CN111627787B - 多射束扫描透射带电粒子显微镜 - Google Patents
多射束扫描透射带电粒子显微镜 Download PDFInfo
- Publication number
- CN111627787B CN111627787B CN202010123762.6A CN202010123762A CN111627787B CN 111627787 B CN111627787 B CN 111627787B CN 202010123762 A CN202010123762 A CN 202010123762A CN 111627787 B CN111627787 B CN 111627787B
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- Prior art keywords
- charged particle
- sample
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- particle beams
- microscope
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- 238000003384 imaging method Methods 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 37
- 230000001678 irradiating effect Effects 0.000 claims abstract description 6
- 230000033001 locomotion Effects 0.000 claims description 20
- 238000011144 upstream manufacturing Methods 0.000 claims description 6
- 230000010354 integration Effects 0.000 claims description 3
- 238000000386 microscopy Methods 0.000 abstract description 3
- 239000000523 sample Substances 0.000 description 68
- 238000010894 electron beam technology Methods 0.000 description 9
- 238000001514 detection method Methods 0.000 description 8
- 230000005855 radiation Effects 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001493 electron microscopy Methods 0.000 description 5
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- 238000004458 analytical method Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000005430 electron energy loss spectroscopy Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 241000252073 Anguilliformes Species 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000001350 scanning transmission electron microscopy Methods 0.000 description 3
- 238000005136 cathodoluminescence Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000001888 ion beam-induced deposition Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
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- 238000012545 processing Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2802—Transmission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2804—Scattered primary beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/289292 | 2019-02-28 | ||
| US16/289,292 US10607811B1 (en) | 2019-02-28 | 2019-02-28 | Multi-beam scanning transmission charged particle microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111627787A CN111627787A (zh) | 2020-09-04 |
| CN111627787B true CN111627787B (zh) | 2025-01-28 |
Family
ID=69713944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010123762.6A Active CN111627787B (zh) | 2019-02-28 | 2020-02-27 | 多射束扫描透射带电粒子显微镜 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10607811B1 (enExample) |
| EP (1) | EP3706155B1 (enExample) |
| JP (1) | JP7278983B2 (enExample) |
| CN (1) | CN111627787B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3614414A1 (en) * | 2018-08-20 | 2020-02-26 | FEI Company | Method of examining a sample using a charged particle microscope |
| US11211223B1 (en) * | 2020-08-25 | 2021-12-28 | Fei Company | System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy |
| US20240112884A1 (en) * | 2022-09-28 | 2024-04-04 | Kla Corporation | Distortion reduction in a multi-beam imaging system |
| US20250069847A1 (en) * | 2023-08-22 | 2025-02-27 | Fei Company | Differential phase contrast microanalysis using energy loss spectrometers |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10289847A (ja) * | 1997-04-11 | 1998-10-27 | Fujitsu Ltd | 荷電粒子ビーム露光方法及びシステム |
| CN105529235A (zh) * | 2014-10-16 | 2016-04-27 | Fei公司 | 具有特殊孔隙板的带电粒子显微镜 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10067239B2 (en) * | 2012-05-31 | 2018-09-04 | Minnesota Imaging And Engineering Llc | Detector systems for radiation imaging |
| DE102013014976A1 (de) * | 2013-09-09 | 2015-03-12 | Carl Zeiss Microscopy Gmbh | Teilchenoptisches System |
| EP2887381B1 (en) * | 2013-12-18 | 2016-09-21 | Fei Company | Method of investigating the wavefront of a charged-particle beam |
| EP2911180A1 (en) * | 2014-02-24 | 2015-08-26 | FEI Company | Method of examining a sample in a charged-particle microscope |
| US10170274B2 (en) | 2015-03-18 | 2019-01-01 | Battelle Memorial Institute | TEM phase contrast imaging with image plane phase grating |
| EP3082150B1 (en) * | 2015-04-15 | 2017-07-19 | FEI Company | Method and scanning transmission type charged-particle microscope for performing tomographic imaging |
-
2019
- 2019-02-28 US US16/289,292 patent/US10607811B1/en active Active
-
2020
- 2020-02-20 EP EP20158375.4A patent/EP3706155B1/en active Active
- 2020-02-21 JP JP2020027747A patent/JP7278983B2/ja active Active
- 2020-02-27 CN CN202010123762.6A patent/CN111627787B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10289847A (ja) * | 1997-04-11 | 1998-10-27 | Fujitsu Ltd | 荷電粒子ビーム露光方法及びシステム |
| CN105529235A (zh) * | 2014-10-16 | 2016-04-27 | Fei公司 | 具有特殊孔隙板的带电粒子显微镜 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111627787A (zh) | 2020-09-04 |
| EP3706155B1 (en) | 2024-05-22 |
| JP7278983B2 (ja) | 2023-05-22 |
| US10607811B1 (en) | 2020-03-31 |
| JP2020140961A (ja) | 2020-09-03 |
| EP3706155A1 (en) | 2020-09-09 |
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| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |