JP7367215B2 - 荷電粒子線装置、およびそのフォーカス調整方法 - Google Patents

荷電粒子線装置、およびそのフォーカス調整方法 Download PDF

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Publication number
JP7367215B2
JP7367215B2 JP2022530359A JP2022530359A JP7367215B2 JP 7367215 B2 JP7367215 B2 JP 7367215B2 JP 2022530359 A JP2022530359 A JP 2022530359A JP 2022530359 A JP2022530359 A JP 2022530359A JP 7367215 B2 JP7367215 B2 JP 7367215B2
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Japan
Prior art keywords
sample
charged particle
particle beam
focus
focus adjustment
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JP2022530359A
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Japanese (ja)
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JPWO2021250733A5 (https=
JPWO2021250733A1 (https=
Inventor
啓介 五十嵐
偉健 陳
真衣 吉原
寛幸 千葉
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2022530359A 2020-06-08 2020-06-08 荷電粒子線装置、およびそのフォーカス調整方法 Active JP7367215B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/022503 WO2021250733A1 (ja) 2020-06-08 2020-06-08 荷電粒子線装置、およびそのフォーカス調整方法

Publications (3)

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JPWO2021250733A1 JPWO2021250733A1 (https=) 2021-12-16
JPWO2021250733A5 JPWO2021250733A5 (https=) 2023-02-13
JP7367215B2 true JP7367215B2 (ja) 2023-10-23

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JP2022530359A Active JP7367215B2 (ja) 2020-06-08 2020-06-08 荷電粒子線装置、およびそのフォーカス調整方法

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US (1) US12368017B2 (https=)
JP (1) JP7367215B2 (https=)
WO (1) WO2021250733A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102939071B1 (ko) 2025-10-16 2026-03-12 재단법인 한국전자기계융합기술원 전자광학계 기반 다단계 교차보정 자동초점 장치 및 제어 방법
WO2026062788A1 (ja) * 2024-09-18 2026-03-26 株式会社日立ハイテク 荷電粒子ビーム装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7768680B2 (ja) * 2021-02-19 2025-11-12 株式会社キーエンス 拡大観察装置、拡大画像観察方法、拡大画像観察プログラム及びコンピュータで読み取り可能な記録媒体並びに記憶した機器
JP7545355B2 (ja) * 2021-03-18 2024-09-04 キオクシア株式会社 描画方法、原版製造方法および描画装置
JP7681649B2 (ja) * 2023-07-19 2025-05-22 日本電子株式会社 荷電粒子線装置及びカメラ画像表示方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002191060A (ja) 2000-12-22 2002-07-05 Olympus Optical Co Ltd ３次元撮像装量
JP2006310223A (ja) 2005-05-02 2006-11-09 Ebara Corp 試料検査装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4610798B2 (ja) 2001-06-19 2011-01-12 エスアイアイ・ナノテクノロジー株式会社 レーザ欠陥検出機能を備えた走査型電子顕微鏡とそのオートフォーカス方法
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
JP6309366B2 (ja) * 2014-06-30 2018-04-11 株式会社ホロン 荷電粒子線装置における高さ測定装置およびオートフォーカス装置
WO2020016262A1 (en) * 2018-07-20 2020-01-23 Asml Netherlands B.V. System and method for bare wafer inspection

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002191060A (ja) 2000-12-22 2002-07-05 Olympus Optical Co Ltd ３次元撮像装量
JP2006310223A (ja) 2005-05-02 2006-11-09 Ebara Corp 試料検査装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026062788A1 (ja) * 2024-09-18 2026-03-26 株式会社日立ハイテク 荷電粒子ビーム装置
KR102939071B1 (ko) 2025-10-16 2026-03-12 재단법인 한국전자기계융합기술원 전자광학계 기반 다단계 교차보정 자동초점 장치 및 제어 방법

Also Published As

Publication number Publication date
WO2021250733A1 (ja) 2021-12-16
US12368017B2 (en) 2025-07-22
US20230230798A1 (en) 2023-07-20
JPWO2021250733A1 (https=) 2021-12-16

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