JP7407558B2 - Indirect heating vapor deposition equipment - Google Patents

Description

The present invention relates to an indirect heating vapor deposition apparatus that heats a container filled with vapor deposition material by electron beam bombardment to heat and evaporate the vapor deposition material.

Conventionally, evaporation apparatuses have been known in which a substrate is placed in a vacuum chamber and an evaporation source is installed facing the substrate.Indirect heating evaporation sources include electron beams (thermionic electrons) placed in a container filled with evaporation material. ) There is an electron beam bombardment type evaporation source that emits (for example, see Patent Document 1).

The indirect heating vapor deposition source described in Patent Document 1 includes a container, an electron source, a container holding section, a moving mechanism, and a cooling stand. The electron source emits thermionic electrons into the bottom of the container. The container holding part exposes and holds the bottom of the container. The moving mechanism drives the container holder to move the container in the horizontal direction. The cooling stand has an upper surface that contacts the bottom of the container that has been moved horizontally from above the electron source by the moving mechanism, and cools the container.

Japanese Patent Application Publication No. 2018-16836

Incidentally, it is desired that the indirect heating evaporation source as described in Patent Document 1 suppress the temperature rise of the substrate (deposited object).

The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide an indirect heating vapor deposition apparatus that can suppress the temperature rise of a deposition target.

One embodiment of the indirect heating vapor deposition apparatus of the present invention includes a container formed in a bottomed cylindrical shape and filled with a vapor deposition material, a container holding part that holds the container, and a thermoelectron for heating the container by electron impact. It includes an electron source that emits, a roof, and an opening cover. The roof is disposed between the container and the object to be evaporated, and has an opening through which evaporated particles generated when the evaporation material is heated pass. The opening cover is retained on the roof and extends through the opening in the roof. The opening cover includes a frame-shaped block that engages with the wall surface of the opening in the roof, and a cover body. The cover body is provided with a cylindrical portion that passes through the block, and a flange that is continuous with one end of the cylindrical portion in the axial direction and engages with the block.

As described above, in one embodiment of the present invention, the roof is disposed between the container and the object to be evaporated, so that a rise in temperature of the object to be evaporated can be suppressed.
Note that problems, configurations, and effects other than those described above will be made clear by the description of the embodiments below.

1 is a schematic configuration diagram of an indirect heating vapor deposition apparatus according to a first embodiment of the present invention. FIG. 1 is a top view of an indirect heating vapor deposition apparatus according to a first embodiment of the present invention. It is a side view of the cover exchange mechanism of the indirect heating vapor deposition apparatus based on the 1st Embodiment of this invention. FIG. 3 is an explanatory diagram showing the operation of the cover exchange mechanism of the indirect heating vapor deposition apparatus according to the first embodiment of the present invention. FIG. 3 is a sectional view showing a state in which the cover exchange mechanism of the indirect heating vapor deposition apparatus according to the first embodiment of the present invention supports the opening cover. FIG. 2 is a side view showing a state in which the cover exchange mechanism of the indirect heating vapor deposition apparatus according to the first embodiment of the present invention supports the opening cover. FIG. 7 is a sectional view showing an opening cover of an indirect heating vapor deposition apparatus according to a second embodiment of the present invention.

Hereinafter, examples of modes for carrying out the present invention will be described with reference to the accompanying drawings. In each figure, components having substantially the same function or configuration are given the same reference numerals and redundant explanations will be omitted.

<First embodiment>
[Configuration of indirect heating vapor deposition equipment]
First, the configuration of an indirect heating vapor deposition apparatus according to a first embodiment will be described with reference to FIGS. 1 and 2.
FIG. 1 is a schematic diagram of an indirect heating vapor deposition apparatus according to a first embodiment of the present invention. FIG. 2 is a top view of the indirect heating vapor deposition apparatus according to the first embodiment.

The indirect heating evaporation apparatus 1 shown in FIGS. 1 and 2 is installed in a vacuum chamber, and heats and evaporates a evaporation material filled in a container to deposit it on a substrate, which is an example of an object to be evaporated. The indirect heating vapor deposition apparatus 1 includes a plurality of liners 2 representing a specific example of a container, a holder 3 representing a specific example of a container holding part, an anti-adhesive cover 7, an electron source 8, a roof 15, and an opening cover 16. (See Figure 1). Further, the indirect heating vapor deposition apparatus 1 includes a used cover storage section 17, an unused cover storage section 18, a cover exchange mechanism 19, and a substrate holding section 20 that holds the substrate 100 (see FIG. 2). .

