JP7278983B2 - マルチビーム走査透過荷電粒子顕微鏡 - Google Patents

マルチビーム走査透過荷電粒子顕微鏡 Download PDF

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Publication number
JP7278983B2
JP7278983B2 JP2020027747A JP2020027747A JP7278983B2 JP 7278983 B2 JP7278983 B2 JP 7278983B2 JP 2020027747 A JP2020027747 A JP 2020027747A JP 2020027747 A JP2020027747 A JP 2020027747A JP 7278983 B2 JP7278983 B2 JP 7278983B2
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charged particle
particle beams
detector
plane
beams
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JP2020027747A
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Japanese (ja)
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JP2020140961A5 (enExample
JP2020140961A (ja
Inventor
モハンマディ－ゲイダーリ アリ
ラジッチ アイヴァン
ボスコ エリック
ファン フェーン ゲラルド
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FEI Co
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FEI Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2020027747A 2019-02-28 2020-02-21 マルチビーム走査透過荷電粒子顕微鏡 Active JP7278983B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/289,292 2019-02-28
US16/289,292 US10607811B1 (en) 2019-02-28 2019-02-28 Multi-beam scanning transmission charged particle microscope

Publications (3)

Publication Number Publication Date
JP2020140961A JP2020140961A (ja) 2020-09-03
JP2020140961A5 JP2020140961A5 (enExample) 2023-03-02
JP7278983B2 true JP7278983B2 (ja) 2023-05-22

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JP2020027747A Active JP7278983B2 (ja) 2019-02-28 2020-02-21 マルチビーム走査透過荷電粒子顕微鏡

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Country Link
US (1) US10607811B1 (enExample)
EP (1) EP3706155B1 (enExample)
JP (1) JP7278983B2 (enExample)
CN (1) CN111627787B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3614414A1 (en) * 2018-08-20 2020-02-26 FEI Company Method of examining a sample using a charged particle microscope
US11211223B1 (en) * 2020-08-25 2021-12-28 Fei Company System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy
US20240112884A1 (en) * 2022-09-28 2024-04-04 Kla Corporation Distortion reduction in a multi-beam imaging system
US20250069847A1 (en) * 2023-08-22 2025-02-27 Fei Company Differential phase contrast microanalysis using energy loss spectrometers

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150069235A1 (en) 2013-09-09 2015-03-12 Carl Zeiss Microscopy Gmbh Particle Optical System
US20150170876A1 (en) 2013-12-18 2015-06-18 Fei Company Method of investigating the wavefront of a charged-particle beam
JP2015159112A (ja) 2014-02-24 2015-09-03 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡内で試料を検査する方法
JP2016207651A (ja) 2015-04-15 2016-12-08 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡によるトモグラフィックイメージングを実行する方法
US20170025247A1 (en) 2015-03-18 2017-01-26 Battelle Memorial Institute Tem phase contrast imaging with image plane phase grating

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10289847A (ja) * 1997-04-11 1998-10-27 Fujitsu Ltd 荷電粒子ビーム露光方法及びシステム
US10067239B2 (en) * 2012-05-31 2018-09-04 Minnesota Imaging And Engineering Llc Detector systems for radiation imaging
EP3010031B1 (en) * 2014-10-16 2017-03-22 Fei Company Charged Particle Microscope with special aperture plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150069235A1 (en) 2013-09-09 2015-03-12 Carl Zeiss Microscopy Gmbh Particle Optical System
US20150170876A1 (en) 2013-12-18 2015-06-18 Fei Company Method of investigating the wavefront of a charged-particle beam
JP2015159112A (ja) 2014-02-24 2015-09-03 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡内で試料を検査する方法
US20170025247A1 (en) 2015-03-18 2017-01-26 Battelle Memorial Institute Tem phase contrast imaging with image plane phase grating
JP2016207651A (ja) 2015-04-15 2016-12-08 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡によるトモグラフィックイメージングを実行する方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Ivan Lazic et al.，Phase contrast STEM for thin samples: Integrated differential phase contrast，Ultramicroscopy，2016年01月，Volume 160, Pages 265-280

Also Published As

Publication number Publication date
US10607811B1 (en) 2020-03-31
EP3706155A1 (en) 2020-09-09
JP2020140961A (ja) 2020-09-03
EP3706155B1 (en) 2024-05-22
CN111627787A (zh) 2020-09-04
CN111627787B (zh) 2025-01-28

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