JP7375295B2 - 電子部品及び電子部品の製造方法 - Google Patents
電子部品及び電子部品の製造方法 Download PDFInfo
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- JP7375295B2 JP7375295B2 JP2018137057A JP2018137057A JP7375295B2 JP 7375295 B2 JP7375295 B2 JP 7375295B2 JP 2018137057 A JP2018137057 A JP 2018137057A JP 2018137057 A JP2018137057 A JP 2018137057A JP 7375295 B2 JP7375295 B2 JP 7375295B2
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- Prior art keywords
- copper
- copper particles
- particles
- wiring
- molded body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 29
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 408
- 229910052802 copper Inorganic materials 0.000 claims description 408
- 239000010949 copper Substances 0.000 claims description 408
- 239000002245 particle Substances 0.000 claims description 244
- 229920000642 polymer Polymers 0.000 claims description 64
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 46
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 31
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- 238000005245 sintering Methods 0.000 claims description 20
- 229910052763 palladium Inorganic materials 0.000 claims description 18
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 15
- 229910052737 gold Inorganic materials 0.000 claims description 15
- 239000010931 gold Substances 0.000 claims description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 14
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 11
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 11
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- YWWVWXASSLXJHU-AATRIKPKSA-N (9E)-tetradecenoic acid Chemical compound CCCC\C=C\CCCCCCCC(O)=O YWWVWXASSLXJHU-AATRIKPKSA-N 0.000 description 2
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Images
Landscapes
- Catalysts (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
銅配線4における銅の含有量(体積%)=[(M1)/8.96]×100・・・(A)
a)ニッケル含有層及びパラジウム含有層をこの順で
b)ニッケル含有層及び金含有層をこの順で
c)ニッケル含有層、パラジウム含有層及び金含有層をこの順で
d)パラジウム含有層
e)パラジウム含有層及び金含有層をこの順で
f)銅層
g)ニッケル含有層
a’)無電解ニッケルめっき被膜及び無電解パラジウムめっき被膜をこの順で
b’)無電解ニッケルめっき被膜及び無電解金めっき被膜をこの順で
c’)無電解ニッケルめっき被膜、無電解パラジウムめっき被膜及び無電解金めっき被膜をこの順で
d’)無電解パラジウムめっき被膜
e’)無電解パラジウムめっき被膜及び無電解金めっき被膜をこの順で
f’)無電解銅めっき被膜
g’)無電解ニッケルめっき被膜
[銅ペーストの調製]
分散媒としてα-テルピネオール(和光純薬工業株式会社製)5.2g及びイソボルニルシクロヘキサノール(MTPH、日本テルペン化学株式会社製)6.8gと、サブマイクロ銅粒子としてCH0200(三井金属鉱業株式会社製、50%体積平均粒径 0.36μm、粒径が0.01μm以上0.8μm以下の銅粒子の含有量95質量%)52.8gとをポリ瓶に混合し、超音波ホモジナイザー(US-600、日本精機株式会社製)により19.6kHz、600W、1分処理し分散液を得た。この分散液に、フレーク状マイクロ銅粒子としてMA-C025(三井金属鉱業株式会社製、最大径が1μm以上20μm以下の銅粒子の含有量100質量%)35.2gを添加し、スパチュラで乾燥粉がなくなるまでかき混ぜた。ポリ瓶を密栓し、自転公転型攪拌装置(Planetry Vacuum Mixer ARV-310、株式会社シンキー製)を用いて、2000rpmで2分間撹拌し、減圧下、2000rpmで2分間撹拌して銅ペーストを得た。
大きさ40mm×40mm、厚み3mmの液晶ポリマーからなるポリマー成形体(スミカスーパーLCP E6000HF、住友化学株式会社製)を準備した。続いて、図4(a)に示すように、ポリマー成形体31上に、2mm×1mmの長方形の開口を二つ有するステンレス製のメタルマスク(厚み:50μm)を載せ、メタルスキージを用いたステンシル印刷により銅ペーストを塗布して銅ペースト層32を形成した。
上記で得られた電子部品40について、下記に示す方法により接着性及び金属間化合物の厚みについて評価した。
電子部品40について、ボンドテスタ(Dage社製、商品名:万能ボンドテスタ、シリーズ4000)を用いて、接続強度(シェア強度)を測定した。具体的には、図5(a),(b)に示すように、電子部品40に対し、シェアツール37を配置し、矢印の方向に0.5mm/分の速度でシェアを行い、シェア強度を測定した。なお、図4(c)は、図4(b)におけるIVc-IVc線に沿った断面図である。銅配線34と電子素子33(電極36)とが接合されている20箇所のシェア強度の平均値から、下記基準に基づいて、電子部品40の銅配線34と電子素子33(電極36)との接着性、及び、銅配線34とポリマー成形体31との接着性を評価した。なお、作製後、150℃で、300時間、500時間、1000時間、2000時間、3000時間放置した実装基板について、同様にシェア試験を行い下記基準に基づいて評価した。150℃で、1000時間後にB以上を良好と判断した。結果を表1に示す。
A:シェア強度の平均値が200g以上
B:シェア強度の平均値が150g以上200g未満
C:シェア強度の平均値が50g以上150g未満
D:シェア強度の平均値が10g以上50g未満
E:シェア強度の平均値が10g未満
作製後に、150℃で300時間、500時間、1000時間、2000時間、3000時間放置した電子部品40を、エポキシ樹脂エピコート815(ジャパンエポキシレジン株式会社製、商品名)を用いて注型を行い、樹脂硬化後に耐水研磨紙等を用いて研磨した。その後イオンミリングE-3200(株式会社日立製作所製、商品名)を行い研磨ダレの除去を行った。続いて、図6に示すように、電極36と銅配線34と間に形成され得る金属間化合物38の有無を、電界放出型走査電子顕微鏡S-4800(株式会社日立製作所製、商品名)により観察し、得られた顕微鏡写真をもとに、金属間化合物38の厚みを計測した。厚みは、電子部品1個に対し、任意に10点について計測し、電子部品5個について計測することで、50箇所の平均値を算出することで求めた。結果を表1に示す。
実施例1におけるセラミックコンデンサの代わりに、電極がニッケル(厚み10μm)からなるセラミックコンデンサ(2mm×1.2mm×0.6mmt、株式会社村田製作所製、GQMシリーズ)に変更した以外は、実施例1と同様にして、電子部品の作製及び評価を行った。
実施例1におけるセラミックコンデンサの代わりに、電極がニッケル、パラジウムの順で積層された(ニッケル厚み10μm、パラジウム厚み0.2μm)セラミックコンデンサ(2mm×1.2mm×0.6mmt、株式会社村田製作所製、GQMシリーズ)に変更した以外は、実施例1と同様にして、電子部品の作製及び評価を行った。
実施例1におけるセラミックコンデンサの代わりに、電極がニッケル、金の順で積層された(ニッケル厚み10μm、金厚み0.2μm)セラミックコンデンサ(2mm×1.2mm×0.6mmt、村田製作所製、GQMシリーズ)に変更した以外は、実施例1と同様にして、電子部品の作製及び評価を行った。
実施例1におけるセラミックコンデンサの代わりに、電極がニッケル、スズの順で積層された(ニッケル厚み10μm、スズ厚み0.5μm)セラミックコンデンサ(2mm×1.2mm×0.6mmt、村田製作所製、GQMシリーズ)に変更した以外は、実施例1と同様にして、電子部品の作製及び評価を行った。
Claims (9)
- ポリマー成形体上に、銅粒子を含有するペーストを所定のパターンで塗布して銅ペースト層を形成する第1の工程と、
前記銅ペースト層上に電子素子を配置する第2の工程と、
前記銅粒子同士を焼結させることにより、銅配線を形成すると共に、前記銅配線と前記電子素子とを互いに接合する第3の工程と、を備え、
前記ポリマー成形体が、一面から他面まで貫通する貫通孔を有し、
前記ポリマー成形体の前記一面上には銅部材が設けられており、
前記第1の工程において、前記ポリマー成形体の前記他面上及び前記貫通孔内に前記ペーストを塗布することにより、前記銅部材に接するように前記銅ペースト層を形成する、電子部品の製造方法。 - ポリマー成形体上に、銅粒子を含有するペーストを所定のパターンで塗布して銅ペースト層を形成する第1の工程と、
前記銅ペースト層上に電子素子を配置する第2の工程と、
前記銅粒子同士を焼結させることにより、銅配線を形成すると共に、前記銅配線と前記電子素子とを互いに接合する第3の工程と、を備え、
前記第1の工程において、前記銅ペーストを三次元状のパターンで塗布する、電子部品の製造方法。 - 前記銅粒子が、粒径が2.0μm以上である第1の銅粒子と、粒径が0.8μm以下である第2の銅粒子とを含む、請求項1又は2に記載の電子部品の製造方法。
- 前記ポリマー成形体が、液晶ポリマー又はポリフェニレンスルフィドからなる、請求項1~3のいずれか一項に記載の電子部品の製造方法。
- 前記電子素子が、銅、ニッケル、パラジウム、金、白金、銀及びスズからなる群より選ばれる少なくとも一種を最表面に含む電極を有し、
前記第2の工程において、前記電極が前記銅ペースト層と接するように前記電子素子を配置する、請求項1~4のいずれか一項に記載の電子部品の製造方法。 - ポリマー成形体と、
前記ポリマー成形体上に設けられ、銅粒子の焼結体からなる銅配線と、
前記銅配線と接合するように配置された電子素子と、を備え、
前記ポリマー成形体が、一面から他面まで貫通する貫通孔を有し、
前記ポリマー成形体の前記一面上には銅部材が設けられており、
前記銅配線が、前記銅部材と接合するように、前記ポリマー成形体の前記他面上及び前記貫通孔内に設けられている、電子部品。 - 前記銅粒子が、粒径が2.0μm以上である第1の銅粒子と、粒径が0.8μm以下である第2の銅粒子とを含む、請求項6に記載の電子部品。
- 前記ポリマー成形体が、液晶ポリマー又はポリフェニレンスルフィドからなる、請求項6又は7に記載の電子部品。
- 前記電子素子が、銅、ニッケル、パラジウム、金、白金、銀及びスズからなる群より選ばれる少なくとも一種を最表面に含む電極を有し、
前記電極が、前記銅配線と接合している、請求項6~8のいずれか一項に記載の電子部品。
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