As shown in FIG. 1, each of the plurality of liners 2 is formed in the shape of a cylinder with a bottom, and includes a circular bottom portion 2a, a peripheral wall portion 2b continuous to the periphery of the bottom portion 2a, and a peripheral wall portion 2b continuous to the upper end of the peripheral wall portion 2b. It has a flange portion 2c. The peripheral wall portion 2b is formed into a substantially cylindrical shape whose diameter increases continuously from the bottom portion 2a toward the flange portion 2c. Examples of the material for the liner 2 include high melting point materials such as molybdenum and ceramics. Further, the liner 2 is filled with a vapor deposition material 4.

The holder 3 is formed into a circular plate shape and has a plurality of holding holes 3a through which the plurality of liners 2 are passed. The plurality of holding holes 3a are formed in a circular shape, and the flange portion 2c of the liner 2 comes into contact with the edge of the holding holes 3a. The material of the holder 3 may be any material as long as it has a high thermal resistance. Therefore, the heat of the liner 2 is difficult to be transferred to the holder 3.

In addition, in this embodiment, the holder 3 has six holding holes 3a (see FIG. 2), but the holder (container holding part) according to the present invention has one holding hole, It may hold one liner (container), or it may have seven or more holding holes and hold seven or more liners (containers).

A rotary drive shaft 14, which is a specific example of a drive mechanism, is connected to the center of the holder 3. The rotational drive shaft 14 rotationally drives the holder 3 to horizontally move the plurality of liners 2 held by the holder 3. This rotary drive shaft 14 is cooled so as not to impair its rotary function.

The roof 15 is provided on the upper surface of the holder 3. The roof 15 includes a support portion 21 connected to the upper surface of the holder 3 and a shielding plate 22 continuous to the support portion 21. The support part 21 is formed in a substantially cylindrical shape and is fixed to the center of the holder 3. Therefore, the roof 15 is rotated together with the holder 3. Therefore, the rotational drive shaft 14 that rotationally drives the holder 3 represents a specific example of the roof moving mechanism according to the present invention.

The shielding plate 22 is formed into a circular plate shape having approximately the same diameter as the holder 3. The shielding plate 22 is provided with a plurality of openings 22a. The plurality of openings 22a are formed in a portion facing the liner 2, and extend in the radial direction from the peripheral edge toward the center. The opening 22a is set to a size that exposes the inner wall surface of the liner 2 when viewed from above. Therefore, evaporated particles generated when the vapor deposition material 4 filled in the liner 2 is heated pass through the opening 22a.

When the liner 2 is heated, the holder 3 as well as the liner 2 become high temperature. The roof 15 prevents or suppresses radiant heat generated from the holder 3 from reaching the substrate 100. As a result, the temperature rise of the substrate 100 can be suppressed. Note that the material for the roof 15 may be any material as long as it has high thermal resistance. Further, like the rotary drive shaft 14, the roof 15 is preferably cooled.

Further, the center side of the shielding plate 22 in the opening 22a is formed in a semicircular shape (see FIG. 2). A step portion 22b is formed on the wall surface of the opening 22a, the lower step being more convex inward than the upper step. A block 31, which will be described later, of the opening cover 16 engages with this stepped portion 22b.

The opening cover 16 is held by the shielding plate 22 of the roof 15 and passes through the opening 22a. The opening cover 16 includes an annular block 31 that engages with the stepped portion 22b of the shielding plate 22, and a cover body 32 that passes through the block 31.

The outer diameter of the block 31 is approximately equal to the width (diameter) of the upper step of the step portion 22b of the shielding plate 22. Therefore, the outer circumferential surface of the block 31 comes into contact with the wall surface forming the upper stage of the stepped portion 22b, and the block 31 is positioned with respect to the shielding plate 22 (roof 15). Further, the lower surface of the block 31 comes into contact with the horizontal surface of the step portion 22b, and the block 31 is held by the shielding plate 22 (roof 15).

The thickness of the block 31 is approximately equal to the thickness of the upper step of the step portion 22b of the shielding plate 22. Therefore, the upper surface of the block 31 forms the same plane as the upper surface of the shielding plate 22. Furthermore, the inner diameter of the block 31 is smaller than the width (diameter) of the lower step of the stepped portion 22b of the shielding plate 22. Therefore, the lower surface of the block 31 is exposed to the opening 22a of the shielding plate 22 when viewed from below.

The cover main body 32 has a cylindrical portion 32a that passes through the block 31, and a flange 32b that is continuous with one end of the cylindrical portion 32a in the axial direction. The axial length of the cylindrical portion 32a is greater than the thickness of the holder 3, and the other end of the cylindrical portion 32a in the axial direction is closer to the liner 2 than the lower surface of the holder 3.

The inner diameter of the cylindrical portion 32a is larger than the diameter of the inner wall surface of the liner 2. Further, the outer diameter of the cylindrical portion 32a is approximately equal to the inner diameter of the block 31. Therefore, the outer peripheral surface of the cylindrical portion 32a comes into contact with the inner wall surface of the block 31, and the cover main body 32 is prevented from shaking against the block 31. Further, it is preferable that the other end of the cylindrical portion 32a in the axial direction be close to the opening of the liner 2. This makes it difficult for evaporated particles to leak from between the liner 2 and the cover body 32 (opening cover 16).

