JP7241493B2 - IMPRINT APPARATUS, INFORMATION PROCESSING APPARATUS, AND ARTICLE MANUFACTURING METHOD - Google Patents

Description

The present invention relates to an imprint apparatus, an information processing apparatus, and an article manufacturing method.

Imprint technology is a technology that enables the transfer of nanoscale fine patterns, and is attracting attention as one of the nanolithography technologies for mass production of semiconductor devices and magnetic storage media. An imprinting apparatus using imprinting technology hardens the imprinting material in a state in which the mold on which the pattern is formed and the imprinting material on the substrate are in contact with each other, and separates the mold from the hardened imprinting material. Form a pattern on top.

In the imprint apparatus, it is effective to determine the quality of the pattern formed on the substrate, that is, the quality of the imprint process, based on the imaging information (image) from the imaging unit arranged above the substrate ( See Patent Document 1). In Patent Document 1, an image obtained by an imaging unit at a specific timing of imprint processing is compared with a prepared reference image (an image obtained by the imaging unit in a normal state) to perform imprint processing. is disclosed.

JP 2016-111335 A

However, in order to verify the performance of imprint processing and maintain accuracy, it is necessary to grasp (examine) the status of imprint processing and perform imprint processing, instead of judging the quality of imprint processing only at specific timings of imprint processing. It is necessary to judge the quality of print processing. In order to correctly grasp the state of imprint processing, it is necessary to easily compare imprint processing of the entire substrate, comparison of imprint processing between shot regions on the substrate, and comparison of imprint processing between substrates. Is required.

SUMMARY OF THE INVENTION It is an exemplary object of the present invention to provide an imprint apparatus that is advantageous for easily grasping the status of imprint processing.

To achieve the above object, an imprinting apparatus as one aspect of the present invention is an imprinting apparatus that performs an imprinting process of forming a pattern of an imprinting material in a shot region on a substrate using a mold, 3 shows an imaging unit that captures an image of a shot area including a portion where the imprint material on the substrate and the mold are in contact with each other and acquires an image corresponding to the shot area, and an arrangement of a plurality of shot areas on the substrate; a control unit that controls a display unit to superimpose and display the images corresponding to the plurality of shot areas acquired by the imaging unit in a shot layout, and the superimposed display is performed; The images corresponding to the plurality of shot areas are still images with the same elapsed time from the start of the imprint processing for each of the plurality of shot areas, or moving images with the same elapsed time. It is characterized by

Further objects or other aspects of the present invention will be made clear by preferred embodiments described below with reference to the accompanying drawings.

According to the present invention, for example, it is possible to provide an imprint apparatus that is advantageous for easily grasping the status of imprint processing.

1 is a schematic diagram showing the configuration of an imprint apparatus as one aspect of the present invention; FIG. 2 is a diagram showing an example of interference fringes observed by an observation unit of the imprint apparatus shown in FIG. 1; FIG. 4 is a flowchart for explaining general imprint processing; FIG. 4 is a diagram for explaining general imprint processing; 2 is a diagram showing an example of a display screen displayed on a display unit of the imprint apparatus shown in FIG. 1; FIG. 2 is a diagram showing an example of a display screen displayed on a display unit of the imprint apparatus shown in FIG. 1; FIG. 2 is a diagram showing an example of a display screen displayed on a display unit of the imprint apparatus shown in FIG. 1; FIG. 2 is a diagram showing an example of a display screen displayed on a display unit of the imprint apparatus shown in FIG. 1; FIG. 2 is a diagram showing an example of a display screen displayed on a display unit of the imprint apparatus shown in FIG. 1; FIG. It is a figure for demonstrating the manufacturing method of articles|goods.

Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. In addition, in each figure, the same reference numerals are given to the same members, and redundant explanations are omitted.

FIG. 1 is a schematic diagram showing the configuration of an imprint apparatus 100 as one aspect of the present invention. The imprint apparatus 100 is a lithography apparatus that is used for manufacturing semiconductor devices as articles and forms a pattern of imprint material on a substrate using a mold. In the present embodiment, the imprinting apparatus 100 brings the imprinting material supplied onto the substrate into contact with the mold, and applies energy for curing to the imprinting material, thereby obtaining a cured product having the concave-convex pattern of the mold transferred thereto. form a pattern of

A curable composition (also referred to as an uncured resin) that cures when energy for curing is applied is used for the imprint material. Electromagnetic waves, heat, and the like are used as energy for curing. As the electromagnetic wave, for example, light such as infrared rays, visible rays, and ultraviolet rays having a wavelength selected from a range of 10 nm or more and 1 mm or less is used.

