JP7227980B2 - 正確な剛性の計時器の温度補償ひげぜんまいを製造する方法 - Google Patents
正確な剛性の計時器の温度補償ひげぜんまいを製造する方法 Download PDFInfo
- Publication number
- JP7227980B2 JP7227980B2 JP2020550658A JP2020550658A JP7227980B2 JP 7227980 B2 JP7227980 B2 JP 7227980B2 JP 2020550658 A JP2020550658 A JP 2020550658A JP 2020550658 A JP2020550658 A JP 2020550658A JP 7227980 B2 JP7227980 B2 JP 7227980B2
- Authority
- JP
- Japan
- Prior art keywords
- hairspring
- wafer
- balance
- stiffness
- modifying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 41
- 239000000463 material Substances 0.000 description 27
- 239000011162 core material Substances 0.000 description 6
- 239000002210 silicon-based material Substances 0.000 description 5
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 238000010329 laser etching Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000708 deep reactive-ion etching Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- DSHPMFUQGYAMRR-UHFFFAOYSA-N [Si].[Si].O=[Si] Chemical compound [Si].[Si].O=[Si] DSHPMFUQGYAMRR-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/02—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant
- F16F1/024—Covers or coatings therefor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/02—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant
- F16F1/04—Wound springs
- F16F1/10—Spiral springs with turns lying substantially in plane surfaces
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0002—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
- G04D3/0035—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
- G04D3/0041—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for coil-springs
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Micromachines (AREA)
- Springs (AREA)
- Stringed Musical Instruments (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP18162723 | 2018-03-20 | ||
EP18162723.3 | 2018-03-20 | ||
PCT/IB2019/052107 WO2019180558A1 (fr) | 2018-03-20 | 2019-03-15 | Procede de fabrication de spiraux horlogers thermocompenses de raideur precise |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021518537A JP2021518537A (ja) | 2021-08-02 |
JP7227980B2 true JP7227980B2 (ja) | 2023-02-22 |
Family
ID=61691843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020550658A Active JP7227980B2 (ja) | 2018-03-20 | 2019-03-15 | 正確な剛性の計時器の温度補償ひげぜんまいを製造する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11703804B2 (de) |
EP (1) | EP3769161B1 (de) |
JP (1) | JP7227980B2 (de) |
CN (1) | CN111919176B (de) |
TW (1) | TWI796444B (de) |
WO (1) | WO2019180558A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3543795A1 (de) | 2018-03-20 | 2019-09-25 | Patek Philippe SA Genève | Herstellungsverfahren von uhrkomponenten aus silizium |
CH716605A1 (fr) | 2019-09-16 | 2021-03-31 | Richemont Int Sa | Procédé de fabrication d'une pluralité de résonateurs sur une plaquette. |
EP3982205A1 (de) * | 2020-10-06 | 2022-04-13 | Patek Philippe SA Genève | Verfahren zur herstellung einer uhrfeder mit einer präzisen steifigkeit |
EP4030241A1 (de) * | 2021-01-18 | 2022-07-20 | Richemont International S.A. | Verfahren zur herstellung von uhrwerk-spiralfedern |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009229463A (ja) | 2008-03-20 | 2009-10-08 | Nivarox-Far Sa | 一体構造型二重バランススプリング及びその製造方法 |
WO2015113973A1 (fr) | 2014-01-29 | 2015-08-06 | Cartier Création Studio Sa | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
JP2015210270A (ja) | 2014-04-25 | 2015-11-24 | ロレックス・ソシエテ・アノニムRolex Sa | 強化した時計部品を製造する方法、時計部品および時計 |
JP2017111132A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料の追加によって所定の厚さをもつひげぜんまいを製作する方法 |
JP2017111133A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料を局所的に除去することによって所定の剛性をもつひげぜんまいを製作する方法 |