Note that the cylindrical portion of the cover main body according to the present invention may have an inner diameter larger than the outer diameter of the flange portion of the liner. In this case, the length of the cylindrical portion in the axial direction is preferably set to such a length that the inner circumferential surface of the cylindrical portion faces the side circumferential surface of the flange portion of the liner. That is, it is preferable that the cylindrical part of the opening cover surrounds the upper part of the flange part of the liner. This makes it possible to prevent evaporated particles from leaking between the liner and the opening cover more than the opening cover 16 of this embodiment.

The outer diameter of the flange 32b is larger than the inner diameter of the block 31 and smaller than the outer diameter of the block 31. The cover main body 32 is held on the shielding plate 22 (roof 15) via the block 31 by the flange 32b coming into contact with the upper surface of the block 31. That is, the cover main body 32 is held on the shielding plate 22 (roof 15) via the block 31.

In this way, the opening cover 16 is composed of the block 31 and the cover body 32. This makes it possible to secure a portion (block 31) of the cover exchange mechanism 19 that is supported by a pair of support arms 67b, which will be described later, without increasing the size of the flange 32b of the cover body 32. Therefore, it is possible to suppress the flange 32b of the cover body 32 from increasing in size, and the size of the cover body 32 can be reduced.

Evaporated particles generated when the vapor deposition material 4 filled in the liner 2 is heated reach the substrate 100 through the cover body 32 of the opening cover 16. At this time, since the wall surface of the opening 22a in the roof 15 is covered with the opening cover 16, it is possible to prevent evaporated particles from adhering to the roof 15. Furthermore, there is no fear that evaporated particles will accumulate on the roof 15 and then fall onto the liner 2 or the like.

Furthermore, if evaporated particles adhere and accumulate on the cover body 32 of the opening cover 16, the opening cover 16 can be easily replaced by the cover replacement mechanism 19 (see FIG. 2). Therefore, the deposition operation can be performed for a longer time without exposing the vacuum chamber to the atmosphere.

The anti-corrosion cover 7 is formed in a substantially box shape and covers the roof 15, the holder 3, and the plurality of liners 2. This anti-adhesive cover 7 has a top plate 41 and a side plate 42 continuous to the top plate 41. The top plate 41 of the anti-adhesion cover 7 has an evaporation opening 41 a facing the substrate 100 held by the substrate holding part 20 . The evaporated particles generated when the evaporation material 4 is heated pass through the opening cover 16 and then reach the substrate 100 through the evaporation opening 41 a of the anti-adhesion cover 7 .

The substrate holding section 20 is arranged above the anti-adhesive cover 7. This substrate holding section 20 is formed in a circular plate shape, and holds the substrate 100 on its lower surface. Further, a rotational drive shaft 51 is connected to the center of the upper surface of the substrate holder 20 . The rotation drive shaft 51 rotationally drives the substrate holder 20 to move the substrate 100 held by the substrate holder 20 in the horizontal direction. Further, the rotational drive shaft 51 is cooled so as not to impair its rotational function.

When depositing a deposited film on the substrate 100, the substrate holder 20 is rotationally driven by the rotation drive shaft 51 to move the substrate 100 above the evaporation opening 41a. Thereby, the substrate 100 faces the liner 2 arranged at a position facing the evaporation opening 41a. Then, when the vapor deposition material 4 filled in the liner 2 is heated and evaporated, the evaporated particles are deposited on the substrate 100. Note that in FIG. 1, the substrate holding section 20 holds one substrate 100, but the substrate holding section according to the present invention may hold a plurality of substrates.

The electron source 8 is disposed below the holder 3 at an arbitrary deposition position on the rotational trajectory of the liner 2 . Thereby, when the liner 2 held by the holder 3 is placed at the vapor deposition position, the liner 2 is located above the electron source 8. The electron source 8 has a filament and a Wehnelt that forms an electric field distribution. An opening is formed in the Wehnelt to expose the filament.

The filament is formed of a wire made of tungsten material. An acceleration power source 9 is connected to this filament via a filament power source. The acceleration power supply 9 is grounded, and a high voltage negative to the ground potential, for example, a voltage of 300V to 6kV, is applied thereto. The holder 3 is at ground potential, and the liner 2 held by the holder 3 is at ground potential.

When a predetermined value of current is supplied to the filament, the filament is heated by Joule heating to a temperature at which thermoelectrons can be supplied, for example, around 2300°C. When a negative high voltage is applied to the earth potential by the acceleration power source 9, thermionic electrons (electron beams) emitted from the filament are accelerated toward the liner 2 at the earth potential, and the bottom 2a of the liner 2 is heated by electron impact. Ru.

When the bottom portion 2a of the liner 2 is heated by electron impact by the electron beam, the temperature of the liner 2 increases. Then, the vapor deposition material 4 is heated by conductive heat and radiation from the liner 2. When the electron impact heating of the bottom portion 2a of the liner 2 is continued for a certain period of time, the vapor deposition material 4 sublimes or evaporates. The evaporated particles of the evaporation material 4 pass through the opening cover 16 and the evaporation opening 41 a of the adhesion prevention cover 7 and reach the substrate 100 held by the substrate holder 20 . As a result, the evaporated particles of the vapor deposition material 4 are deposited on the substrate 100, and a vapor deposited film having a desired thickness is attached to the substrate 100.

When a deposited film of a predetermined thickness is attached to the substrate 100, the supply of current to the filament is stopped, and the output of the electron beam is stopped. Then, the holder 3 is rotated and the liner 2 passing through the adjacent holding hole 3a is placed at the vapor deposition position. Further, the substrate holder 20 is rotated to place the substrate 100 on which a film is to be formed at a position facing the evaporation opening 41a of the anti-adhesion cover 7. Thereafter, a current of a predetermined value is supplied to the filament, and the above-described film forming process is started again.

As shown in FIG. 2, the used cover storage section 17, the unused cover storage section 18, and the cover exchange mechanism 19 are arranged near the anti-stick cover 7 in the vacuum chamber. The used cover storage section 17 is configured to be able to store a plurality of used opening covers 16 held on the roof 15. Further, the before-use cover storage section 18 stores a plurality of opening covers before use.

The cover exchange mechanism 19 includes a first conveyance section 61 and a second conveyance section 62. The first transport section 61 transports the used opening cover 16 held by the roof 15 and placed at the first position P1 to the used cover storage section 17. The second conveyance section 62 carries the unused opening cover 16 stored in the unused cover storage section 18 through an opening 22a disposed at a second position P2 of the plurality of openings 22a provided in the roof 15. Transport to.

One of the plurality of liners 2 held by the holder 3 is placed at a vapor deposition position. The liner 2 placed at the vapor deposition position P3 faces the substrate 100 (see FIG. 1) held by the substrate holder 20 through the evaporation opening 41a of the evaporation prevention cover 7. As shown in FIG. 2, the deposition position P3 is different from the first position P1 and the second position P2.

Further, the first position P1 is different from the second position P2. That is, the position where the roof 15 delivers the opening cover 16 to the cover exchange mechanism 19 (first position) is different from the position where the roof 15 receives the opening cover 16 from the cover exchange mechanism 19 (second position). is set to . Thereby, the time required to replace the opening cover 16 can be reduced compared to the case where the receiving position and the receiving position of the opening cover 16 are the same.

Since the first conveyance section 61 and the second conveyance section 62 have the same configuration, the configuration of the first conveyance section 61 will be explained here using FIG. 3, and the explanation of the configuration of the second conveyance section 62 will be omitted. do.
FIG. 3 is a side view of the cover exchange mechanism (first transport section 61) according to the first embodiment of the present invention.

As shown in FIG. 3, the first conveyance section 61 includes a support section 64, an elevating and rotating section 65, a lever guide 66, and a conveyance lever 67. The lifting/lowering rotation part 65 is formed into a columnar shape. The support portion 64 supports the lifting/lowering rotating portion 65 so as to be movable in the axial direction (up/down movement) and rotatable around the axis.

The lever guide 66 is joined to one end (upper end) in the axial direction of the elevating and rotating portion 65, and moves up and down and rotates together with the elevating and rotating portion 65. Further, the lever guide 66 supports the transport lever 67 so as to be movable in a predetermined direction parallel to the horizontal direction. As shown in FIG. 2, the transport lever 67 includes a slider 67a movably supported by the lever guide 66, and a pair of support arms 67b provided on the slider 67a.

The pair of support arms 67b are formed into an elongated prismatic shape and have an upper surface, a lower surface, and two side surfaces. The distance between the opposing sides of the pair of support arms 67b is larger than the outer diameter of the cylindrical portion 32a of the opening cover 16. Further, the distance between the side surfaces of the pair of support arms 67b that face each other outward is shorter than the distance between the mutually opposing wall surfaces at the lower stage of the opening 22a provided in the roof 15.

When the opening cover 16 is transported by the first transport section 61, the upper surface of the pair of support arms 67b supports the lower surface of the block 31 in the opening cover 16. Note that the lower surface of the block 31 is exposed to an opening 22a provided in the roof 15 when viewed from below. Therefore, the first conveyance section 61 can support the opening cover 16 without interfering with the roof 15.

