JPWO2021250733A1 - - Google Patents
Info
- Publication number
- JPWO2021250733A1 JPWO2021250733A1 JP2022530359A JP2022530359A JPWO2021250733A1 JP WO2021250733 A1 JPWO2021250733 A1 JP WO2021250733A1 JP 2022530359 A JP2022530359 A JP 2022530359A JP 2022530359 A JP2022530359 A JP 2022530359A JP WO2021250733 A1 JPWO2021250733 A1 JP WO2021250733A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2020/022503 WO2021250733A1 (ja) | 2020-06-08 | 2020-06-08 | 荷電粒子線装置、およびそのフォーカス調整方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021250733A1 true JPWO2021250733A1 (https=) | 2021-12-16 |
| JPWO2021250733A5 JPWO2021250733A5 (https=) | 2023-02-13 |
| JP7367215B2 JP7367215B2 (ja) | 2023-10-23 |
Family
ID=78847008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022530359A Active JP7367215B2 (ja) | 2020-06-08 | 2020-06-08 | 荷電粒子線装置、およびそのフォーカス調整方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12368017B2 (https=) |
| JP (1) | JP7367215B2 (https=) |
| WO (1) | WO2021250733A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7768680B2 (ja) * | 2021-02-19 | 2025-11-12 | 株式会社キーエンス | 拡大観察装置、拡大画像観察方法、拡大画像観察プログラム及びコンピュータで読み取り可能な記録媒体並びに記憶した機器 |
| JP7545355B2 (ja) * | 2021-03-18 | 2024-09-04 | キオクシア株式会社 | 描画方法、原版製造方法および描画装置 |
| JP7681649B2 (ja) * | 2023-07-19 | 2025-05-22 | 日本電子株式会社 | 荷電粒子線装置及びカメラ画像表示方法 |
| WO2026062788A1 (ja) * | 2024-09-18 | 2026-03-26 | 株式会社日立ハイテク | 荷電粒子ビーム装置 |
| KR102939071B1 (ko) | 2025-10-16 | 2026-03-12 | 재단법인 한국전자기계융합기술원 | 전자광학계 기반 다단계 교차보정 자동초점 장치 및 제어 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002191060A (ja) * | 2000-12-22 | 2002-07-05 | Olympus Optical Co Ltd | ３次元撮像装量 |
| JP2006310223A (ja) * | 2005-05-02 | 2006-11-09 | Ebara Corp | 試料検査装置 |
| JP2016011896A (ja) * | 2014-06-30 | 2016-01-21 | 株式会社ホロン | 荷電粒子線装置における高さ測定装置およびオートフォーカス装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4610798B2 (ja) | 2001-06-19 | 2011-01-12 | エスアイアイ・ナノテクノロジー株式会社 | レーザ欠陥検出機能を備えた走査型電子顕微鏡とそのオートフォーカス方法 |
| JP4751635B2 (ja) * | 2005-04-13 | 2011-08-17 | 株式会社日立ハイテクノロジーズ | 磁界重畳型電子銃 |
| WO2020016262A1 (en) * | 2018-07-20 | 2020-01-23 | Asml Netherlands B.V. | System and method for bare wafer inspection |
-
2020
- 2020-06-08 WO PCT/JP2020/022503 patent/WO2021250733A1/ja not_active Ceased
- 2020-06-08 US US18/007,588 patent/US12368017B2/en active Active
- 2020-06-08 JP JP2022530359A patent/JP7367215B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002191060A (ja) * | 2000-12-22 | 2002-07-05 | Olympus Optical Co Ltd | ３次元撮像装量 |
| JP2006310223A (ja) * | 2005-05-02 | 2006-11-09 | Ebara Corp | 試料検査装置 |
| JP2016011896A (ja) * | 2014-06-30 | 2016-01-21 | 株式会社ホロン | 荷電粒子線装置における高さ測定装置およびオートフォーカス装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7367215B2 (ja) | 2023-10-23 |
| WO2021250733A1 (ja) | 2021-12-16 |
| US12368017B2 (en) | 2025-07-22 |
| US20230230798A1 (en) | 2023-07-20 |
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