JP7257286B2 - 真空伝導率を改善するためのx線および粒子遮蔽体 - Google Patents
真空伝導率を改善するためのx線および粒子遮蔽体 Download PDFInfo
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- JP7257286B2 JP7257286B2 JP2019150120A JP2019150120A JP7257286B2 JP 7257286 B2 JP7257286 B2 JP 7257286B2 JP 2019150120 A JP2019150120 A JP 2019150120A JP 2019150120 A JP2019150120 A JP 2019150120A JP 7257286 B2 JP7257286 B2 JP 7257286B2
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- 239000002245 particle Substances 0.000 title claims description 14
- 239000000463 material Substances 0.000 claims description 35
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 description 13
- 239000007789 gas Substances 0.000 description 10
- 229910000986 non-evaporable getter Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000011800 void material Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 108010083687 Ion Pumps Proteins 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000013500 performance material Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 102000006391 Ion Pumps Human genes 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000009428 plumbing Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F1/00—Shielding characterised by the composition of the materials
- G21F1/02—Selection of uniform shielding materials
- G21F1/08—Metals; Alloys; Cermets, i.e. sintered mixtures of ceramics and metals
- G21F1/085—Heavy metals or alloys
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F1/00—Shielding characterised by the composition of the materials
- G21F1/12—Laminated shielding materials
- G21F1/125—Laminated shielding materials comprising metals
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F3/00—Shielding characterised by its physical form, e.g. granules, or shape of the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
- H01J37/165—Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Metallurgy (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Ceramic Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- X-Ray Techniques (AREA)
Description
Claims (20)
- 少なくとも180°のねじれを有するねじれに成形された高原子量材料で形成された長さ及び幅を有する細長いX線遮蔽体を備え、前記細長いX線遮蔽体は、真空チャンバに結合された真空配管の少なくとも一部内に配置されており、前記真空チャンバからのX線の漏れを少なくとも部分的に防止する、装置。
- 前記細長いX線遮蔽体が、210°のねじれを有する、請求項1に記載の装置。
- 前記高原子量材料が、鉛である、請求項1または2に記載の装置。
- 前記高原子量材料が、焼結タングステン粒子を含む材料から形成されている、請求項1または2に記載の装置。
- 前記細長いX線遮蔽体が、低原子量材料の層でコーティングされている、請求項1~4のいずれかに記載の装置。
- 前記低原子量材料が、アルミニウムである、請求項5に記載の装置。
- 前記細長いX線遮蔽体が、正または負にバイアスされている、請求項1~6のいずれかに記載の装置。
- 前記細長いX線遮蔽体が、冷却されている、請求項1~7のいずれかに記載の装置。
- 前記幅および長さが、真空配管の内径および長さの一部に基づいており、前記真空配管が、高真空チャンバと真空ポンプとを結合する、請求項1~8のいずれかに記載の装置。
- 前記細長いX線遮蔽体に対して垂直に並べられた第2の細長いX線遮蔽体をさらに備え、前記第2の細長いX線遮蔽体が、ねじれに成形された高原子量材料から形成されている、請求項1~9のいずれかに記載の装置。
- 真空チャンバと、
真空配管によって前記真空チャンバに結合された真空ポンプと、
前記真空配管の少なくとも一部内に配置された長さ及び幅を有する細長いX線遮蔽体と、を備え、前記細長いX線遮蔽体が、ねじれに成形された高原子量材料から形成されている、システム。 - 前記細長いX線遮蔽体が、180°のねじれを有する、請求項11に記載のシステム。
- 前記細長いX線遮蔽体が、210°のねじれを有する、請求項11に記載のシステム。
- 前記高原子量材料が、鉛である、請求項11~13のいずれかに記載のシステム。
- 前記高原子量材料が、焼結タングステン粒子を含む材料から形成されている、請求項11~13のいずれかに記載のシステム。
- 前記細長いX線遮蔽体が、低原子量材料の層でコーティングされている、請求項11~15のいずれかに記載のシステム。