JP2017111131A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料を除去することによって所定の剛性をもつひげぜんまいを製作する方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60206939T2 (de) * | 2002-11-25 | 2006-07-27 | Csem Centre Suisse D'electronique Et De Microtechnique S.A. | Spiraluhrwerkfeder und Verfahren zu deren Herstellung |
EP1605182B8 (de) * | 2004-06-08 | 2010-07-14 | CSEM Centre Suisse d'Electronique et de Microtechnique S.A. - Recherche et Développement | Unruh-Spiralfeder-Oszillator mit Temperaturkompensation |
CH699109A1 (fr) * | 2008-07-10 | 2010-01-15 | Swatch Group Res & Dev Ltd | Procédé de fabrication d'une pièce micromécanique. |
EP2397919B1 (de) | 2010-06-21 | 2017-11-08 | Montres Breguet SA | Herstellungsverfahren einer Spiralfederanordnung einer Uhr aus mikro-bearbeitbarem Material oder Silizium |
EP2952972B1 (de) | 2014-06-03 | 2017-01-25 | The Swatch Group Research and Development Ltd. | Herstellungsverfahren einer Ausgleichsspiralfeder aus Verbundmaterial |
FR3032810B1 (fr) | 2015-02-13 | 2017-02-24 | Tronic's Microsystems | Oscillateur mecanique et procede de realisation associe |
HK1209578A2 (en) * | 2015-02-17 | 2016-04-01 | Master Dynamic Ltd | Silicon hairspring |
EP3159746B1 (de) * | 2015-10-19 | 2018-06-06 | Rolex Sa | Hochdotierte siliziumfeder für uhr |
-
2019
- 2019-02-22 TW TW108105999A patent/TWI796444B/zh active
- 2019-03-15 CN CN201980020157.1A patent/CN111919176B/zh active Active
- 2019-03-15 US US16/980,124 patent/US11703804B2/en active Active
- 2019-03-15 EP EP19716572.3A patent/EP3769161B1/de active Active
- 2019-03-15 JP JP2020550658A patent/JP7227980B2/ja active Active
- 2019-03-15 WO PCT/IB2019/052107 patent/WO2019180558A1/fr unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009229463A (ja) | 2008-03-20 | 2009-10-08 | Nivarox-Far Sa | 一体構造型二重バランススプリング及びその製造方法 |
WO2015113973A1 (fr) | 2014-01-29 | 2015-08-06 | Cartier Création Studio Sa | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
JP2015210270A (ja) | 2014-04-25 | 2015-11-24 | ロレックス・ソシエテ・アノニムRolex Sa | 強化した時計部品を製造する方法、時計部品および時計 |
JP2017111132A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料の追加によって所定の厚さをもつひげぜんまいを製作する方法 |
JP2017111133A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料を局所的に除去することによって所定の剛性をもつひげぜんまいを製作する方法 |
JP2017111131A (ja) | 2015-12-18 | 2017-06-22 | セー エス ウー エム・サントル・スイス・デレクトロニク・エ・ドゥ・ミクロテクニク・エス アー・ルシェルシュ・エ・デヴェロプマン | 材料を除去することによって所定の剛性をもつひげぜんまいを製作する方法 |
Also Published As
Publication number | Publication date |
---|---|
US20210003971A1 (en) | 2021-01-07 |
TWI796444B (zh) | 2023-03-21 |
CN111919176A (zh) | 2020-11-10 |
JP2021518537A (ja) | 2021-08-02 |
EP3769161A1 (de) | 2021-01-27 |
EP3769161B1 (de) | 2022-04-13 |
CN111919176B (zh) | 2021-11-09 |
WO2019180558A1 (fr) | 2019-09-26 |
US11703804B2 (en) | 2023-07-18 |
TW201945873A (zh) | 2019-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7227980B2 (ja) | 正確な剛性の計時器の温度補償ひげぜんまいを製造する方法 | |
US10324417B2 (en) | Method for fabrication of a balance spring of a predetermined stiffness by removal of material | |
JP6893525B2 (ja) | セラミック温度補償型共振器 | |
RU2536389C2 (ru) | Резонатор с температурной компенсацией по меньшей мере первого и втрого порядка | |
CN111868637B (zh) | 用于制造硅钟表部件的方法 | |
CN106997170B (zh) | 用于通过增加材料制造预定厚度的游丝的方法 | |
CN106896700B (zh) | 通过局部去除材料来制造预定刚度的游丝的方法 | |
US8502624B2 (en) | Thermocompensated mechanical resonator | |
JP7254090B2 (ja) | ひげゼンマイの製造方法 | |
US20050068852A1 (en) | Thermoregulated sprung balance resonator | |
CN111819501A (zh) | 制造硅游丝的方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220112 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220831 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220905 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221109 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230112 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230210 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7227980 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |