JP7384283B2 - パターン形成装置 - Google Patents

パターン形成装置 Download PDF

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Publication number
JP7384283B2
JP7384283B2 JP2022524490A JP2022524490A JP7384283B2 JP 7384283 B2 JP7384283 B2 JP 7384283B2 JP 2022524490 A JP2022524490 A JP 2022524490A JP 2022524490 A JP2022524490 A JP 2022524490A JP 7384283 B2 JP7384283 B2 JP 7384283B2
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JP
Japan
Prior art keywords
light
light source
substrate
pattern forming
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022524490A
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English (en)
Japanese (ja)
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JPWO2021235439A1 (zh
JPWO2021235439A5 (zh
Inventor
修一 中山
貴之 中野
正和 堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2021235439A1 publication Critical patent/JPWO2021235439A1/ja
Publication of JPWO2021235439A5 publication Critical patent/JPWO2021235439A5/ja
Priority to JP2023191770A priority Critical patent/JP2024012562A/ja
Application granted granted Critical
Publication of JP7384283B2 publication Critical patent/JP7384283B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022524490A 2020-05-19 2021-05-18 パターン形成装置 Active JP7384283B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023191770A JP2024012562A (ja) 2020-05-19 2023-11-09 パターン形成装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020087094 2020-05-19
JP2020087094 2020-05-19
PCT/JP2021/018802 WO2021235439A1 (ja) 2020-05-19 2021-05-18 パターン形成装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023191770A Division JP2024012562A (ja) 2020-05-19 2023-11-09 パターン形成装置

Publications (3)

Publication Number Publication Date
JPWO2021235439A1 JPWO2021235439A1 (zh) 2021-11-25
JPWO2021235439A5 JPWO2021235439A5 (zh) 2022-11-15
JP7384283B2 true JP7384283B2 (ja) 2023-11-21

Family

ID=78708549

Family Applications (2)

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JP2022524490A Active JP7384283B2 (ja) 2020-05-19 2021-05-18 パターン形成装置
JP2023191770A Pending JP2024012562A (ja) 2020-05-19 2023-11-09 パターン形成装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023191770A Pending JP2024012562A (ja) 2020-05-19 2023-11-09 パターン形成装置

Country Status (4)

Country Link
JP (2) JP7384283B2 (zh)
KR (1) KR20230004748A (zh)
CN (1) CN115668066A (zh)
WO (1) WO2021235439A1 (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348018A (ja) * 1991-01-14 1992-12-03 Topcon Corp 位置合わせ光学装置
JPH07161611A (ja) * 1993-12-07 1995-06-23 Nikon Corp 位置検出装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Also Published As

Publication number Publication date
CN115668066A (zh) 2023-01-31
JPWO2021235439A1 (zh) 2021-11-25
JP2024012562A (ja) 2024-01-30
WO2021235439A1 (ja) 2021-11-25
KR20230004748A (ko) 2023-01-06

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