- 前記低原子量材料が、アルミニウムである、請求項16に記載のシステム。
- 前記細長いX線遮蔽体が、正または負にバイアスされている、請求項11~17のいずれかに記載のシステム。
- 前記細長いX線遮蔽体が、冷却されている、請求項11~18のいずれかに記載のシステム。
- 前記真空チャンバが、荷電粒子顕微鏡の一部である、請求項11~19のいずれかに記載のシステム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/106,914 US10748740B2 (en) | 2018-08-21 | 2018-08-21 | X-ray and particle shield for improved vacuum conductivity |
US16/106,914 | 2018-08-21 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2020073867A JP2020073867A (ja) | 2020-05-14 |
JP2020073867A5 JP2020073867A5 (ja) | 2022-08-29 |
JP7257286B2 true JP7257286B2 (ja) | 2023-04-13 |
Family
ID=67659055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019150120A Active JP7257286B2 (ja) | 2018-08-21 | 2019-08-20 | 真空伝導率を改善するためのx線および粒子遮蔽体 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10748740B2 (ja) |
EP (1) | EP3614397A1 (ja) |
JP (1) | JP7257286B2 (ja) |
CN (1) | CN110853788B (ja) |
CZ (1) | CZ37483U1 (ja) |
DE (1) | DE202019005929U1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11972920B2 (en) * | 2021-11-23 | 2024-04-30 | Fei Company | Vacuum compatible X-ray shield |
Citations (5)
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US20040131478A1 (en) | 2003-01-08 | 2004-07-08 | Helix Technology Corporation | Radiation shielding coating |
JP2012167979A (ja) | 2011-02-14 | 2012-09-06 | Kawasaki Heavy Ind Ltd | スクリューダクト案内羽根およびスクリューダクト |
JP2013024566A (ja) | 2011-07-14 | 2013-02-04 | Toshiba Corp | 放射線遮蔽材および放射線遮蔽構造物 |
JP2016090277A (ja) | 2014-10-30 | 2016-05-23 | 株式会社東芝 | 放射線遮蔽パネル及び遮蔽構造体 |
JP2017049175A (ja) | 2015-09-03 | 2017-03-09 | 三菱重工業株式会社 | ダクト用スクリュー及びダクト並びに放射線遮へい設備 |
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2018
- 2018-08-21 US US16/106,914 patent/US10748740B2/en active Active
-
2019
- 2019-08-16 DE DE202019005929.6U patent/DE202019005929U1/de active Active
- 2019-08-16 EP EP19192034.7A patent/EP3614397A1/en not_active Withdrawn
- 2019-08-16 CZ CZ2023-40914U patent/CZ37483U1/cs active Protection Beyond IP Right Term
- 2019-08-20 JP JP2019150120A patent/JP7257286B2/ja active Active
- 2019-08-21 CN CN201910774808.8A patent/CN110853788B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US20040131478A1 (en) | 2003-01-08 | 2004-07-08 | Helix Technology Corporation | Radiation shielding coating |
JP2012167979A (ja) | 2011-02-14 | 2012-09-06 | Kawasaki Heavy Ind Ltd | スクリューダクト案内羽根およびスクリューダクト |
JP2013024566A (ja) | 2011-07-14 | 2013-02-04 | Toshiba Corp | 放射線遮蔽材および放射線遮蔽構造物 |
JP2016090277A (ja) | 2014-10-30 | 2016-05-23 | 株式会社東芝 | 放射線遮蔽パネル及び遮蔽構造体 |
JP2017049175A (ja) | 2015-09-03 | 2017-03-09 | 三菱重工業株式会社 | ダクト用スクリュー及びダクト並びに放射線遮へい設備 |
Also Published As
Publication number | Publication date |
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CZ37483U1 (cs) | 2023-11-20 |
CN110853788B (zh) | 2024-06-25 |
CN110853788A (zh) | 2020-02-28 |
US20200066479A1 (en) | 2020-02-27 |
US10748740B2 (en) | 2020-08-18 |
DE202019005929U1 (de) | 2023-06-21 |
EP3614397A1 (en) | 2020-02-26 |
JP2020073867A (ja) | 2020-05-14 |
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