A curable composition is a composition that is cured by irradiation with light or by heating. A photocurable composition that is cured by light irradiation contains at least a polymerizable compound and a photopolymerization initiator, and may contain a non-polymerizable compound or a solvent, if necessary. The non-polymerizable compound is at least one selected from the group consisting of sensitizers, hydrogen donors, internal release agents, surfactants, antioxidants, polymer components and the like.

The imprint material may be applied to the substrate in the form of a film by a spin coater or a slit coater. Alternatively, the imprint material may be applied onto the substrate in the form of droplets, or in the form of islands or films formed by connecting a plurality of droplets, by the liquid jet head. The viscosity of the imprint material (viscosity at 25° C.) is, for example, 1 mPa·s or more and 100 mPa·s or less.

Glass, ceramics, metal, semiconductor, resin, or the like is used for the substrate, and if necessary, a member made of a material different from that of the substrate may be formed on the surface thereof. Specifically, the substrate includes silicon wafers, compound semiconductor wafers, quartz glass, and the like.

In the present embodiment, the imprint apparatus 100 employs a photo-curing method as a method for curing the imprint material. However, the method for curing the imprint material is not limited to the photo-curing method, and for example, a heat-curing method may be employed. In addition, in FIG. 1, the X-axis, the Y-axis, and the Z-axis are defined in three axial directions orthogonal to each other.

The imprint apparatus 100 has a substrate chuck 1 that holds a substrate W, a substrate stage 2 that supports and moves the substrate chuck 1, and a mold chuck 3 that holds a mold M on which a pattern P is formed. The imprint apparatus 100 also has a mold stage 4 that supports and moves the mold chuck 3 . The imprint apparatus 100 also includes a supply unit (dispenser) 8 that supplies the imprint material R onto the substrate, and a control unit 9 that controls the imprint apparatus 100 as a whole. Further, the imprint apparatus 100 includes a console unit 10 that manages a display screen that functions as a user interface, a display unit 11 that displays the display screen, an input unit 12 such as a keyboard and mouse, and a storage unit 13 . Note that when the imprinting material R is supplied by an external device different from the imprinting apparatus 100 and the substrate W is carried into the imprinting apparatus 100, the imprinting apparatus 100 does not have to have the supply unit 8. good.

The imprint apparatus 100 supplies the imprint material R from the supply unit 8 to the shot area on the substrate (supplying process), and brings the imprint material R supplied to the shot area on the substrate into contact with the mold M (imprinting process). process). Then, the imprint apparatus 100 cures the imprint material R (curing process) while the imprint material R and the mold M are in contact with each other, and separates the mold M from the cured imprint material R (release process). This forms a pattern on the substrate. Here, the imprinting process includes a supply process, a stamping process, a curing process, and a release process. The supply process is a process of supplying the imprint material R to the shot area on the substrate. The imprinting process is a process of bringing the mold M into contact with the imprint material R on the substrate. The pattern P of the mold M is filled with the imprint material R by bringing the mold M into contact with the imprint material R on the substrate, that is, by pressing the mold M against the imprint material R. The curing process is a process of curing the imprint material R while the mold M and the imprint material R on the substrate are in contact with each other. The mold release process is a process of separating the mold M from the cured imprint material R on the substrate.

The mold chuck 3 has a concave portion having an area larger than the area of the pattern P on the surface opposite to the pattern surface of the mold M (the surface on which the pattern P is formed). The recess is sealed by the mold M and sealing glass (not shown) to define a closed space (cavity). A pressure control unit (not shown) is connected to the cavity, and the pressure in the cavity can be controlled. When the mold M and the imprint material R on the substrate are brought into contact with each other, the pressure in the cavity is increased to deform the mold M into a convex shape toward the substrate side, thereby causing the mold M and the imprint material R on the substrate to contact each other. To prevent air bubbles from being caught between them. When the mold M and the imprint material R on the substrate come into contact with each other, the pressure in the cavity is returned so that the mold M becomes parallel to the substrate W (in complete contact with the imprint material R on the substrate).

The imprint apparatus 100 further includes a light source 5 that emits ultraviolet light (curing light), an observation unit 6 that observes at least one of the mold M and the substrate W, and a mirror 7 . The mirror 7 includes a dichroic mirror and has characteristics of reflecting the curing light from the light source 5 and transmitting the light (observation light) from the observation section 6 . Curing light from a light source 5 is reflected by a mirror 7 and irradiated onto the imprint material R on the substrate through the mold M to cure the imprint material R, thereby corresponding to the pattern P of the mold M on the substrate. A pattern of imprint material is formed.

The observation unit 6 includes an observation light source 6a and an imaging element 6b, and acquires an image by imaging at least one of the mold M and the substrate W in the imprint process, specifically, an image showing the status of the imprint process. function as an image pickup unit. The observation unit 6 acquires a moving image or a still image as an image showing the status of imprint processing. Images acquired by the observation unit 6 , that is, moving images and still images are stored in the storage unit 13 . The storage unit 13 is composed of, for example, a hard disk (HD), a compact disk (CD), a magnet optical disk (MO), a memory card, or the like.

Observation light from the observation light source 6a passes through the mirror 7 and the mold M and illuminates the substrate W (shot area). The imaging element 6b detects the light reflected by the surface of the substrate W and the light reflected by the pattern surface of the mold M as observation light. As described above, when the mold M and the imprint material R on the substrate are brought into contact with each other, the mold M is deformed into a convex shape toward the substrate. Therefore, the gap (distance) between the mold M and the substrate W continuously changes from the contact point between the mold M and the imprint material R on the substrate. Therefore, the imaging element 6b captures an image of interference fringes between the light reflected by the surface of the substrate W and the light reflected by the pattern surface of the mold M, that is, Newton's rings. 2A and 2B are diagrams showing an example of interference fringes observed by the observation unit 6. FIG. 2A shows the gap between the mold M and the substrate W, and FIG. An image captured by the element 6b is shown. That is, this image is an image showing the state of imprint processing, and is an image that changes according to the distance between the mold M and the substrate W. FIG.

The control unit 9 is composed of, for example, an information processing device including a CPU, a memory, and the like, and controls each unit of the imprint apparatus 100 to perform imprint processing. The control unit 9 manages images (moving images and still images) acquired by the observation unit 6 . For example, the control unit 9 associates the image acquired by the observation unit 6 with each shot area of the substrate W (that is, with each shot area) and/or with each substrate W (that is, with each substrate). ) and stored in the storage unit 13 . Further, the control unit 9 superimposes an image indicating the imprint processing status obtained by the observation unit 6 corresponding to each of the plurality of shot regions on the shot layout indicating the arrangement of the plurality of shot regions on the substrate W. Generates a display screen to be displayed by Then, the control section 9 provides such a display screen as a user interface via the display section 11 .

Like the control unit 9 , the console unit 10 includes a CPU, a memory, and the like, manages display screens generated by the control unit 9 , and displays them on the display unit 11 . Note that the console section 10 may be incorporated in the control section 9 .

General imprint processing will be described with reference to FIGS. 3 and 4(a) to 4(f). The imprint process, as shown in FIG. 3, includes a supply process (S101), a stamping process (S102), a curing process (S103), and a release process (S104). FIGS. 4A to 4F are diagrams showing changes in the state of the substrate W during imprint processing.

FIG. 4(a) shows the state of the substrate W before imprint processing is started. As shown in FIG. 4(a), the substrate W is in an unprocessed state.

FIG. 4(b) shows the state of the substrate W after the supply process has been performed. In the supply process, the imprint material R is supplied to the substrate W by ejecting droplets of the imprint material R onto the substrate from the supply unit 8 . As shown in FIG. 4B, droplets of the imprint material R are supplied to predetermined positions on the substrate, and an array of droplets of the imprint material R is formed on the substrate.

FIG. 4(c) shows the state of the substrate W during the stamping process. In the imprinting process, as shown in FIG. 4(c), the mold M is brought closer to the substrate W while being deformed into a convex shape toward the substrate, so that the mold M is gradually pressed from the center toward the periphery. is brought into contact with the imprint material R on the substrate. Therefore, in the imprinting process, a gap is generated between the mold M and the substrate W, and interference fringes as shown in FIG. 2(b) are observed.

FIG. 4(d) shows the state of the substrate W during the curing process. In the curing step, the imprint material R is cured by irradiating the imprint material R with curing light from the light source 5 while the mold M and the imprint material R on the substrate are in contact with each other. As shown in FIG. 4D, in the curing step, the mold M and the imprint material R on the substrate are in complete contact, and the pattern P of the mold M is filled with the imprint material R. As shown in FIG.

FIG. 4(e) shows the state of the substrate W during the mold release process. In the mold release process, the mold M is projected toward the substrate as shown in FIG. The mold M is separated from the substrate W while being deformed into a shape. Therefore, in the release process, as in the imprint process, a gap is generated between the mold M and the substrate W, and interference fringes as shown in FIG. 2(b) are observed.

FIG. 4(f) shows the state of the substrate W at the end of imprint processing. As shown in FIG. 4F, the substrate W is formed with a pattern of the imprint material R corresponding to the pattern P of the mold M. As shown in FIG.

Thus, the state of the substrate W during the imprinting process changes according to each process (each situation) of the imprinting process. In the conventional technology, the quality of imprint processing is determined while changing the criteria for determining the quality of imprint processing according to each process (specific timing) of imprint processing. However, in the related art, since a still image is used as a reference for judging the quality of imprint processing, it is possible to judge the quality of imprint processing only at a specific timing of imprint processing.

Therefore, the present embodiment provides a technology that is advantageous for grasping the status of imprint processing. Specifically, as shown in FIG. 5, a display screen DW that displays an image IM indicating the status of imprint processing superimposed on a shot layout SL indicating the arrangement of a plurality of shot regions SR on the substrate W is displayed as a user interface. is displayed on the display unit 11 as . Alternatively, data for displaying the display screen DW shown in FIG. 5 may be output as one file to an external display device, and the display screen DW may be displayed as a user interface on the display device.

The display screen DW is generated by the control unit 9 based on the shot layout obtained from the imprint recipe and the image acquired by the observation unit 6 (image stored in the storage unit 13), and is displayed via the console unit 10. , is provided to the display unit 11 . In this embodiment, a moving image acquired by the observation unit 6 during imprint processing is displayed as the image IM indicating the imprint processing status. Such moving images include, for example, moving images during a period from the supply step of supplying the imprint material R onto the substrate to the release step of separating the mold M from the hardened imprint material R on the substrate. At this time, in each shot area, the moving image is displayed so that the elapsed time after the start of imprint processing for each of the plurality of shot areas SR is synchronized. In this manner, by displaying moving images (images IM) showing the imprint processing status side by side according to the arrangement of the plurality of shot areas SR, the imprint process status of each shot area can be easily and can be grasped quickly. In addition, by comparing the moving images showing the imprint processing status of each shot region, it is possible to detect a shot region in which an abnormality has occurred in the imprint processing. In other words, it is possible to easily detect the timing of changes in the supply process (S101), the stamping process (S102), the curing process (S103), and the release process (S104) shown in FIG. can be done.

Here, a method for detecting a shot area in which an abnormality has occurred in imprint processing will be described. The control unit 9 obtains the image characteristics of the moving image indicating the imprint processing status of each shot area. Then, the control unit 9 obtains the degree of difference (degree of difference) between the image (standard image) on which normal imprint processing has been performed and the image to be compared from the obtained image features. Then, the control unit 9 detects a shot area in which an abnormality has occurred based on whether or not the obtained degree of difference is within a predetermined allowable range. For example, the control unit 9 can obtain the pixel values from the standard image and the image to be compared, and obtain the degree of difference from the sum of the squares of the differences of the pixel values and the sum of the absolute values. Alternatively, a normalized cross-correlation may be obtained from the pixel values of the standard image and the image to be compared and used as the dissimilarity. Moreover, the Mahalanobis distance obtained by normalizing the feature amount of a plurality of image features may be used as the dissimilarity. In this case, for example, at least one of the maximum value, average value, variance value, kurtosis, skewness, and geometric mean of pixel values included in the image can be used as the image feature. Further, not only macroscopic image features of all pixel values, but also microscopic image features of local pixel values calculated by filtering processing may be used.

Then, if the obtained degree of difference is within the predetermined allowable range, the control unit 9 determines that the shot area has been normally imprinted, and if the obtained degree of difference is outside the predetermined allowable range, It is detected as a shot area in which an abnormality has occurred.

Note that in the present embodiment, a moving image acquired by the observation unit 6 during imprint processing is displayed as the image IM indicating the status of imprint processing, but the present invention is not limited to this. For example, as the image IM indicating the status of the imprint process, the still images acquired by the observation unit 6 during the imprint process may be continuously displayed, or only one still image may be displayed. good. At this time, in each shot area, by displaying a still image with the same elapsed time after starting the imprinting process for each of the plurality of shot areas SR, the status of the imprinting process for each shot can be grasped. can.

In addition, a moving image showing the state of imprint processing is shown from the imprinting step of bringing the imprint material R on the substrate and the mold M into contact with each other to the imprint material R in the state where the imprint material R on the substrate and the mold M are in contact with each other. It may be a moving image of the period up to the curing step of curing R. By displaying a moving image during the period from the imprinting process to the curing process, that is, the filling period in which the pattern P of the mold M is filled with the imprint material R, the filling state of the imprint material R in each shot region ( filling delay, etc.) can be grasped. For example, in FIG. 5, the filling of the imprint material R in the shot region SR1 is delayed from the filling of the imprint material R in the other shot regions, that is, the imprint processing abnormality occurs in the shot region SR1. You can detect what is happening. Further, as shown in FIG. 6, among the plurality of shot areas SR, an image IM corresponding to a shot area SR1 in which an abnormality has occurred in imprint processing is displayed in a identifiable (characteristic) manner, for example, by highlighting. You may As described above, according to the present embodiment, it is possible to easily determine the quality of the imprinting process, such as the filling delay of the imprint material R, which is difficult to determine with the conventional technology. becomes.

In addition, in order to compare the imprint processing of each shot area in more detail, the moving image displayed in the display image DW may be reproduced at a playback speed specified by the user, or the moving image may be stopped at an arbitrary timing. You may let The user's designation of the playback speed and the instruction to stop moving images are performed via the input unit 12 . However, if the display unit 11 is composed of a touch panel, designation of the playback speed or instruction to stop moving images may be given via the touch panel.

The display screen DW shown in FIGS. 5 and 6 displays an image IM indicating the imprint processing status superimposed on the shot layout SL. Advantageous. However, in order to compare the imprint processing of each shot area in detail, as shown in FIG. 7, only the image IM showing the status of imprint processing corresponding to an arbitrary shot area may be displayed. Specifically, when at least one shot area is selected from the plurality of shot areas SR displayed on the display screen DW via the input unit 12, the status of imprint processing corresponding to the selected shot area is displayed. Display the image IM. Note that the input unit 12 functions as a selection unit for the user to select at least one shot area from a plurality of shot areas SR. For example, as shown in FIG. 7, when shot areas SR2 and SR3 are selected, an image IM2 corresponding to the shot area SR2 and an image IM3 corresponding to the shot area SR3 are enlarged and displayed side by side. This makes it possible to compare the imprint processing statuses of arbitrary shot areas in detail.

The shot areas selected via the input section 12 are not limited to the shot areas of the same substrate as shown in FIG. There may be. For example, as shown in FIG. 7, when the shot region SR4 of the first substrate and the shot region SR5 of the second substrate are selected, the image IM4 corresponding to the shot region SR4 and the image IM5 corresponding to the shot region SR5 are enlarged. displayed side by side. In addition, as shown in FIG. 8, by displaying an image showing the status of imprint processing for shot regions at the same position between a plurality of substrates, the status of imprint processing for shot regions at the same position between substrates can be displayed. can grasp.

In FIG. 7, two shot areas are selected from a plurality of shot areas on one substrate, and in FIG. 8, one shot area is selected from each of the two substrates. isn't it. The number of shot areas selected from a plurality of shot areas on one substrate and the number of shot areas selected from each of a plurality of substrates are arbitrary.

Further, as shown in FIG. 9, a list LT of a plurality of boards (board A, board B, board C, board D) whose images IM are stored in the storage unit 13 may be displayed as a user interface. Then, when at least two substrates are specified from the plurality of substrates displayed in the list LT through the input unit 12, each of the shot layouts showing the arrangement of the shot areas of the at least two substrates is displayed. The corresponding image IM is superimposed and displayed. Note that the input unit 12 functions as a designation unit for the user to designate at least two substrates from the list LT. For example, as shown in FIG. 9, assume that substrates A and C are specified from the list LT. In this case, the image IMA corresponding to the plurality of shot areas of the substrate A is superimposed on the shot layout SLA showing the arrangement of the shot areas of the substrate A and displayed. Similarly, an image IMB corresponding to a plurality of shot areas of the substrate B is superimposed on the shot layout SLB showing the arrangement of the shot areas of the substrate B and displayed. Also, they are displayed side by side. In this way, by comparing the imprint processing states among a plurality of substrates, it is possible to grasp whether an abnormality occurs for each substrate or for each imprint processing.

In addition, instead of displaying images (past data) stored in the storage unit 13 on the display screen DW, moving images (current data) acquired by the observation unit 6 during imprint processing are displayed in real time. may be displayed. When the observation unit 6 acquires the moving image, the moving image is displayed in the corresponding shot area of the shot layout. This makes it possible not only to easily grasp the status of imprint processing between shot areas, but also to easily grasp the status of imprint processing (current imprint processing) of the target shot area. In this case, unless otherwise specified, the moving image showing the current imprint processing status of each shot area is displayed to the end. may

A pattern of a cured product formed using the imprint apparatus 100 is used permanently on at least a part of various articles, or temporarily used when manufacturing various articles. Articles include electric circuit elements, optical elements, MEMS, recording elements, sensors, molds, and the like. Electric circuit elements include volatile or nonvolatile semiconductor memories such as DRAM, SRAM, flash memory and MRAM, and semiconductor elements such as LSI, CCD, image sensors and FPGA. Examples of the mold include an imprint mold and the like.

The pattern of the cured product is used as it is or temporarily used as a resist mask as at least a part of the above article. After etching, ion implantation, or the like is performed in the substrate processing step, the resist mask is removed.

Next, a specific manufacturing method for the article will be described. As shown in FIG. 10A, a substrate W such as a silicon wafer having a work material such as an insulator formed on its surface is prepared. Give R. Here, a state is shown in which a plurality of droplets of the imprint material R are applied onto the substrate.

As shown in FIG. 10(b), the imprint mold M is placed so that the side on which the uneven pattern is formed faces the imprint material R on the substrate. As shown in FIG. 10(c), the substrate W to which the imprint material R is applied is brought into contact with the mold M, and pressure is applied. The imprint material R is filled in the gap between the mold M and the workpiece. When light is irradiated through the mold M as energy for curing in this state, the imprint material R is cured.

As shown in FIG. 10D, after curing the imprint material R, when the mold M and the substrate W are separated, a pattern of the cured imprint material R is formed on the substrate. The pattern of this cured product has a shape in which the concave portions of the mold M correspond to the convex portions of the cured product, and the convex portions of the mold M correspond to the concave portions of the cured product. is transcribed.

As shown in FIG. 10(e), when etching is performed using the pattern of the cured product as an anti-etching mask, portions of the surface of the material to be processed where there is no cured product or where the cured product remains thinly are removed to form grooves. . As shown in FIG. 10(f), by removing the pattern of the cured product, an article having grooves formed on the surface of the workpiece can be obtained. Although the pattern of the cured product is removed here, it may be used as an interlayer insulating film included in a semiconductor element or the like, that is, as a constituent member of an article, without being removed after processing.

Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist.

