JP7199669B2 - 光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法 - Google Patents

光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法 Download PDF

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JP7199669B2
JP7199669B2 JP2019554272A JP2019554272A JP7199669B2 JP 7199669 B2 JP7199669 B2 JP 7199669B2 JP 2019554272 A JP2019554272 A JP 2019554272A JP 2019554272 A JP2019554272 A JP 2019554272A JP 7199669 B2 JP7199669 B2 JP 7199669B2
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light
optical vortex
generating
exposure
optical
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JPWO2019098262A1 (ja
Inventor
盛嗣 坂本
浩平 野田
拓也 膝附
浩司 小野
喜弘 川月
耕平 後藤
皇晶 筒井
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Nissan Chemical Corp
Nagaoka University of Technology
University of Hyogo
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Nissan Chemical Corp
Nagaoka University of Technology
University of Hyogo
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2019554272A 2017-11-16 2018-11-15 光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法 Active JP7199669B2 (ja)

Applications Claiming Priority (3)

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JP2017221298 2017-11-16
JP2017221298 2017-11-16
PCT/JP2018/042230 WO2019098262A1 (ja) 2017-11-16 2018-11-15 光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法

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JPWO2019098262A1 JPWO2019098262A1 (ja) 2020-12-03
JP7199669B2 true JP7199669B2 (ja) 2023-01-06

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JP (1) JP7199669B2 (ko)
KR (1) KR20200087781A (ko)
CN (1) CN111356957B (ko)
TW (1) TWI805647B (ko)
WO (1) WO2019098262A1 (ko)

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* Cited by examiner, † Cited by third party
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CN110836726A (zh) * 2019-11-14 2020-02-25 深圳大学 一种任意奇点光束阶数检测装置及方法
CN111221132B (zh) * 2019-11-20 2021-10-26 中国科学院光电技术研究所 一种扇形子孔径微透镜阵列测量涡旋光束拓扑荷数的方法和装置
CN110955119B (zh) * 2019-12-03 2021-01-15 浙江大学 一种涡旋光远场超分辨重复光刻方法
CN112286014B (zh) * 2020-12-01 2023-07-11 之江实验室 一种基于柱状矢量偏振光的超分辨激光打印装置
CN112612141B (zh) * 2020-12-31 2024-07-02 华中科技大学 一种光束整形的光学系统
CN114785422B (zh) * 2022-04-15 2024-01-19 西安理工大学 一种径向偏振涡旋光束干涉在水下传输的系统

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WO2007013648A1 (ja) 2005-07-26 2007-02-01 National University Corporation Hokkaido University 光渦発生装置、微小物体操作装置、天体探査装置および偏光渦変換素子
WO2009066755A1 (ja) 2007-11-22 2009-05-28 National University Corporation Tokyo University Of Agriculture And Technology 渦発生装置、物体制御装置、及び渦発生方法

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US6811933B2 (en) * 2002-07-01 2004-11-02 Marc David Levenson Vortex phase shift mask for optical lithography
JP4950411B2 (ja) * 2003-07-01 2012-06-13 大日本印刷株式会社 光学リソグラフィー用ボルテックス位相シフトマスク
US8057963B2 (en) * 2004-06-10 2011-11-15 Lsi Corporation Maskless vortex phase shift optical direct write lithography
CN100480863C (zh) * 2004-08-25 2009-04-22 精工爱普生株式会社 微细结构体的制造方法、曝光装置、电子仪器
JP4587170B2 (ja) * 2005-01-20 2010-11-24 キヤノン株式会社 露光装置及びデバイスの製造方法
JP2009300486A (ja) * 2008-06-10 2009-12-24 Ricoh Co Ltd 光学機器及び光学装置
TWI409434B (zh) * 2009-03-10 2013-09-21 Univ Nat Cheng Kung 可產生穩定多光渦流光束之干涉儀裝置及干涉方法
EP2706406B1 (en) * 2011-06-07 2016-09-21 National University Corporation Chiba University Optical vortex laser vibration method and optical vortex laser vibration device
IN2012DE00869A (ko) * 2012-03-24 2015-07-17 Director General Defence Res & Dev Org
CN104516111A (zh) * 2014-12-23 2015-04-15 钱义先 一种多艾里光束相干叠加合成的高能光瓶光束系统及方法
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WO2009066755A1 (ja) 2007-11-22 2009-05-28 National University Corporation Tokyo University Of Agriculture And Technology 渦発生装置、物体制御装置、及び渦発生方法

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Moritsugu SAKAMOTO et al.，Stable and flexible ring-shaped optical-lattice generation by use of axially symmetric polarization elements，OPTICS LETTERS，2013年09月15日，Vol.38, No.18，p.3661-3664，https://doi.org/10.1364/OL.38.003661
山根啓作，[C1-5-4]トポロジカル光波の発生・計測技術，電子情報通信学会２０１７年エレクトロニクスソサイエティ大会講演論文集１ ，2017年09月12日，p.SS44-SS45
松本友香 ，[2P2-20a2]空間光変調技術を用いた超高速マルチスケール３Ｄ光造形システムの開発 ，ロボティクスメカトロニクス講演会２０１６講演会論文集 ，一般社団法人日本機械学会，2016年06月08日
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CN111356957B (zh) 2022-10-11
JPWO2019098262A1 (ja) 2020-12-03
TW201932921A (zh) 2019-08-16
KR20200087781A (ko) 2020-07-21
TWI805647B (zh) 2023-06-21
CN111356957A (zh) 2020-06-30
WO2019098262A1 (ja) 2019-05-23

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