[Operation of cover exchange mechanism]
Next, the operation of the cover exchange mechanism 19 will be explained with reference to FIGS. 4 to 6.
FIG. 4 is an explanatory diagram showing the operation of the cover exchange mechanism of the indirect heating vapor deposition apparatus according to the first embodiment. FIG. 5 is a sectional view showing a state in which the cover exchange mechanism supports the opening cover. FIG. 6 is a side view showing a state in which the cover exchange mechanism supports the opening cover.

When the used opening cover 16 that needs to be replaced is placed in the first position P1, the first conveyance unit 61 of the cover exchange mechanism 19 stores the used opening cover 16. It is transported to section 17.

Whether or not the opening cover 16 needs to be replaced is determined, for example, from the cumulative thickness of the film deposited on the substrate 100. In this case, the correlation between the cumulative thickness of the film deposited on the object to be deposited and the deposit (dirt) attached to the opening cover 16 (cover body 32) is obtained in advance. When the cumulative thickness of the film deposited on the substrate 100 reaches a predetermined thickness, it is concluded that a certain amount of deposits (dirt) has adhered to the opening cover 16 used for the deposition, and the opening It is determined that the section cover 16 needs to be replaced.

Furthermore, in the case of repeating vapor deposition with the same film thickness, it may be determined that the opening cover 16 needs to be replaced when the number of times the opening cover 16 is used reaches a predetermined number of times. Furthermore, the indirect heating vapor deposition apparatus according to the present invention includes an imaging section that takes an image of the opening cover 16, and determines whether or not the opening cover 16 needs to be replaced based on the image taken by the imaging section. It's okay.

When the first transport section 61 transports the used opening cover 16 placed at the first position P1 to the used cover storage section 17, first, the lifting and lowering rotating section 65 is rotated, and the pair of support arms 67b is opposed to an extraction opening (not shown) provided in the anti-adhesive cover 7. Then, the lifting/lowering rotating part 65 is lowered to make the upper surface of the pair of support arms 67b lower than the lower surface of the block 31 in the used opening cover 16.

Next, the pair of support arms 67b (transport lever 67) are moved along the lever guide 66 and inserted into the anti-stick cover 7 through the extraction opening. Then, the pair of support arms 67b are arranged below the block 31 in the used opening cover 16.

Next, as shown in FIGS. 5 and 6, the lifting/lowering rotating part 65 is raised to bring the upper surfaces of the pair of support arms 67b into contact with the lower surface of the block 31, and the block 31 is lifted by the pair of support arms 67b. As a result, the used opening cover 16 placed at the first position P1 is supported by the first transport section 61.

At this time, the lifting rotation unit 65 is stopped at a height at which the used opening cover 16 does not come into contact with the top plate 41 of the anti-adhesive cover 7. Next, the pair of support arms 67b (transport levers 67) are moved along the lever guide 66, and the used opening cover 16 is extracted from an extraction opening (not shown) provided in the anti-adhesive cover 7.

Thereafter, the lifting/lowering rotating section 65 is rotated, and the pair of support arms 67b (transport levers 67) are moved along the lever guide 66 to transport the used opening cover 16 to the used cover storage section 17. As a result, the used opening cover 16 is stored in the used cover storage section 17.

When the opening 22a of the roof 15 from which the opening cover 16 has been removed is placed at the second position P2, the second conveyance unit 62 of the cover exchange mechanism 19 transfers the opening cover 16 before use to the opening 22a. transport.

When transporting the unused opening cover 16 to the opening 22a, first, the unused opening cover 16 stored in the unused cover storage section 18 is transferred to the pair of support arms 67b of the second transporting section 62. Supported by. Then, the elevating/lowering rotating part 65 is rotated and raised/lowered, so that the opening cover 16 before use is opposed to an insertion opening (not shown) provided in the anti-fouling cover 7 .

Next, move the pair of support arms 67b (transport lever 67) along the lever guide 66, insert the opening cover 16 before use into the anti-stick cover 7 from the insertion opening, and move it to the second position. It is arranged above the opening 22a arranged at P2. Then, the lifting/lowering rotating part 65 is lowered to engage the block 31 of the opening cover 16 before use with the step 22b of the opening 22a. Thereby, the opening cover 16 is positioned with respect to the roof 15 before use.

Thereafter, the upper surfaces of the pair of support arms 67b are separated from the lower surface of the block 31, and the opening cover 16 is held on the roof 15 before use. Then, the pair of support arms 67b (transport lever 67) is moved along the lever guide 66, and the pair of support arms 67b (transport lever 67) is extracted from the insertion opening. This completes the transportation of the opening cover 16 to the roof 15 before use.

In this embodiment, the opening cover 16 is transported by the cover exchange mechanism 19 (first transport section 61 and second transport section 62). However, in the indirect heating vapor deposition apparatus according to the present invention, the cover exchange mechanism 19 may also serve as a container conveying section for attaching and detaching the liner 2 to and from the holder 3. In this case, the lower surface of the flange portion 2c of the liner 2 is exposed to the holding hole 3a when viewed from below. Thereby, the liner 2 can be easily replaced.