100: imprint apparatus 6: observation unit 9: control unit 11: display unit M: mold W: substrate

Claims (18)

An imprinting apparatus that performs an imprinting process of forming a pattern of an imprinting material in a shot region on a substrate using a mold,
an imaging unit that captures an image of a shot region including a portion where the imprint material on the substrate and the mold are in contact with each other, and acquires an image corresponding to the shot region;
a control unit for controlling a display unit to superimpose and display the images corresponding to the plurality of shot areas acquired by the imaging unit on a shot layout showing the arrangement of the plurality of shot areas of the substrate;
has
The images corresponding to the plurality of shot areas, which are superimposed and displayed, are still images having the same elapsed time from the start of the imprint processing for each of the plurality of shot areas, or the elapsed time. are moving images synchronized with each other . 2. The imprint apparatus according to claim 1, wherein the control unit controls the display unit to display an image showing the status of the imprint processing. The control unit controls the display unit to display an image that changes according to a distance between the substrate and the mold while the imprint material on the substrate and the mold are in contact with each other. 3. An imprinting device according to claim 1 or 2, characterized in that. 2. The control unit controls the display unit so as to display an image including interference fringes generated by interference between the light reflected by the substrate and the light reflected by the mold. 4. The imprinting apparatus according to any one of items 1 to 3. 5. Any one of claims 1 to 4, wherein the control section controls the display section to display a plurality of the images corresponding to the plurality of shot areas on the same substrate. The imprinting apparatus according to . 5. The apparatus according to any one of claims 1 to 4, wherein said control unit controls said display unit to display a plurality of said images corresponding to said plurality of shot areas on different substrates. The imprinting device described. 5. The apparatus according to any one of claims 1 to 4, wherein the control unit controls the display unit so as to display a plurality of the images corresponding to shot areas at the same position on different substrates. The imprinting device described. a selection unit for a user to select at least one shot area from the plurality of shot areas via the display unit;
3. The control unit controls the display unit so as to display the image acquired by the imaging unit corresponding to the at least one shot area selected by the selection unit. 8. The imprint apparatus according to any one of 1 to 7 . The control unit
detecting a shot region in which an abnormality has occurred in the imprint processing based on the image acquired by the imaging unit;
controlling the display unit to identifiably display an image indicating the imprint processing status obtained by the imaging unit and corresponding to the shot region in which the abnormality has occurred among the plurality of shot regions; The imprint apparatus according to any one of claims 1 to 8 , characterized by: further comprising a storage unit for storing an image acquired by the imaging unit and corresponding to each of the plurality of shot areas for each of the substrates;
10. The apparatus according to any one of claims 1 to 9 , wherein the control unit performs control so that a list of a plurality of substrates whose images are stored in the storage unit is displayed on the display unit. imprinting device. further comprising a designation unit for a user to designate at least two substrates from the plurality of substrates via the display unit;
The control unit arranges the images stored in the storage unit corresponding to each of the two substrates in each of the shot layouts indicating the arrangement of the shot areas of the at least two substrates designated by the designation unit. 11. The imprinting apparatus according to claim 10 , wherein the display unit is controlled to display. further comprising an input unit for inputting a playback speed of the moving image displayed on the display unit;
The imprint apparatus according to claim 1 , wherein the control unit reproduces the moving image displayed on the display unit at a reproduction speed input to the input unit. 2. The method according to claim 1, wherein the control unit performs control to display, as the image, a moving image acquired by the imaging unit during the imprint process on the display unit in real time. Imprint device. 2. The method according to claim 1 , wherein the moving image includes a moving image during a period from the step of supplying the imprint material onto the substrate to the step of separating the mold from the hardened imprint material on the substrate. The imprinting device described. The moving image is a period from the step of contacting the imprint material on the substrate and the mold to the step of curing the imprint material while the imprint material on the substrate and the mold are in contact. 2. The imprinting apparatus according to claim 1 , wherein the imprinting apparatus includes moving images. 2. The imprinting apparatus according to claim 1, wherein the still image is a still image acquired by the imaging unit during the imprinting process. A shot region including a region where the imprint material on the substrate and the mold are in contact is imaged when performing imprint processing for forming a pattern of the imprint material on the shot region on the substrate using the mold. The images corresponding to the plurality of shot areas acquired by the imaging unit that acquires the images corresponding to the shot areas are displayed so as to be superimposed on a shot layout showing the arrangement of the plurality of shot areas of the substrate. control the department ,
The images corresponding to the plurality of shot areas, which are superimposed and displayed, are still images having the same elapsed time from the start of the imprint processing for each of the plurality of shot areas, or the elapsed time. are moving images synchronized with each other . forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 16 ;
a step of processing the substrate on which the pattern is formed in the step;
manufacturing an article from the treated substrate;
A method for manufacturing an article, comprising:

Images