JP7245881B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP7245881B2 JP7245881B2 JP2021134764A JP2021134764A JP7245881B2 JP 7245881 B2 JP7245881 B2 JP 7245881B2 JP 2021134764 A JP2021134764 A JP 2021134764A JP 2021134764 A JP2021134764 A JP 2021134764A JP 7245881 B2 JP7245881 B2 JP 7245881B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2007—Holding mechanisms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Polarising Elements (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
300 支持ユニット
310 チャック
330 絶縁リング
350 下部電極
370 駆動部材
390 吸着部材
500 誘電体板ユニット
510 第1ベース
520 誘電体板
600 上部電極ユニット
610 第2ベース
620 上部電極
700 温度調節プレート
800 ガス供給ユニット
Claims (15)
- 基板を処理する装置において、
処理空間を有するハウジングと、
前記処理空間で基板を支持するチャックを含む支持ユニットと、を含み、
前記チャックに支持された基板の中央領域に非活性ガスを供給する第1ガス供給部、そして前記チャックに支持された基板の縁領域にプラズマ状態に励起される工程ガスを供給する第2ガス供給部を含むガス供給ユニットと、
前記チャックに支持された基板の上面と対向するように提供される誘電体板と、を含み、
前記誘電体板の中央領域の下面高さと前記誘電体板の縁領域の下面高さは、互いに異なり、
前記チャックの中央領域の上面高さと前記チャックの縁領域の上面高さは、互いに異なり、
前記チャックの上面は、
前記チャックの中央領域の上面高さが前記チャックの縁領域の上面高さより低いように凹であり、
前記チャックの中央領域の上面と前記誘電体板との間の間隔は、前記チャックの縁領域の上面と前記誘電体板との間の間隔よりも広く、
前記第2ガス供給部から供給された工程ガスは上から下に向かう方向に流れる一方、前記基板が前記チャックの前記凹の上面に沿って下に凸に支持された状態で、前記第1ガス供給部から供給された非活性ガスは前記基板の縁領域に沿って流れて上向傾いた方向に流れてなる、基板処理装置。 - 前記誘電体板の中央領域の下面高さは、前記誘電体板の縁領域の下面高さより高い請求項1に記載の基板処理装置。
- 前記誘電体板の下面は、
前記誘電体板の中央領域の下面高さが前記誘電体板の縁領域の下面高さより高くなるように凹である請求項1または請求項2に記載の基板処理装置。 - 前記誘電体板の下面は、
前記誘電体板の中央領域の下面高さが前記誘電体板の縁領域の下面高さより高くなるように段差付けている請求項1または請求項2に記載の基板処理装置。 - 前記誘電体板には、
前記誘電体板の上面から前記誘電体板の下面に向かう方向に湾入される湾入部と、
前記湾入部から前記誘電体板の下面まで延長され、前記第1ガス供給部が供給する前記非活性ガスが流れる少なくとも1つ以上の噴射ホールが形成される請求項1または請求項2に記載の基板処理装置。 - 前記装置は、
前記誘電体板と前記ハウジングの天井との間に提供されるベースをさらに含み、
前記湾入部と前記ベースは、互いに組み合わせてバッファ空間を形成し、
前記バッファ空間は、
前記噴射ホールと互いに連通する請求項5に記載の基板処理装置。 - 前記第1ガス供給部は、
前記バッファ空間に前記工程ガスを供給する請求項6に記載の基板処理装置。 - 前記噴射ホールは、
1.5mm乃至3.0mmの直径を有する請求項5に記載の基板処理装置。 - 前記支持ユニットは、
前記チャックに支持された基板の下面を吸着する吸着ラインと、
前記吸着ラインと連結される減圧部材と、を含む請求項1または請求項2に記載の基板処理装置。 - 前記装置は、
上部から見る時、前記誘電体板を囲むように提供される上部電極をさらに含み、
前記支持ユニットは、
上部から見る時、前記チャックを囲むように提供され、前記上部電極と互いに対向するように提供される下部電極を含む請求項9に記載の基板処理装置。 - 基板を処理する装置において、
処理空間を有するハウジングと、
前記処理空間で基板を支持するチャックを含む支持ユニットと、を含み、
前記チャックに支持された基板の中央領域に非活性ガスを供給する第1ガス供給部、そして前記チャックに支持された基板の縁領域にプラズマ状態に励起される工程ガスを供給する第2ガス供給部を含むガス供給ユニットと、
前記チャックに支持された基板の上面と対向するように提供される誘電体板と、を含み、
前記誘電体板の下面は、
前記誘電体板の中央領域の下面高さが前記誘電体板の縁領域の下面高さより高くなるように凹であり、
前記チャックの上面は、
前記チャックの中央領域の上面高さが前記チャックの縁領域の上面高さより低いように凹であり、
前記第2ガス供給部から供給された工程ガスは上から下に向かう方向に流れる一方、前記基板が前記チャックの前記凹の上面に沿って下に凸に支持された状態で、前記第1ガス供給部から供給された非活性ガスは前記基板の縁領域に沿って流れて上向傾いた方向に流れてなる、基板処理装置。 - 前記支持ユニットは、
前記チャックに支持された基板の下面を吸着する吸着ラインと、
前記吸着ラインと連結される減圧部材と、を含む請求項11に記載の基板処理装置。 - 前記装置は、
上部から見る時、前記誘電体板を囲むように提供される上部電極をさらに含み、
前記支持ユニットは、