<Second embodiment>
[Configuration of indirect heating vapor deposition equipment]
Next, the configuration of an indirect heating vapor deposition apparatus according to a second embodiment will be described with reference to FIG. 7.
FIG. 7 is a sectional view showing an opening cover of an indirect heating vapor deposition apparatus according to a second embodiment of the present invention.

The indirect heating evaporation apparatus according to the second embodiment has the same configuration as the indirect heating evaporation apparatus 1 (see FIGS. 1 and 2) according to the first embodiment, and the difference is that the opening cover is It is the composition. Therefore, here, the configuration of the opening cover according to the second embodiment will be described, and the description of the same configuration as the indirect heating vapor deposition apparatus 1 (see FIG. 1) according to the first embodiment will be omitted.

As shown in FIG. 7, the opening cover 72 according to the second embodiment includes a cylindrical portion 72a that passes through the opening 22a of the roof 15, and a flange 72b that is continuous with one end of the cylindrical portion 72a in the axial direction. . The axial length of the cylindrical portion 72a is greater than the thickness of the holder 3, and the other end of the cylindrical portion 32a in the axial direction is closer to the liner 2 than the lower surface of the holder 3.

The inner diameter of the cylindrical portion 72a is larger than the diameter of the inner wall surface of the liner 2, and the outer diameter of the cylindrical portion 72a is smaller than the width (diameter) of the lower step of the stepped portion 22b of the shielding plate 22. Further, it is preferable that the other end of the cylindrical portion 72a in the axial direction be close to the opening of the liner 2. This makes it difficult for evaporated particles to leak from between the liner 2 and the cover body 32 (opening cover 16).

Note that the cylindrical portion of the opening cover according to the present invention may have an inner diameter larger than the outer diameter of the flange portion of the liner. In this case, the length of the cylindrical portion in the axial direction is preferably set to such a length that the inner circumferential surface of the cylindrical portion faces the side circumferential surface of the flange portion of the liner. That is, it is preferable that the cylindrical part of the opening cover surrounds the upper part of the flange part of the liner. This makes it possible to prevent evaporated particles from leaking between the liner and the opening cover more than the opening cover 72 of this embodiment.

The outer diameter of the flange 72b is approximately equal to the width (diameter) of the upper step of the stepped portion 22b of the shielding plate 22. Therefore, the flange 72b is positioned with respect to the shielding plate 22 (roof 15) by the outer peripheral surface of the flange 72b coming into contact with the wall surface forming the upper stage of the stepped portion 22b. Further, the lower surface of the flange 72b contacts the horizontal surface of the step portion 22b, and the opening cover 72 is held by the shielding plate 22 (roof 15).

The thickness of the flange 72b is approximately equal to the thickness of the upper step of the stepped portion 22b of the shielding plate 22. Therefore, the upper surface of the flange 72b forms the same plane as the upper surface of the shielding plate 22. Further, the lower surface of the flange 72b is exposed to the opening 22a of the shielding plate 22 when viewed from below. In this embodiment, the opening cover 72 is formed of one member. Thereby, the number of parts of the indirect heating vapor deposition apparatus can be reduced.

When the opening cover 72 is transported by the first transport section 61 (second transport section 62), the upper surface of the pair of support arms 67b is brought into contact with the lower surface of the flange 72b, and the opening cover 72 is transported by the pair of support arms 67b. lift. Thereby, the opening cover 16 is supported by the first transport section 61 (second transport section 62). Note that the operation of the cover exchange mechanism 19 according to the second embodiment is the same as that in the first embodiment, so a description thereof will be omitted.

<Summary>
As explained above, the indirect heating vapor deposition apparatus according to the first and second embodiments includes a container (liner 2) formed in a cylindrical shape with a bottom and filled with vapor deposition material (evaporation material 4). , a container holding part (holder 3) that holds the container, and an electron source (electron source 8) that emits thermoelectrons for electron impact heating of the container. Furthermore, a roof (roof 15) is disposed between the container and the object to be deposited (substrate 100), and has an opening (opening 22a) through which evaporated particles generated when the evaporation material is heated pass; , and an opening cover (opening cover 16) that passes through the opening.

Thereby, the roof can prevent or suppress radiant heat generated from the container holding portion from reaching the substrate 100. As a result, it is possible to suppress the temperature rise of the deposition target. Further, since the wall surface of the opening in the roof is covered with the opening cover, it is possible to prevent evaporated particles from adhering to the roof.

Further, the indirect heating vapor deposition apparatus according to the first and second embodiments described above includes at least a cover storage section (unused cover storage section 18) that stores the opening cover (opening section cover 16) before use, and a roof The present invention includes a cover exchange mechanism (cover exchange mechanism 19) that exchanges a used opening cover held on the roof 15 with an unused opening cover stored in a cover storage section.

