JP7295027B2 - 水素支援型の統合された排ガス調整システム - Google Patents
水素支援型の統合された排ガス調整システム Download PDFInfo
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- JP7295027B2 JP7295027B2 JP2019554915A JP2019554915A JP7295027B2 JP 7295027 B2 JP7295027 B2 JP 7295027B2 JP 2019554915 A JP2019554915 A JP 2019554915A JP 2019554915 A JP2019554915 A JP 2019554915A JP 7295027 B2 JP7295027 B2 JP 7295027B2
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- 239000007789 gas Substances 0.000 title claims description 134
- 229910052739 hydrogen Inorganic materials 0.000 title claims description 74
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims description 72
- 239000001257 hydrogen Substances 0.000 title claims description 72
- 230000003750 conditioning effect Effects 0.000 title claims description 53
- 239000003054 catalyst Substances 0.000 claims description 200
- 239000000203 mixture Substances 0.000 claims description 140
- 239000000758 substrate Substances 0.000 claims description 135
- 239000002808 molecular sieve Substances 0.000 claims description 127
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 127
- 230000003647 oxidation Effects 0.000 claims description 86
- 238000007254 oxidation reaction Methods 0.000 claims description 86
- 239000011247 coating layer Substances 0.000 claims description 73
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 67
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 59
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 55
- 239000011148 porous material Substances 0.000 claims description 48
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- 229910044991 metal oxide Inorganic materials 0.000 claims description 31
- 150000004706 metal oxides Chemical class 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 29
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 23
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- 238000010531 catalytic reduction reaction Methods 0.000 claims description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 18
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- JYIBXUUINYLWLR-UHFFFAOYSA-N aluminum;calcium;potassium;silicon;sodium;trihydrate Chemical compound O.O.O.[Na].[Al].[Si].[K].[Ca] JYIBXUUINYLWLR-UHFFFAOYSA-N 0.000 claims description 5
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- UNYSKUBLZGJSLV-UHFFFAOYSA-L calcium;1,3,5,2,4,6$l^{2}-trioxadisilaluminane 2,4-dioxide;dihydroxide;hexahydrate Chemical compound O.O.O.O.O.O.[OH-].[OH-].[Ca+2].O=[Si]1O[Al]O[Si](=O)O1.O=[Si]1O[Al]O[Si](=O)O1 UNYSKUBLZGJSLV-UHFFFAOYSA-L 0.000 description 33
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- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 13
- 238000002485 combustion reaction Methods 0.000 description 11
- -1 platinum group metals Chemical class 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
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- 229910000505 Al2TiO5 Inorganic materials 0.000 description 4
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
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- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 4
- 229910052878 cordierite Inorganic materials 0.000 description 4
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 4
- 239000003344 environmental pollutant Substances 0.000 description 4
- 229910001657 ferrierite group Inorganic materials 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 4
- 239000002346 layers by function Substances 0.000 description 4
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- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 description 4
- 230000007420 reactivation Effects 0.000 description 4
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 4
- 229910052684 Cerium Inorganic materials 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
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- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
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- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
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- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
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- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 2
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- 229910052783 alkali metal Inorganic materials 0.000 description 2
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- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
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- CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 description 2
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- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
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- 150000004678 hydrides Chemical class 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
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- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 2
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- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 2
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- GHOKWGTUZJEAQD-ZETCQYMHSA-N (D)-(+)-Pantothenic acid Chemical compound OCC(C)(C)[C@@H](O)C(=O)NCCC(O)=O GHOKWGTUZJEAQD-ZETCQYMHSA-N 0.000 description 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
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- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- HEHRHMRHPUNLIR-UHFFFAOYSA-N aluminum;hydroxy-[hydroxy(oxo)silyl]oxy-oxosilane;lithium Chemical compound [Li].[Al].O[Si](=O)O[Si](O)=O.O[Si](=O)O[Si](O)=O HEHRHMRHPUNLIR-UHFFFAOYSA-N 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910001038 basic metal oxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
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- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
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Images
Classifications
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Description
実施形態1:排ガス流処理用の排ガス調整システムであって、排ガス流と流体連結するように基体上に設けられた酸化触媒組成物と、酸化触媒組成物の下流の基体上に設けられた少なくとも1種の選択触媒還元(SCR)組成物と、酸化触媒組成物の上流又は酸化触媒組成物の下流であり、少なくとも1種のSCR組成物の上流で、排ガス流に水素を導入するための水素噴射部と、を含む、排ガス調整システム。
本明細書で言及されるすべての米国特許出願、公開された特許出願及び特許は、その全体が参照により本明細書に組み込まれる。
酸化触媒組成物は、排ガスのNOx及び/又はCO及び/又はHC成分を、例えば<250℃の比較的低い温度で酸化するのに適している。適した酸化触媒は、有利には、耐火金属酸化物基材上に分散した白金族金属(PGM)を含む。
SCR部に使用されるSCR組成物は、本明細書に記載の1つ以上のSCR触媒組成物を含むことができる。所定の実施形態では、SCR塗工組成物は、例えば、2つの異なる温度範囲、特に<250℃の低温及び約250℃から約550℃の高温で運転するのに効果がある。例えば、所定の実施形態では、SCR塗工組成物は、第一のSCR触媒及び卑金属含有分子篩SCR触媒を含む。選択触媒還元(SCR)触媒は、NOx汚染物を窒素及び水に転化する。
有利には、第一のSCR組成物は、高表面積の耐火金属酸化物基材、例えば高表面積アルミナ基材上に設けられた1つ以上の白金族金属を含む。SCR組成物に適したPGMは、例えばロジウムである。PGMベースのSCR触媒は、有利には、≦250℃の温度で効果があり得る。
SCR組成物は、約250℃から約550℃のより高い温度で効果がある、卑金属含有分子篩触媒組成物も含むことができる。この触媒は一般に、アンモニア前駆体として尿素を用いるが、ここでアンモニアは活性還元剤である。運転中、尿素がSCR部の上流の位置から排気流に定期的に計量供給される。注入器は、SCR部と流体連通し且つその上流にある。注入器は一般に還元剤(又は還元剤前駆体)貯蔵器及びポンプとも関連する。貯蔵器、ポンプ等は機能性部材とはみなされない。
SCR触媒部材は、上記のフロースルーモノリス又は壁流フィルターモノリスのいずれかを利用し得る。SCR触媒組成物に使用される壁流フィルター基体は、コージェライト、アルミニウムチタネート、シリコンカーバイド、シリコンチタネート、金属又は金属発泡体などの材料から作製することができる。
Pd(0.5wt.%)、Ba(0.8wt.%)及びPt(0.3wt.%)を含浸させた粉砕アルミナ粉末を含有する底部コート触媒スラリーを調製し、硝酸でpH4.5から5.0に調整した。底部コートスラリーの固形分は38wt.%であった。アルミナ/5wt.%Mn及びPt-アミン(3.3wt.%)を含有するトップコートスラリーを調製し、粉砕して、硝酸でpH4.5から5.0に調整した。トップコートスラリーの固形分濃度は37wt.%であった。ゼオライトベータ(0.35g/in3)をトップコートスラリーに添加した。
粉砕したCuCHA(3.7wt.%のCu)及び5wt.%のジルコニウムアセテート結合剤を含有する触媒スラリーを調製し、ウォッシュコート技術により70.8cm3の容量を有する互い違いのチャネル開口部を備えた300/12、直径1”×長さ5.5” のハニカム基体に施与した。塗工したコアを130℃で乾燥し、550℃で1時間焼成して、1.75g/in3の塗工装填量を得た。
実施例1の塗工されたDOC部材を、800℃の管状炉で16時間、10%のH2O、10%のO2、残りN2の供給ガス組成で、水熱老化させた。SCRoF部材は新しいものであった。DOCの直前に、H2パルスの源としての役目を果たすH2/N2の個別の供給ラインを備えたシミュレートされたNEDC(新欧州運転サイクル)を実施するため装備された実験室反応器内で、試料を評価した。SCRoFの前に、NH3/NOx比=1でNH3を秒ユニットで注入した。車両とシミュレーター間のエンジン出力温度トレースを図5に示し、車両トレースとシミュレーター間のエンジン出力CO排出量を図6に示す。水素注入の影響は、DOCのみについて、及びDOC+SCRoFシステムについて評価し、試料採取ラインはDOC及びSCRoFの間に、第二の試料採取ラインは組み合わされたシステムの後に設けられた。SCRoF部材はDOC部材の下流にあった。
粉砕したCuCHA(3.3wt.%のCu)及び5wt.%のジルコニウムアセテート結合剤を含有する触媒スラリーを調製し、ウォッシュコート技術により、64.4cm3の容量を有する400cpsi、1”×5”のフロースルーハニカム基体に施与した。塗工されたコアを130℃で乾燥し、550℃で1時間焼成して、2.85g/in3の装填量を得た。
実施例1からの同じ塗工されたDOC部材を、800℃の管状炉で16時間、10%のH2O、10%のO2、残りN2の供給ガス組成で、水熱老化させた。第二のSCR部は新しいものであった。実施例3で記載の通り、DOCの直前に、H2パルスの源としての役目を果たすH2/N2の個別の供給ラインを備えたシミュレートされたNEDC(新欧州運転サイクル)を実施するため装備された実験室反応器内で、試料を評価した。水素注入の影響は、DOCのみについて、及びDOC+SCRシステムについて評価し、試料採取ラインはDOC及びSCRの間に、第二の試料採取ラインは組み合わされたシステムの後に設けられた。第二のSCR部はDOC部材の下流にあった。
実施例1からの同じ塗工されたDOC部材を、800℃の管状炉で16時間、10%のH2O、10%のO2、残りN2の供給ガス組成で、水熱老化させた。第二のSCR部は、750℃で16時間、空気中10%の蒸気で老化させた。DOCの直前に、H2パルスの源としての役目を果たすH2/N2の個別の供給ラインを備えたシミュレートされたNEDC(新欧州運転サイクル)を実施するため装備された実験室反応器内で、試料を評価した。水素注入の影響は、DOCのみについて、及びDOC+SCRシステムについて評価し、試料採取ラインはDOC及びSCRの間に、第二の試料採取ラインは組み合わされたシステムの後に設けられた。
上記の実施例6からの同じ老化させたSCR部を使用して、第二のSCR部の前での水素パルスが、DOC部材の前で水素を注入した上記の実施例6で観察される効果を有するかどうかを試験した。供給ガス中の水素濃度を1%にして、最初の200秒又は300秒の間、水素を排気流中にパルスで送った。水素注入は、H2/N2供給ガス内の別の(予熱されていない)ラインを介して実行した。最初の200秒又は300秒は、再稼動期間を表していた。
Claims (24)
- 排ガス流処理用の排ガス調整システムであって、
排ガス流と流体連結するように基体上に設けられた酸化触媒組成物と、
前記酸化触媒組成物の下流の基体上に設けられた少なくとも1種の選択触媒還元(SCR)組成物と、
前記酸化触媒組成物の上流又は前記酸化触媒組成物の下流であり、前記少なくとも1種のSCR組成物の上流で、前記排ガス流に水素を導入するための水素噴射部と、
を含み、
前記少なくとも1種のSCR組成物が、耐火金属酸化物基材上に分散した白金族金属成分を含有する第一のSCR触媒と、卑金属含有分子篩を含有する第二のSCR触媒とを含み、
前記少なくとも1種のSCR組成物が、前記第一のSCR触媒を含む第一のSCR塗工層と、前記第二のSCR触媒を含む第二のSCR塗工層とを含み、そして
前記第一のSCR塗工層と前記第二のSCR塗工層とが、区分け塗布され、前記第一のSCR塗工層が前記前部上流端に近接し、前記第二のSCR塗工層が前記後部下流端に近接していることを特徴とする排ガス流処理用の排ガス調整システム。 - 前記少なくとも1種のSCR組成物を支持する基体が、フロースルーモノリス、又はモノリス状の壁流フィルターである、請求項1に記載の排ガス調整システム。
- 前記第一のSCR触媒が、ロジウムを含む、請求項1に記載の排ガス調整システム。
- 前記卑金属が、銅及び/又は鉄を含む、請求項1に記載の排ガス調整システム。
- 前記分子篩が8環小細孔の分子篩である請求項1に記載の排ガス調整システム。
- 前記分子篩が、AEI、AFT、AFX、CHA、EAB、ERI、KFI、LEV、SAS、SAT、及びSAVからなる群から選択される構造を有するゼオライトである、請求項1に記載の排ガス調整システム。
- 前記分子篩が、CHA結晶構造を有するアルミノシリケートゼオライトであり、シリカ/アルミナ比が1~1000である、請求項1に記載の排ガス調整システム。
- 前記分子篩中に存在する前記卑金属が、前記卑金属含有分子篩の総質量に対して、0.1質量%~10質量%である、請求項1に記載の排ガス調整システム。
- 前記第一のSCR触媒が、前記SCR触媒組成物を支持する基体の容量に対して、5g/ft3~250g/ft3の白金族金属成分を含む、請求項1に記載の排ガス調整システム。
- 前記第一のSCR触媒が、更にアンモニア吸着成分を含む、請求項1に記載の排ガス調整システム。
- 前記アンモニア吸着成分が、クリノプチロライト、モルデナイト、及びベータゼオライトからなる群から選択されるゼオライトである、請求項10に記載の排ガス調整システム。
- 排ガス調整システム中に、基体上に設けられた前記酸化触媒組成物及び基体上に設けられた前記少なくとも1種の選択触媒還元(SCR)組成物以外には、他の排ガス処理ユニットを含まない、請求項1又は2に記載の排ガス調整システム。
- 前記酸化触媒組成物が、耐火金属酸化物基材上に分散した白金族金属成分を含む、請求項1又は2に記載の排ガス調整システム。
- 前記酸化触媒組成物が、前記基体の容量に対して、5g/ft3~250g/ft3の範囲の白金族金属成分を含む、請求項13に記載の排ガス調整システム。
- 貯蔵された水素が断続的に導入されるようにシステムが構成されている、請求項1又は2に記載の排ガス調整システム。
- 貯蔵された水素が再稼動期間に導入されるようにシステムが構成されている、請求項1又は2に記載の排ガス調整システム。
- 更に水素貯蔵部を含む、請求項1又は2に記載の排ガス調整システム。
- 前記少なくとも1種のSCR組成物を支持する前記基体が、軸方向長さを画定する前部上流端と後部下流端とを含むモノリス状の壁流フィルター部材であり、
前記少なくとも1種のSCR組成物が、
耐火金属酸化物基材上に分散した白金族金属成分を含有する第一のSCR触媒と、
卑金属含有分子篩を含む第二のSCR触媒と、
を含む、請求項1又は2に記載の排ガス調整システム。 - 前記モノリス状の壁流フィルター部材が、50%~85%の範囲の多孔度を有する、請求項18に記載の排ガス調整システム。
- 前記モノリス状の壁流フィルター部材が、平均孔径が5μm~100μmの細孔を有する、請求項18に記載の排ガス調整システム。
- 前記少なくとも1種の選択触媒還元(SCR)組成物の上流に、これと流体連結した噴出器を更に含み、かつ
前記少なくとも1種の選択触媒還元(SCR)組成物の上流で、アンモニア又はアンモニア前駆体を導入するように構成されている、請求項1又は2に記載の排ガス調整システム。 - 排ガス流を処理する方法であって、
前記排ガス流を、該排ガス流と流体連結するように基体上に設けられた酸化触媒組成物を含む酸化触媒部に受け入れて、第一の流出流を得、
前記第一の流出流を、前記酸化触媒部から、下流の基体上に設けられた少なくとも1種の選択触媒還元(SCR)組成物を含む選択触媒還元(SCR)部に受け入れ、更に
前記酸化触媒部の上流又は前記酸化触媒部の下流であって、前記SCR部の上流で、水素を断続的に導入すること、
前記少なくとも1種のSCR組成物が、耐火金属酸化物基材上に分散した白金族金属成分を含有する第一のSCR触媒と、卑金属含有分子篩を含有する第二のSCR触媒とを含み、
前記少なくとも1種のSCR組成物が、前記第一のSCR触媒を含む第一のSCR塗工層と、前記第二のSCR触媒を含む第二のSCR塗工層とを含み、そして
前記第一のSCR塗工層と前記第二のSCR塗工層とが、区分け塗布され、前記第一のSCR塗工層が前記前部上流端に近接し、前記第二のSCR塗工層が前記後部下流端に近接していること
を特徴とする、排ガス流の処理方法。 - 前記水素の断続的な導入は、再稼動期間の水素の噴出を含む、請求項22に記載の処理方法。
- 前記少なくとも1種のSCR組成物を支持する基体が、フロースルーモノリス、又はモノリス状の壁流フィルターである、請求項22に記載の処理方法。
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