JP7224321B2 - 高効率レーザー維持プラズマシステム - Google Patents
高効率レーザー維持プラズマシステム Download PDFInfo
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- JP7224321B2 JP7224321B2 JP2020162483A JP2020162483A JP7224321B2 JP 7224321 B2 JP7224321 B2 JP 7224321B2 JP 2020162483 A JP2020162483 A JP 2020162483A JP 2020162483 A JP2020162483 A JP 2020162483A JP 7224321 B2 JP7224321 B2 JP 7224321B2
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- plasma
- reflector assembly
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/095—Processes or apparatus for excitation, e.g. pumping using chemical or thermal pumping
- H01S3/09505—Processes or apparatus for excitation, e.g. pumping using chemical or thermal pumping involving photochemical reactions, e.g. photodissociation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1312—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Lasers (AREA)
- X-Ray Techniques (AREA)
Description
本出願は、以下に列挙した出願(複数の場合あり)(「関連出願」)に関連するものであり、且つ該出願からの最先の効力のある有効出願日(複数の場合あり)の利益を主張するものである(例えば、特許仮出願以外に対する最先の効力のある優先日を主張するまたは特許仮出願に対する、関連出願のいずれかのおよびすべての親、その親(grandparent)、そのまた親(great-grandparent)出願などに対する、米国特許法第119条(e)の下での利益を主張するものである)。
USPTOの法定外要件のため、本出願は、全体の参照により本明細書に組み込まれる、発明者としてIlya Bezel、Anatoly Shchemelinin Eugene ShifrinおよびMatthew Derstineの名で2015年6月22日に出願された出願番号第62/183,069号の「MULTIPASS LASER-SUSTAINED PLASMA PUMP GEOMETRIES」と題する米国特許仮出願の通常の(非仮)特許出願を構成する。
Claims (21)
- ポンピングビームを生成するように構成された照光源と、
ガスを封じ込めるように構成されたリフレクタアセンブリと、を備え、
前記リフレクタアセンブリが、前記照光源から前記ポンピングビームを受け取るための1つ以上の入口開口を含み、前記ポンピングビームが前記ガスの一部内にプラズマを維持し、前記プラズマが広帯域放射を放出し、前記リフレクタアセンブリの内面が、前記プラズマによって放出された前記広帯域放射の少なくとも一部分を収集して、収集された広帯域放射を前記プラズマに戻すように方向付けるように構成されており、
第1のプラズマが前記リフレクタアセンブリの第1の焦点に形成され、第2のプラズマが前記リフレクタアセンブリの第2の焦点に形成される、システム。 - 前記リフレクタアセンブリがさらに、前記プラズマの2以上のイメージを合成するように構成されている、請求項1に記載のシステム。
- 前記リフレクタアセンブリがさらに、前記広帯域放射の出力部分が前記プラズマの単一のイメージの輝度よりも大きい輝度を有するように前記プラズマの2以上のイメージを合成するように構成されている、請求項2に記載のシステム。
- 前記リフレクタアセンブリが、前記ガスの前記一部を通って送られた前記ポンピングビームの未吸収部分を収集して、前記収集されたポンピングビームの未吸収部分をガスの前記一部に戻すように方向付けるように配置されている、請求項1に記載のシステム。
- 前記リフレクタアセンブリが、
楕円リフレクタアセンブリを含む、請求項1に記載のシステム。 - 前記楕円リフレクタアセンブリの内面が、広帯域放射の一部を前記楕円リフレクタアセンブリの1つ以上の焦点に集束するように構成されている、請求項5に記載のシステム。
- 前記リフレクタアセンブリが、
部分楕円リフレクタアセンブリを備える、
請求項1に記載のシステム。 - 前記リフレクタアセンブリが、
多部品リフレクタアセンブリを備える、
請求項1に記載のシステム。 - 前記リフレクタアセンブリの前記1つ以上の入口開口が、
複数の照光源からポンピングビームを受け取るための複数の入口開口を含む、
請求項1に記載のシステム。 - 前記リフレクタアセンブリの1つ以上の入口開口が、
サファイア、溶融シリカ、結晶石英、フッ化マグネシウム、フッ化カルシウム、フッ化リチウムのうち少なくとも1つから形成された1つ以上の窓を含む、
請求項1に記載のシステム。 - 前記リフレクタアセンブリが、前記リフレクタアセンブリの内容積からの前記広帯域放射の少なくとも一部分を1つ以上の下流の光学素子に通すための1以上の出口開口を含む、請求項1に記載のシステム。
- 前記リフレクタアセンブリの前記1つ以上の出口開口のうち1つは、
サファイア、溶融シリカ、結晶石英、フッ化マグネシウム、フッ化カルシウム、フッ化リチウムのうち少なくとも1つから形成された1つ以上の窓を含む、
請求項11に記載のシステム。 - ガス再循環アセンブリをさらに備えた、請求項1に記載のシステム。
- 前記ガス再循環アセンブリが、
ガス入力ポートと、
前記ガス再循環アセンブリを介して前記リフレクタアセンブリの内容積を通して前記ガスを流すためのガス出力ポートと、を含む、
請求項13に記載のシステム。 - 前記リフレクタアセンブリが、
1つ以上の電気的フィードスルーを含む、請求項1に記載のシステム。 - 前記照光源が、
1つ以上のレーザーを備える、請求項1に記載のシステム。 - 前記1つ以上のレーザーが、
1つ以上の赤外線レーザー、1つ以上の可視レーザー、または1または複数の紫外線レーザーのうち少なくとも1つを備える、請求項16に記載のシステム。 - 前記1つまたは複数のレーザーが、ダイオードレーザー、ディスクレーザーまたはファイバーレーザーのうち少なくとも1つを備える、請求項16に記載のシステム。
- 前記1つ以上のレーザーが、
狭帯域レーザーまたは広帯域レーザーのうち少なくとも1つを備える、請求項16に記載のシステム。 - 前記1つ以上のレーザーが、連続波(CW)モード、パルスモードまたは変調モードのうち少なくとも1つで動作するように構成される、
請求項16に記載のシステム。 - 前記ガスが、
不活性ガス、非不活性ガスおよび2つまたは複数のガスの混合物のうち少なくとも1つを含む、請求項1に記載のシステム。
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US15/187,590 US10887974B2 (en) | 2015-06-22 | 2016-06-20 | High efficiency laser-sustained plasma light source |
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JP2020162483A Active JP7224321B2 (ja) | 2015-06-22 | 2020-09-28 | 高効率レーザー維持プラズマシステム |
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EP (1) | EP3311454B1 (ja) |
JP (3) | JP6770980B2 (ja) |
KR (1) | KR102588483B1 (ja) |
CN (2) | CN113301699A (ja) |
IL (1) | IL255910B (ja) |
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CN113301699A (zh) | 2021-08-24 |
IL255910A (en) | 2018-01-31 |
EP3311454A4 (en) | 2019-02-20 |
JP6770980B2 (ja) | 2020-10-21 |
KR20180011346A (ko) | 2018-01-31 |
WO2016209995A1 (en) | 2016-12-29 |
JP2020205283A (ja) | 2020-12-24 |
US20160381776A1 (en) | 2016-12-29 |
IL255910B (en) | 2022-01-01 |
CN107710880B (zh) | 2021-06-11 |
KR102588483B1 (ko) | 2023-10-11 |
JP2023021259A (ja) | 2023-02-10 |
US20210022233A1 (en) | 2021-01-21 |
US11778720B2 (en) | 2023-10-03 |
US10887974B2 (en) | 2021-01-05 |
EP3311454B1 (en) | 2020-02-12 |
CN107710880A (zh) | 2018-02-16 |
EP3311454A1 (en) | 2018-04-25 |
JP2018528568A (ja) | 2018-09-27 |
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