Thereby, a used opening cover can be easily replaced with an unused opening cover. When an indirect heating evaporation device is placed in a vacuum chamber, the used opening cover can be replaced with the opening cover before use without exposing the vacuum chamber to the atmosphere, which reduces the time required for evaporation work. It is possible to realize timeization.

Further, in the indirect heating vapor deposition apparatus according to the first and second embodiments described above, the cover storage section (the used cover storage section 17 and the unused cover storage section 18) is the opening cover (the opening cover 16) before use. ) and used opening covers can be stored. The cover exchange mechanism (cover exchange mechanism 19) includes a first conveyance section (first conveyance section 61) that conveys the used opening cover held on the roof (roof 15) to the cover storage section, and a cover exchange mechanism (cover exchange mechanism 19). A second conveyance section (second conveyance section 62) that conveys unused opening covers stored in the storage section to the roof. They can be transported separately, and the time required to replace the opening cover can be shortened.

Further, in the indirect heating vapor deposition apparatus according to the first and second embodiments described above, the roof (roof 15) has a plurality of openings (openings 22a). Further, the indirect heating vapor deposition apparatus includes a roof moving mechanism (rotary drive shaft 14) that moves the roof and changes the positions of the plurality of openings. The position (first position P1) at which the first transport section (first transport section 61) receives the used opening cover (opening section cover 16) from the roof is the second transport section (second transport section 62). ) differs in the position (second position P2) at which the opening cover is delivered to the roof before use. Thereby, the used opening cover can be transported and the unused opening cover can be transported at the same time, and the time required for replacing the opening cover can be shortened.

Note that in the indirect heating vapor deposition apparatuses according to the first and second embodiments described above, the first position P1 and the second position P2 are set to different positions from the vapor deposition position P3. Thereby, during the vapor deposition work, it is possible to simultaneously transport the used opening cover and the unused opening cover. That is, the opening cover can be replaced without stopping the vapor deposition operation.

Further, the opening cover (opening cover 16) of the indirect heating vapor deposition apparatus according to the first embodiment described above includes a block (block 31) and a cover body (cover body 32). The block is formed into a frame shape that engages with the wall surface of the opening (opening 22a) in the roof (roof 15). The cover body is provided with a cylindrical portion (cylindrical portion 32a) that passes through the block, and a flange (flange 32b) that is continuous with one end of the cylindrical portion in the axial direction and engages with the block. This makes it possible to secure a portion supported by the cover exchange mechanism without increasing the size of the flange on the cover body. Therefore, it is possible to suppress the flange on the cover body from increasing in size.

Further, the roof (roof 15) of the indirect heating vapor deposition apparatus according to the first embodiment described above has a step portion (step portion 22b) against which the outer wall surface of the block (block 31) comes into contact. Thereby, the opening cover can be easily positioned with respect to the roof.

Further, the opening cover (opening cover 72) of the indirect heating vapor deposition apparatus according to the second embodiment described above has a cylindrical portion (cylindrical portion 72a) that penetrates the opening (opening 22a) of the roof (roof 15). and a flange (flange 72b) that is continuous with one end of the cylindrical portion in the axial direction and that engages with the edge of the opening in the roof. Thereby, the number of parts of the indirect heating vapor deposition apparatus can be reduced.

Further, the roof (roof 15) of the indirect heating vapor deposition apparatus according to the second embodiment described above has a step portion (step portion 22b) that the outer peripheral surface of the flange (flange 72b) of the opening cover (opening portion cover 72) comes into contact with. ). Thereby, the opening cover can be easily positioned with respect to the roof.

Moreover, the cover exchange mechanism (cover exchange mechanism 19) of the indirect heating vapor deposition apparatus according to the first and second embodiments described above is a container transport mechanism for attaching and detaching the container (liner 2) to and from the container holding part (holder 3). Also serves as a department. Thereby, the container can be easily replaced.

<Modified example>
The embodiments of the present invention have been described above. However, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the invention as set forth in the claims. For example, the embodiments described above explain the present invention in detail in an easy-to-understand manner, and the present invention is not necessarily limited to having all the configurations described. Furthermore, it is possible to replace a part of the configuration of one embodiment with the configuration of another embodiment, and it is also possible to add the configuration of another embodiment to the configuration of one embodiment. Furthermore, it is possible to add, delete, or replace some of the configurations of each embodiment with other configurations.

For example, the indirect heating vapor deposition apparatuses according to the first and second embodiments described above are configured to include a used cover storage section 17 and an unused cover storage section 18. However, in the indirect heating vapor deposition apparatus according to the present invention, used opening covers and unused opening covers may be stored in one storage unit. Moreover, since it is not necessary to maintain a used opening cover in a position that can be supported by the cover exchange mechanism after replacement, it may be placed at a position where it does not interfere with other parts. Therefore, the indirect heating vapor deposition apparatus according to the present invention may include at least a cover storage section for storing the opening cover before use.

