JP7385581B2 - 二相性プラズマ・マイクロリアクタとその使用方法 - Google Patents

二相性プラズマ・マイクロリアクタとその使用方法 Download PDF

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Publication number
JP7385581B2
JP7385581B2 JP2020545699A JP2020545699A JP7385581B2 JP 7385581 B2 JP7385581 B2 JP 7385581B2 JP 2020545699 A JP2020545699 A JP 2020545699A JP 2020545699 A JP2020545699 A JP 2020545699A JP 7385581 B2 JP7385581 B2 JP 7385581B2
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liquid
gas
plasma
gas channel
microchannel
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Japanese (ja)
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JP2022516386A (ja
Inventor
ウェングラー，ジュリアン
オニエー，ステファニー
アヨウビ，サフワーン アル
タトウリアン，マイケル
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Sorbonne Universite
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Sorbonne Universite
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0093—Microreactors, e.g. miniaturised or microfabricated reactors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2020545699A 2018-02-28 2019-02-28 二相性プラズマ・マイクロリアクタとその使用方法 Active JP7385581B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP18305214.1A EP3533519B1 (de) 2018-02-28 2018-02-28 Biphasischer plasmamikroreaktor und verfahren zur verwendung davon
EP18305214.1 2018-02-28
PCT/EP2019/055027 WO2019166570A1 (en) 2018-02-28 2019-02-28 Biphasic plasma microreactor and method of using the same

Publications (2)

Publication Number Publication Date
JP2022516386A JP2022516386A (ja) 2022-02-28
JP7385581B2 true JP7385581B2 (ja) 2023-11-22

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US (1) US11388808B2 (de)
EP (1) EP3533519B1 (de)
JP (1) JP7385581B2 (de)
CN (1) CN112739456B (de)
WO (1) WO2019166570A1 (de)

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* Cited by examiner, † Cited by third party
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EP3533519B1 (de) * 2018-02-28 2020-09-30 Paris Sciences et Lettres - Quartier Latin Biphasischer plasmamikroreaktor und verfahren zur verwendung davon
CN111298737B (zh) * 2020-03-12 2021-08-17 大连理工大学 一种多功能连续流动合成装置
CN111940757B (zh) * 2020-08-14 2021-08-13 江南大学 一种连续化制备贵金属及其合金纳米颗粒的装置及方法
CN114029271B (zh) * 2021-11-04 2022-11-04 江南大学 一种堵塞微反应器的处理系统及处理方法
CN114434709B (zh) * 2021-12-28 2024-04-30 汕头大学 一种凹形微井和微通道的快速制作方法

Citations (5)

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JP2003036996A (ja) 2001-07-23 2003-02-07 Kikuchi Jun 平行平板容量結合型微小プラズマ発生装置
CN102451653A (zh) 2010-10-27 2012-05-16 中国科学院大连化学物理研究所 一种可实现酸性气体高效吸收的微反应方法
WO2015181945A1 (ja) 2014-05-30 2015-12-03 富士機械製造株式会社 プラズマ照射方法、およびプラズマ照射装置
JP2017501860A (ja) 2013-09-24 2017-01-19 ザ ボード オブ トラスティーズ オブ ザ ユニバーシティ オブ イリノイ モジュール式マイクロプラズママイクロチャネル反応装置、小型反応モジュール、及びオゾン生成装置
JP2019505379A (ja) 2015-12-11 2019-02-28 パリ・シアンス・エ・レットゥル−カルチエ・ラタン 二相性気体／液体プラズマ反応器

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JP2003036996A (ja) 2001-07-23 2003-02-07 Kikuchi Jun 平行平板容量結合型微小プラズマ発生装置
CN102451653A (zh) 2010-10-27 2012-05-16 中国科学院大连化学物理研究所 一种可实现酸性气体高效吸收的微反应方法
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JP2019505379A (ja) 2015-12-11 2019-02-28 パリ・シアンス・エ・レットゥル−カルチエ・ラタン 二相性気体／液体プラズマ反応器

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Also Published As

Publication number Publication date
US11388808B2 (en) 2022-07-12
CN112739456B (zh) 2024-03-22
WO2019166570A1 (en) 2019-09-06
EP3533519A1 (de) 2019-09-04
US20210051789A1 (en) 2021-02-18
EP3533519B1 (de) 2020-09-30
JP2022516386A (ja) 2022-02-28
CN112739456A (zh) 2021-04-30

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