JP7315557B2 - 光共振器、表示パネル - Google Patents
光共振器、表示パネル Download PDFInfo
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- JP7315557B2 JP7315557B2 JP2020536573A JP2020536573A JP7315557B2 JP 7315557 B2 JP7315557 B2 JP 7315557B2 JP 2020536573 A JP2020536573 A JP 2020536573A JP 2020536573 A JP2020536573 A JP 2020536573A JP 7315557 B2 JP7315557 B2 JP 7315557B2
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- Prior art keywords
- light
- layer
- optical resonator
- optical
- functional layer
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- 239000010410 layer Substances 0.000 claims description 203
- 238000006243 chemical reaction Methods 0.000 claims description 123
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- 239000002096 quantum dot Substances 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 9
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- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 150000002290 germanium Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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- 150000004820 halides Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical class [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- XCAUINMIESBTBL-UHFFFAOYSA-N lead(ii) sulfide Chemical compound [Pb]=S XCAUINMIESBTBL-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000011368 organic material Substances 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- GGYFMLJDMAMTAB-UHFFFAOYSA-N selanylidenelead Chemical class [Pb]=[Se] GGYFMLJDMAMTAB-UHFFFAOYSA-N 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- GTLQJUQHDTWYJC-UHFFFAOYSA-N zinc;selenium(2-) Chemical class [Zn+2].[Se-2] GTLQJUQHDTWYJC-UHFFFAOYSA-N 0.000 description 1
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
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- H—ELECTRICITY
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- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/18358—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] containing spacer layers to adjust the phase of the light wave in the cavity
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
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- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
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- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Description
101 共振器本体
110 光変換層
121 第1機能層
122 第2機能層
130 光学媒体層
140 反射防止膜
150 金属吸収層
200 光強度制御構造
210 第1の電極
220 第2の電極
230 エレクトロクロミック層
240 第3の電極
250 第4の電極
260 第1の偏光層
270 第2の偏光層
280 液晶層
310 第1の基板
320 第2の基板
1100 画素ユニット
Claims (17)
- 光変換層を含む光共振器であって、特定の波長域の光を出射するように構成され、前記光共振器における前記特定の波長域の光の中心波長の少なくとも1つの波節に前記光変換層が設けられており、
前記光共振器は、第1の機能層と、前記第1の機能層に対向して設けられた第2の機能層と、前記第1の機能層と前記第2の機能層との間に位置する光学媒体層と、をさらに含み、
前記光変換層は、前記光学媒体層内に位置し、前記特定の波長域の光は、前記第1の機能層から出射され、
前記光共振器は、銀膜と、第1のシリカ膜と、光変換材料膜と、第2のシリカ膜と、二酸化チタン膜とがこの順で積層して設けられ、前記二酸化チタン膜が前記第1の機能層とし、前記銀膜は前記第2の機能層とし、前記第1のシリカ膜と前記第2のシリカ膜は前記光学媒体層とし、前記光変換材料膜は前記光変換層とする、光共振器。 - 前記光共振器は透過型光共振器であり、前記第1の機能層と前記第2の機能層は共に半透過反射膜であるか、又は、
前記光共振器は反射型光共振器であり、前記第1の機能層は半透過反射膜であり、前記第2の機能層は全反射膜である、請求項1に記載の光共振器。 - 前記光学媒体層の光学的厚さと前記光変換層の光学的厚さとの和は、前記特定の波長域の光の中心波長の半波長の正の整数倍である、請求項1または2に記載の光共振器。
- 前記光変換層の屈折率は、前記光学媒体層の屈折率よりも大きい、請求項1~3のいずれか一項に記載の光共振器。
- 前記光変換層の厚さ中心面と前記特定の波長域の光の中心波長の波節との距離は、前記中心波長の1/30以下である、請求項1~4のいずれか一項に記載の光共振器。
- 前記光変換層の厚さは、前記特定の波長域の光の中心波長の1/30以下である、請求項1~5のいずれか一項に記載の光共振器。
- 前記特定の波長域の光は単色光である、請求項1~6のいずれか一項に記載の光共振器。
- 前記単色光は、赤色光、緑色光、青色光のいずれかである、請求項7に記載の光共振器。
- 前記光変換層の材料は、前記単色光を得るための上変換発光材料および/または下変換発光材料を含む、請求項7に記載の光共振器。
- 前記上変換発光材料は希土類イオンがドープされた無機化合物を含み、
前記下変換発光材料は蛍光材料または量子ドット材料を含む、請求項9に記載の光共振器。 - 前記光共振器は、複数の前記光変換層を含み、複数の前記光変換層は、互いに間隔を隔てて、前記特定の波長域の光の中心波長の異なる波節に設けられている、請求項1に記載の光共振器。
- 反射防止膜をさらに含み、
前記光共振器が透過型光共振器である場合に、前記反射防止膜は、前記第2の機能層の前記第1の機能層に離れる側に設けられ、
前記光共振器が反射型光共振器である場合に、前記反射防止膜は、前記第1の機能層の前記第2の機能層に離れる側に設けられている、請求項2に記載の光共振器。 - 第1の機能層の一方側に、または前記第1の機能層内に設けられた金属吸収層をさらに含む、請求項1~12のいずれか一項に記載の光共振器。
- 請求項1~13のいずれか一項に記載の光共振器を含む、表示パネル。
- 前記光共振器と積層して設けられ、通過する光の強度を制御可能に構成された光強度制御構造をさらに含む、請求項14に記載の表示パネル。
- 前記表示パネルは反射型表示パネルであり、前記表示パネルの表示側から非表示側に向かって、光強度制御構造と前記光共振器とを順次設置し、前記光共振器は光反射を実現するための反射型光共振器であり、又は、
前記表示パネルは透過型表示パネルであり、前記光共振器は透過型光共振器である、請求項15に記載の表示パネル。 - 前記光強度制御構造は、エレクトロクロミック光強度制御構造または液晶光強度制御構造であり、
前記エレクトロクロミック光強度制御構造は、第1の電極と、第2の電極と、エレクトロクロミック層とを含み、前記第1の電極と第2の電極は、電気信号の印加時に前記エレクトロクロミック層を制御可能に構成され、
前記液晶光強度制御構造は、第3の電極と、第4の電極と、第1の偏光層と、第2の偏光層と、液晶層とを含み、前記第1の偏光層の第1の偏光方向と前記第2の偏光層の第2の偏光方向とは互いに垂直となり、前記液晶層は前記第1の偏光層と前記第2の偏光層との間に介在し、前記第3の電極と前記第4の電極は、電気信号の印加時に前記液晶層を制御可能に構成されている、請求項15に記載の表示パネル。
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