-アゾール2)を提供するステップをさらに含む、請求項16に記載の方法。 - 前記第1のアゾール塩基構造及び前記第2のアゾール塩基構造は同じであり、フッ化スルフリル(SO2F2)を、ワンポットで前記第1のN-(トリアルキルシリル)アゾールと直接反応させて、対称スルホニルジアゾールを提供する、請求項20に記載の方法。
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US62/836,090 | 2019-04-19 | ||
PCT/US2020/026957 WO2020210174A2 (en) | 2019-04-06 | 2020-04-06 | Sulfonyldiazoles and n-(fluorosulfonyl)azoles, and methods of making the same |
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WO2020210174A4 (en) | 2021-01-14 |
KR20210132231A (ko) | 2021-11-03 |
US11014945B2 (en) | 2021-05-25 |
KR102638968B1 (ko) | 2024-02-20 |
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CN112105603B (zh) | 2024-01-30 |
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