JP7330260B2 - ランプハウス補正を備えるプラズマ源 - Google Patents
ランプハウス補正を備えるプラズマ源 Download PDFInfo
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- G02B17/0892—Catadioptric systems specially adapted for the UV
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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- G—PHYSICS
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- H—ELECTRICITY
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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- Physics & Mathematics (AREA)
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- General Health & Medical Sciences (AREA)
- Immunology (AREA)
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- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Discharge Lamp (AREA)
- Plasma Technology (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Description
本特許出願は、「PLASMA SOURCE LAMP HOUSE CORRECTION METHOD」と題し、Shiyu Zhang,Mark Shi Wang,Ilya Bezelを発明者として、2018年7月31日に出願された米国仮特許出願第62/712,391号の、米国特許法第119条(e)の下での優先権を主張するものであり、その全体は参照により本明細書に組み込まれる。
18を介して放出される放射を捕捉するように構成される。例えば、検出器アセンブリ1228は、試験片1107から反射又は散乱された(例えば、鏡面反射、拡散反射などを介して)放射を受光し得る。別の例として、検出器アセンブリ1228は、試験片1107によって生成された放射(例えば、ビームの吸収に関連する発光など)を受光してもよい。検出器アセンブリ1228は、当技術分野で周知の任意のセンサ及び検出器アセンブリを含み得ることに留意する。センサは、限定的ではないが、CCD検出器、CMOS検出器、TDI検出器、PMT、APDなどを含み得る。
Claims (8)
- システムであって、
ポンプ照明を生成するように構成されたポンプ源と、
前記ポンプ照明を受光し、前記ポンプ照明の1つ以上の特性を修正して、システムの1つ以上の光学素子によって導入された前記ポンプ照明の1つ以上の収差を補正するように構成された補正板と、
前記ポンプ照明を受光し、プラズマランプ内に含有されるガス体積に前記ポンプ照明を向けるように構成される反射器要素であって、ここで前記ガス体積内にプラズマを維持して広帯域照明を生成するように前記プラズマランプが構成され、かつポンピング経路に沿って導入された収差を補正する反射器要素と、
を備えるシステム。 - 前記プラズマランプは円筒形プラズマランプを含む、請求項1に記載のシステム。
- 前記反射器要素は非球面反射器要素を含む、請求項1に記載のシステム。
- 前記非球面反射器要素の表面プロファイルは、
によって記述される、請求項3に記載のシステム。 - 前記補正板は、前記プラズマランプによって導入された前記ポンプ照明の1つ以上の収差を補正するように構成される非球面補正板を含む、請求項1に記載のシステム。
- 前記補正板の表面プロファイルは
によって記述される、請求項5に記載のシステム。 - 前記補正板は第1の補正板及び第2の補正板を含み、ここで前記第1の補正板は1つ以上の奇数の非球面補正項を含み、前記第2の補正板は1つ以上の円筒形補正項を含む、請求項1に記載のシステム。
- 前記補正板は、1つ以上の奇数の非球面補正項及び1つ以上の円筒形補正項を有する表面を含む、請求項1に記載のシステム。
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JP2023128988A JP2023159191A (ja) | 2018-07-31 | 2023-08-08 | ランプハウス補正を備えるプラズマ源のシステム及び方法 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862712391P | 2018-07-31 | 2018-07-31 | |
US62/712,391 | 2018-07-31 | ||
US16/165,842 US10823943B2 (en) | 2018-07-31 | 2018-10-19 | Plasma source with lamp house correction |
US16/165,842 | 2018-10-19 | ||
PCT/US2019/043833 WO2020028208A1 (en) | 2018-07-31 | 2019-07-29 | Plasma source with lamp house correction |
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JP2023128988A Division JP2023159191A (ja) | 2018-07-31 | 2023-08-08 | ランプハウス補正を備えるプラズマ源のシステム及び方法 |
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JP2021533406A JP2021533406A (ja) | 2021-12-02 |
JPWO2020028208A5 JPWO2020028208A5 (ja) | 2022-08-01 |
JP7330260B2 true JP7330260B2 (ja) | 2023-08-21 |
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JP2021505410A Active JP7330260B2 (ja) | 2018-07-31 | 2019-07-29 | ランプハウス補正を備えるプラズマ源 |
JP2023128988A Pending JP2023159191A (ja) | 2018-07-31 | 2023-08-08 | ランプハウス補正を備えるプラズマ源のシステム及び方法 |
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Country Status (7)
Country | Link |
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US (1) | US10823943B2 (ja) |
JP (2) | JP7330260B2 (ja) |
KR (1) | KR102542726B1 (ja) |
CN (1) | CN112655070B (ja) |
IL (1) | IL280237B2 (ja) |
TW (1) | TWI808213B (ja) |
WO (1) | WO2020028208A1 (ja) |
Families Citing this family (2)
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JP2021076451A (ja) * | 2019-11-07 | 2021-05-20 | ソニー株式会社 | 検出光学系、検出装置、フローサイトメータ及びイメージングサイトメータ |
KR20230044314A (ko) * | 2020-08-06 | 2023-04-03 | 아이에스티이큐 비.브이. | 고휘도 레이저 펌핑 플라즈마 광원 및 수차 감소 방법 |
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2018
- 2018-10-19 US US16/165,842 patent/US10823943B2/en active Active
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2019
- 2019-07-10 TW TW108124199A patent/TWI808213B/zh active
- 2019-07-29 WO PCT/US2019/043833 patent/WO2020028208A1/en active Application Filing
- 2019-07-29 CN CN201980057387.5A patent/CN112655070B/zh active Active
- 2019-07-29 KR KR1020217005916A patent/KR102542726B1/ko active IP Right Grant
- 2019-07-29 JP JP2021505410A patent/JP7330260B2/ja active Active
- 2019-07-29 IL IL280237A patent/IL280237B2/en unknown
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Also Published As
Publication number | Publication date |
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IL280237B2 (en) | 2024-06-01 |
KR20210027505A (ko) | 2021-03-10 |
WO2020028208A1 (en) | 2020-02-06 |
IL280237B1 (en) | 2024-02-01 |
KR102542726B1 (ko) | 2023-06-13 |
US10823943B2 (en) | 2020-11-03 |
IL280237A (en) | 2021-03-01 |
US20200041774A1 (en) | 2020-02-06 |
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