Further, in the indirect heating vapor deposition apparatus according to the first and second embodiments described above, the cover exchange mechanism 19 is configured to have the first conveyance section 61 and the second conveyance section 62. However, the indirect heating vapor deposition apparatus according to the present invention may have one conveyance section. In this case, after the used opening cover is transported to the used cover storage section, the unused opening cover is transported from the unused cover storage section to the roof.

Further, in the indirect heating vapor deposition apparatus according to the first embodiment described above, the block 31 is formed in an annular shape. However, the block related to the indirect heating vapor deposition apparatus according to the present invention may be in the shape of a frame having a hole through which the cover body passes. Further, in the indirect heating vapor deposition apparatus according to the first embodiment described above, the cover main body 32 (cylindrical portion 32a) is formed in a cylindrical shape. However, the cover body of the indirect heating vapor deposition apparatus according to the present invention may have a cylindrical shape as long as it has a cylindrical hole through which the evaporated particles pass.

Furthermore, in the first and second embodiments described above, the rotational drive shaft 14 is used as the moving mechanism. However, the moving mechanism according to the present invention is not limited to a mechanism that rotates the holder 3, but may be any mechanism that moves the holder and the liner. As the moving mechanism according to the present invention, for example, a linear moving mechanism that linearly moves the holder and the liner may be adopted. In this case, the electron source is placed below the holder at any position on the liner trajectory.

DESCRIPTION OF SYMBOLS 1... Indirect heating vapor deposition device, 2... Liner (container), 3... Holder (container holding part), 4... Vapor deposition material, 7... Anti-adhesion cover, 8... Electron source, 9... Accelerating power source, 14... Rotation drive shaft, 15... Roof, 16, 72... Opening cover, 17... Used cover storage section, 18... Cover storage section before use, 19... Cover exchange mechanism, 20... Board holding section, 21... Support, 22... Shielding plate, 22a ...Opening part, 22b...Step part, 31...Block, 32...Cover body, 32a, 72a...Cylinder part, 32b, 72b...Flange, 41...Top plate, 41a...Evaporation opening, 42...Side plate, 51... Rotation drive shaft, 61...First conveyance section, 62...Second conveyance section, 64...Support section, 65...Elevating/lowering rotation section, 66...Lever guide, 67...Transportation lever, 67a...Slider, 67b...Support arm, 100... Substrate, P1...first position, P2...second position, P3...evaporation position

Claims (6)

a container formed in a cylindrical shape with a bottom and filled with a vapor deposition material;
a container holding part that holds the container;
an electron source that emits thermoelectrons for electron impact heating of the container;
a roof disposed between the container and the object to be vapor-deposited, and having an opening through which evaporated particles generated when the vapor-deposition material is heated pass;
an opening cover held on the roof and passing through the opening,
The opening cover is
a frame-shaped block that engages with a wall surface of the opening in the roof;
An indirect heating vapor deposition apparatus comprising: a cylindrical portion that penetrates the block; and a cover body that is continuous with one end of the cylindrical portion in the axial direction and is provided with a flange that engages with the block. a cover storage unit that stores at least the opening cover before use;
2. The vehicle according to claim 1, further comprising: a cover exchange mechanism for exchanging the used opening cover held on the roof with the unused opening cover stored in the cover storage section. indirect heating evaporation equipment. The cover storage unit can store the opening cover before use and the used opening cover,
The cover exchange mechanism includes a first conveyance section that conveys the used opening cover held on the roof to the cover storage section, and a first conveyance section that conveys the used opening cover held on the roof to the cover storage section; The indirect heating vapor deposition apparatus according to claim 2 , further comprising a second conveyance section that conveys the material to the roof. The roof has a plurality of openings,
comprising a roof moving mechanism that moves the roof to change the positions of the plurality of openings;
A position where the first transport unit receives the used opening cover from the roof is different from a position where the second transport unit delivers the unused opening cover to the roof. 3. The indirect heating vapor deposition apparatus according to 3 . The indirect heating evaporation apparatus according to claim 1 , wherein the roof has a stepped portion against which an outer wall surface of the block comes into contact. a container formed in a cylindrical shape with a bottom and filled with a vapor deposition material;
a container holding part that holds the container;
an electron source that emits thermoelectrons for electron impact heating of the container;
a roof disposed between the container and the object to be vapor-deposited, and having an opening through which evaporated particles generated when the vapor-deposition material is heated pass;
an opening cover held on the roof and passing through the opening;
a cover storage unit that stores at least the opening cover before use;
a cover exchange mechanism for exchanging the used opening cover held on the roof with the unused opening cover stored in the cover storage section; An indirect heating evaporation device characterized in that it also serves as a container transport section that is attached to and detached from a container holding section.

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