上部から見る時、前記チャックを囲むように提供され、前記上部電極と互いに対向するように提供される下部電極を含む請求項12に記載の基板処理装置。 - 前記チャックは、
RF電源と連結され、
前記上部電極、そして前記下部電極は、接地される請求項13に記載の基板処理装置。 - 前記支持ユニットは、
前記下部電極、そして前記チャックの間に提供される絶縁リングをさらに含み、
前記絶縁リングは、
内側領域の上面高さが外側領域の上面高さより高くなるように段差付けた形状を有する請求項13に記載の基板処理装置。
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KR1020200106340A KR102275757B1 (ko) | 2020-08-24 | 2020-08-24 | 기판 처리 장치 |
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JP7245881B2 true JP7245881B2 (ja) | 2023-03-24 |
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JP (1) | JP7245881B2 (ja) |
KR (1) | KR102275757B1 (ja) |
CN (1) | CN114188207B (ja) |
TW (1) | TWI798792B (ja) |
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KR102357066B1 (ko) * | 2019-10-31 | 2022-02-03 | 세메스 주식회사 | 기판 처리 장치 |
KR102116474B1 (ko) * | 2020-02-04 | 2020-05-28 | 피에스케이 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
KR102580583B1 (ko) * | 2021-08-10 | 2023-09-21 | 피에스케이 주식회사 | 기판 처리 장치 |
WO2023027199A1 (ko) * | 2021-08-23 | 2023-03-02 | 피에스케이 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
KR102579740B1 (ko) * | 2021-08-23 | 2023-09-19 | 피에스케이 주식회사 | 기판 처리 장치 |
KR102580584B1 (ko) * | 2021-08-25 | 2023-09-21 | 피에스케이 주식회사 | 기판 처리 장치 및 유전체 판 정렬 방법 |
KR102589182B1 (ko) * | 2021-08-31 | 2023-10-16 | 피에스케이 주식회사 | 기판 처리 장치 및 유전체 판 정렬 방법 |
KR102606837B1 (ko) * | 2021-11-02 | 2023-11-29 | 피에스케이 주식회사 | 상부 전극 유닛, 그리고 이를 포함하는 기판 처리 장치 |
KR20230063746A (ko) * | 2021-11-02 | 2023-05-09 | 피에스케이 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
KR102504269B1 (ko) * | 2021-11-11 | 2023-02-28 | 피에스케이 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 |
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JP2011514679A (ja) | 2008-03-14 | 2011-05-06 | ラム リサーチ コーポレーション | ウエハ直径よりも大きいプラズマ排除区域リングを使用した、ベベルエッチング膜プロファイルの制御 |
JP2021125675A (ja) | 2020-02-04 | 2021-08-30 | ピーエスケー インコーポレイテッド | 基板処理装置及び基板処理方法 |
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- 2021-08-16 TW TW110130045A patent/TWI798792B/zh active
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2010517295A (ja) | 2007-01-26 | 2010-05-20 | ラム リサーチ コーポレーション | 真空チャックを備えるベベルエッチャ |
JP2011514679A (ja) | 2008-03-14 | 2011-05-06 | ラム リサーチ コーポレーション | ウエハ直径よりも大きいプラズマ排除区域リングを使用した、ベベルエッチング膜プロファイルの制御 |
JP2021125675A (ja) | 2020-02-04 | 2021-08-30 | ピーエスケー インコーポレイテッド | 基板処理装置及び基板処理方法 |
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CN114188207B (zh) | 2024-03-12 |
TWI798792B (zh) | 2023-04-11 |
TW202209552A (zh) | 2022-03-01 |
US20220059324A1 (en) | 2022-02-24 |
JP2022036923A (ja) | 2022-03-08 |
CN114188207A (zh) | 2022-03-15 |
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